Abstract: A silver or silver alloy thin layer on a substrate is etched by an etching liquid uniformly without producing an etching residue while avoiding side etching due to over etching. The etching liquid contains silver ions in a range from 0.005 to 1 weight %. The etching liquid is fed to a tank or an etching liquid feeding apparatus, and then brought into contact with the silver or silver alloy thin layer on the substrate.

Abstract: A liquid crystal cell substrate 109, a plasma cell substrate 104, a dielectric layer 103 provided between the liquid crystal cell substrate 109 and the plasma cell substrate 104, a liquid crystal layer 110 provided between the liquid crystal cell substrate 109 and the dielectric layer 103, and a plurality of plasma channels 106 provided between the dielectric layer 103 and the plasma cell substrate 104, are provided. Each of the plurality of plasma channels 106 includes a discharge gas, an anode 107 and a cathode 108, and the cathode 108 includes a cathode layer 108a made of a mixture of a conductive material and an insulative material including a glass having a lead weight percentage of 30% or less.

Abstract: A plasma addressing display device comprising a flat panel including a display cell having columns of signal electrodes and also including a plasma cell having rows of discharge channels, with pixels formed at intersections of the signal electrodes and the discharge channels; a scanning circuit for sequentially discharging the columns of the signal electrodes at a pre-set period to select pixels from row to row; and a signal circuit for supplying picture signals to the column of the signal electrodes to write the picture signals in the pixels of the selected row, the scanning circuit discharging each discharge channel with time shift as the discharging period allocated to the discharge channel of a previous row is partially overlapped at least with the discharging period allocated to the discharge channel of the next row to allocate a discharging period longer than the pre-set period to each discharge channel.

Abstract: A silver or silver alloy thin layer on a substrate is etched by an etching liquid uniformly without producing an etching residue while avoiding side etching due to over etching. The etching liquid contains silver ions in a range from 0.005 to 1 weight %. The etching liquid is fed to a tank or an etching liquid feeding apparatus, and then brought into contact with the silver or silver alloy thin layer on the substrate.

Abstract: A liquid crystal cell substrate 109, a plasma cell substrate 104, a dielectric layer 103 provided between the liquid crystal cell substrate 109 and the plasma cell substrate 104, a liquid crystal layer 110 provided between the liquid crystal cell substrate 109 and the dielectric layer 103, and a plurality of plasma channels 106 provided between the dielectric layer 103 and the plasma cell substrate 104, are provided. Each of the plurality of plasma channels 106 includes a discharge gas, an anode 107 and a cathode 108, and the cathode 108 includes a cathode layer 108a made of a mixture of a conductive material and an insulative material including a glass having a lead weight percentage of 30% or less.

Abstract: A display apparatus includes a pair of substrates connected to each other via a pre-set gap for delimiting a hermetically sealed space, an ionizable gas charged into this space, and discharging electrodes formed at least on one of the substrates to incur discharge in the space. The discharging electrodes are coated with a protective skin film formed by the electro-deposition method. The protective skin film is an electro-deposited and sintered mixture of boride or carbon containing electrically conductive powders and glass powders. In electro-deposition, the mean particle size of the electrically conductive powders and the glass powders is not larger than 10 &mgr;m or in a range from 1 to 3 &mgr;m. The electrically conductive powders and the glass powders are mixed in a volumetric ratio in a range from 9:1 to 3:7, with the film thickness of the protective skin film being in a range from 1 to 20 &mgr;m.