Patents by Inventor Hiroji NISHIZAWA

Hiroji NISHIZAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11658003
    Abstract: A method of manufacturing a phosphor panel includes: forming a phosphor layer having a plurality of phosphor particles on an exit window; forming an organic film on the phosphor layer; forming a metal reflection film on the organic film; forming an oxide film on the metal reflection film; removing the organic film by firing; and forming an oxide film integrally covering a surface of the metal reflection film and surfaces of the phosphor particles by atomic layer deposition.
    Type: Grant
    Filed: November 22, 2019
    Date of Patent: May 23, 2023
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasumasa Hamana, Hiroyuki Watanabe, Kenshi Shimano, Hiroji Nishizawa
  • Publication number: 20220148848
    Abstract: A method of manufacturing a phosphor panel includes: forming a phosphor layer having a plurality of phosphor particles on an exit window; forming an organic film on the phosphor layer; forming a metal reflection film on the organic film; forming an oxide film on the metal reflection film; removing the organic film by firing; and forming an oxide film integrally covering a surface of the metal reflection film and surfaces of the phosphor particles by atomic layer deposition.
    Type: Application
    Filed: November 22, 2019
    Publication date: May 12, 2022
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasumasa HAMANA, Hiroyuki WATANABE, Kenshi SHIMANO, Hiroji NISHIZAWA