Abstract: A field effect transistor (FET) including a graphene layer as a carrier transporting channel is disclosed. The FET provides, on a substrate, a graphene layer, and electrodes of the source and drain on the graphene layer. The FET further provides a couple of gate electrodes and a supplemental electrode, where the former two gate electrodes are provided on a gate insulating film, while, the latter one is provided on the graphene layer and between two gate electrodes. The second gate electrode provided closer to the drain electrode has a gate length that is shorter than the gate length of the first gate electrode provided closer to the source electrode.

Abstract: A silicon carbide (SiC) structure and a method of forming the SiC structure are disclosed. The SiC structure includes an SiC substrate and a film provided on the SiC substrate. The SiC substrate contains both of a hexagonal close packed (hcp) structure and a face centered cubic (fcc) structure, and has only one of the hcp surface and the fcc surface, where the hcp surface includes atoms in the topmost layer whose rows overlap with rows of atoms in the third layer, while, the fcc surface includes atoms in the topmost layer whose rows are different from rows of atoms in the third layer.