Patents by Inventor Hirokazu Iimori

Hirokazu Iimori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230287191
    Abstract: The purpose of the present invention is to provide a coated silicone member manufacturing method which enables, even when a highly water-repellent silicone member having a water surface contact angle of more than 110° is processed at a low temperature, formation of, on the surface, a coating having a sufficiently low surface contact angle with respect to an aqueous solution containing a salt and a protein. The present invention provides a coated silicone member manufacturing method comprising: (A) a degradative reaction step for degrading the surface of a silicone member; (B) a contact step b for bringing a solution b containing a polycarbodiimide into contact with the surface-degraded silicone member; and (C) a contact step c for bringing a solution c containing a polymer C into contact with the surface-degraded silicone member. The polymer C has an alkyl amide group and hydroxyl group.
    Type: Application
    Filed: September 3, 2021
    Publication date: September 14, 2023
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Hirokazu IIMORI, Masataka NAKAMURA
  • Publication number: 20230074745
    Abstract: A coating agent can be applied to various materials without using radiation, and a medical material using the same. The coating agent containing a copolymer that contains: a monomer unit (unit A) containing a Si—O bond; a vinyl carboxylate monomer unit (unit B); and a monomer unit (unit C) containing a hydrophilic group.
    Type: Application
    Filed: March 12, 2021
    Publication date: March 9, 2023
    Inventors: Suguru Ushiro, Hirokazu Iimori, Hirokazu Sakaguchi
  • Patent number: 11365275
    Abstract: The present invention provides a contact lens composition that is polymerizable in a mold and that can easily be peeled from a mold, a cured material of the contact lens composition, a contact lens in which the cured material of the contact lens composition is disposed in at least a center part thereof, and a method for manufacturing the contact lens. This contact lens composition contains (a) a polymerizable crosslinking agent having a multi-ring alicyclic hydrocarbon structure and (b) silicone having a radical polymerizable group.
    Type: Grant
    Filed: May 10, 2018
    Date of Patent: June 21, 2022
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Hirokazu Iimori, Masataka Nakamura
  • Patent number: 11306212
    Abstract: A transparent resin composition is provided which contains at least (A) a siloxane resin, (B) an organic solvent, and two or more kinds of (C) surfactants, wherein the surfactants include (C1) a silicone-modified acrylic surfactant and (C2) a thermally decomposable fluorine-containing surfactant, and the total content of the surfactants (C1) and (C2) is 50-500 ppm with respect to the transparent resin composition. Further provided is a transparent resin composition from which a transparent coating film, that suppresses pin hole or unevenness and has a good appearance and an excellent adhesion property to an inorganic film or an organic film, can be formed even when coated by spray coating or inkjet coating.
    Type: Grant
    Filed: May 16, 2018
    Date of Patent: April 19, 2022
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Yoshihiko Inoue, Yusuke Fukuzaki, Hirokazu Iimori
  • Publication number: 20220008630
    Abstract: Disclosed is a medical device including a substrate and a polymer layer, wherein the polymer layer is provided on at least a part of a surface of the substrate and satisfies the following requirements: (a) a water content of the medical device in hydrated state is in a range of 28% by mass or more and 50% by mass or less; (b) the substrate has a 2-alkoxyethyl group; and (c) the polymer layer contains one type of a carboxylic acid group-containing polymer and one type of a copolymer having an amide structure. The present invention provides a medical device capable of maintaining surface wettability for a long time.
    Type: Application
    Filed: September 13, 2019
    Publication date: January 13, 2022
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Hirokazu IIMORI, Rumiko KITAGAWA, Tomohiro KATO, Masataka NAKAMURA
  • Publication number: 20210147602
    Abstract: The present invention provides a contact lens composition that is polymerizable in a mold and that can easily be peeled from a mold, a cured material of the contact lens composition, a contact lens in which the cured material of the contact lens composition is disposed in at least a center part thereof, and a method for manufacturing the contact lens. This contact lens composition contains (a) a polymerizable crosslinking agent having a multi-ring alicyclic hydrocarbon structure and (b) silicone having a radical polymerizable group.
    Type: Application
    Filed: May 10, 2018
    Publication date: May 20, 2021
    Applicant: Toray Industries, Inc.
    Inventors: Hirokazu Iimori, Masataka Nakamura
  • Publication number: 20210080829
    Abstract: A negative photosensitive resin composition is provided which contains (A) a siloxane resin having a radically polymerizable group and a carboxyl group and/or a dicarboxylic acid anhydride group, (B) a reactive monomer, (C) a radical photopolymerization initiator, (D) silica particles and (E) a siloxane compound having an oxetanyl group. The present invention provides a negative photosensitive resin composition which is capable of forming a cured film that has high glass surface strength, while exhibiting excellent adhesion to an inorganic film or to an organic film.
    Type: Application
    Filed: May 16, 2018
    Publication date: March 18, 2021
    Applicant: Toray Industries, Inc.
    Inventors: Yusuke Fukuzaki, Hirokazu Iimori, Yoshihiko Inoue
  • Publication number: 20210009808
    Abstract: A transparent resin composition is provided which contains at least (A) a siloxane resin, (B) an organic solvent, and two or more kinds of (C) surfactants, wherein the surfactants include (C1) a silicone-modified acrylic surfactant and (C2) a thermally decomposable fluorine-containing surfactant, and the total content of the surfactants (C1) and (C2) is 50-500 ppm with respect to the transparent resin composition. Further provided is a transparent resin composition from which a transparent coating film, that suppresses pin hole or unevenness and has a good appearance and an excellent adhesion property to an inorganic film or an organic film, can be formed even when coated by spray coating or inkjet coating.
    Type: Application
    Filed: May 16, 2018
    Publication date: January 14, 2021
    Applicant: Toray Industries, Inc.
    Inventors: Yoshihiko Inoue, Yusuke Fukuzaki, Hirokazu Iimori
  • Patent number: 9977329
    Abstract: The present invention provides a negative photosensitive resin composition including the following (a) to (d): (a) metallic compound particles, (b) a polysiloxane compound, (c) a compound having at least 1 group containing an ?,?-unsaturated carboxylate ester structure, and (d) a photopolymerization initiator, the composition also including (e) a compound containing maleimide group.
    Type: Grant
    Filed: January 21, 2015
    Date of Patent: May 22, 2018
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Hirokazu Iimori, Toshiyasu Hibino, Mitsuhito Suwa
  • Publication number: 20170010532
    Abstract: The present invention provides a negative photosensitive resin composition including the following (a) to (d): (a) metallic compound particles, (b) a polysiloxane compound, (c) a compound having at least 1 group containing an ?,?-unsaturated carboxylate ester structure, and (d) a photopolymerization initiator, the composition also including (e) a compound containing maleimide group.
    Type: Application
    Filed: January 21, 2015
    Publication date: January 12, 2017
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Hirokazu Iimori, Toshiyasu Hibino, Mitsuhito Suwa
  • Patent number: 8389649
    Abstract: The present invention is a siloxane-based resin composition including a siloxane-based resin and an imidosilane compound having a specific structure. Moreover, the present invention is a siloxane-based resin composition including a siloxane-based resin which is a reactive product to be obtained by hydrolyzing an alkoxysilane compound and an imidosilane compound having a specific structure and then making the resulting hydrolysate undergo a condensation reaction. According to the present invention, it is possible to form a cured film excellent in adhesion.
    Type: Grant
    Filed: May 27, 2008
    Date of Patent: March 5, 2013
    Assignee: Toray Industries, Inc.
    Inventors: Mitsuhito Suwa, Hirokazu Iimori
  • Publication number: 20100316953
    Abstract: The present invention is a siloxane-based resin composition including a siloxane-based resin and an imidosilane compound having a specific structure. Moreover, the present invention is a siloxane-based resin composition including a siloxane-based resin which is a reactive product to be obtained by hydrolyzing an alkoxysilane compound and an imidosilane compound having a specific structure and then making the resulting hydrolysate undergo a condensation reaction. According to the present invention, it is possible to form a cured film excellent in adhesion.
    Type: Application
    Filed: May 27, 2008
    Publication date: December 16, 2010
    Inventors: Mitsuhito Suwa, Hirokazu Iimori
  • Patent number: 7374856
    Abstract: A positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant may be used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide. The positive photosensitive siloxane composition includes a siloxane polymer, quinonediazide compound and solvent, and a cured film formed of the composition has a light transmittance per 3 ?m of film thickness at a wavelength of 400 nm of 95% or more.
    Type: Grant
    Filed: November 15, 2005
    Date of Patent: May 20, 2008
    Assignee: Toray Industries, Inc.
    Inventors: Mitsuhito Suwa, Takenori Fujiwara, Masahide Senoo, Hirokazu Iimori
  • Publication number: 20060115766
    Abstract: This invention provides a positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant, used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide. It is a positive photosensitive siloxane composition comprising a siloxane polymer, quinonediazide compound and solvent, characterized in that the light transmittance of the cured film formed of the composition per 3 ?m of film thickness at a wavelength of 400 nm is 95% or more.
    Type: Application
    Filed: November 15, 2005
    Publication date: June 1, 2006
    Applicant: Toray Industries, Inc.
    Inventors: Mitsuhito Suwa, Takenori Fujiwara, Masahide Senoo, Hirokazu Iimori