Patents by Inventor Hirokazu Katsuyama

Hirokazu Katsuyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9337093
    Abstract: The semiconductor device includes an insulating film that is formed using a cyclic siloxane having a six-membered ring structure as a raw material; a trench that is formed in the insulating film; and a interconnect that is configured by a metal film embedded in the trench. In the semiconductor device, a modified layer is formed on a bottom surface of the trench, in which the number of carbon atoms and/or the number of nitrogen atoms per unit volume is larger than that inside the insulating film.
    Type: Grant
    Filed: July 14, 2011
    Date of Patent: May 10, 2016
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Daisuke Oshida, Ippei Kume, Makoto Ueki, Manabu Iguchi, Naoya Inoue, Takuya Maruyama, Toshiji Taiji, Hirokazu Katsuyama
  • Publication number: 20120015517
    Abstract: The semiconductor device includes an insulating film that is formed using a cyclic siloxane having a six-membered ring structure as a raw material; a trench that is formed in the insulating film; and a interconnect that is configured by a metal film embedded in the trench. In the semiconductor device, a modified layer is formed on a bottom surface of the trench, in which the number of carbon atoms and/or the number of nitrogen atoms per unit volume is larger than that inside the insulating film.
    Type: Application
    Filed: July 14, 2011
    Publication date: January 19, 2012
    Applicant: RENESAS ELECTRONICS CORPORATION
    Inventors: Daisuke OSHIDA, Ippei KUME, Makoto UEKI, Manabu IGUCHI, Naoya INOUE, Takuya MARUYAMA, Toshiji TAIJI, Hirokazu KATSUYAMA
  • Patent number: 5830954
    Abstract: The names of a plurality of polyolefine resins are previously registered as index data in a name data base. An optimal operational pattern is stored in an operational pattern table for each combination of the name of a current resin under production and the name of a target resin to be produced. The optimal operation pattern is selected based on the name of the current resin under production and the name of the next target resin to be produced. Based on the selected optimal operational pattern, resin-type change control is executed.
    Type: Grant
    Filed: December 20, 1995
    Date of Patent: November 3, 1998
    Assignee: Mitsui Petrochemical Industries, Ltd.
    Inventors: Shigeki Hayashi, Michinori Tayama, Hiroyuki Mizouchi, Hirokazu Katsuyama