Patents by Inventor Hirokazu Niki
Hirokazu Niki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5744281Abstract: A resist composition for forming a pattern, which comprises (a) a compound represented by the following formula (1) and satisfying the following inequalities, ##STR1## wherein R.sup.1 is hydrogen atom or methyl group, R.sup.2 is a monovalent organic group, m is 0 or a positive integer, n is a positive integer, and m and n satisfying a condition of 0.03.ltoreq.n/(m+n).ltoreq.1, (b) a compound capable of generating an acid when irradiated with light, and (c) 4-phenylpyridine, wherein a weight-average molecular weight, Mw and a number-average molecular weight, Mn satisfy the following inequality, 4,000.ltoreq.Mw.ltoreq.50,000, 1.10.ltoreq.Mw/Mn.ltoreq.2.50 (Mw and Mn respectively represent value converted in styrene).Type: GrantFiled: May 1, 1997Date of Patent: April 28, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Hirokazu Niki, Hiromitsu Wakabayashi, Rumiko Hayase, Naohiko Oyasato, Yasunobu Onishi, Kazuo Sato, Kenji Chiba, Takao Hayashi
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Patent number: 5691101Abstract: Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin.Type: GrantFiled: May 9, 1996Date of Patent: November 25, 1997Assignee: Kabushiki Kaisha ToshibaInventors: Toru Ushirogouchi, Naomi Shida, Takuya Naito, Koji Asakawa, Akinori Hongu, Makoto Nakase, Hirokazu Niki
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Patent number: 5658706Abstract: A resist composition for forming a pattern, which comprises (a) a compound represented by the following formula (1) and satisfying the following inequalities, ##STR1## wherein R.sup.1 is hydrogen atom or methyl group, R.sup.2 is a monovalent organic group, m is 0 or a positive integer, n is a positive integer, and m and n satisfying a condition of 0.03.ltoreq.n/(m+n).ltoreq.1, (b) a compound capable of generating an acid when irradiated with light, and (c) a nitrogen-containing compound, wherein a weight-average molecular weight, Mw and a number-average molecular weight, Mn satisfy the following inequality, 4,000.ltoreq.Mw.ltoreq.50,000, 1.10.ltoreq.Mw/Mn.ltoreq.2.50 (Mw and Mn respectively represent value converted in styrene).Type: GrantFiled: September 8, 1994Date of Patent: August 19, 1997Assignee: Kabushiki Kaisha ToshibaInventors: Hirokazu Niki, Hiromitsu Wakabayashi, Rumiko Hayase, Naohiko Oyasato, Yasunobu Onishi, Kazuo Sato, Kenji Chiba, Takao Hayashi
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Patent number: 5580702Abstract: Disclosed herein is a resist for forming patterns, which is greatly sensitive to ultraviolet rays an ionizing radiation, and which can therefore form a high-resolution resist pattern if exposed to ultra violet rays or an unionizing radiation. Hence, the resist is useful in a method of manufacturing semicon ductor devices having high integration densities. The resist comprises tert-butoxycarbonyl methoxypolyhydroxy styrene and an o-quinonediazide compound.Type: GrantFiled: December 13, 1994Date of Patent: December 3, 1996Assignee: Kabushiki Kaisha ToshibaInventors: Rumiko Hayase, Yasunobu Onishi, Hirokazu Niki, Noahiko Oyasato, Yoshihito Kobayashi, Shuzi Nayase
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Patent number: 5432023Abstract: In a fuel cell comprising a stack having superposed a plurality of electromotive parts composed of a fuel electrode, an oxidizing electrode, and an electrolyte layer nipped by the two electrodes and using a liquid fuel as the fuel for the fuel cell, this invention contemplates forming a liquid fuel introducing path destined to be directly exposed to the liquid fuel on terminal surfaces of the component parts of the electromotive parts in a direction perpendicular to the flow of an oxidizing gas along at least one of the outer peripheral surfaces of the stack including the terminal surface of the fuel electrode and lying parallelly to the flow of the oxidizing gas and enabling the liquid fuel in the liquid fuel introducing path to be supplied to the fuel electrodes by a capillary attraction.Type: GrantFiled: May 5, 1994Date of Patent: July 11, 1995Assignee: Kabushiki Kaisha ToshibaInventors: Shuji Yamada, Motoya Kanda, Masao Yamamoto, Nobukazu Suzuki, Yoshiko Kanazawa, Akinori Hongu, Yuu Kondou, Ken Uchida, Koji Hashimoto, Hirokazu Niki, Kunihiko Sasaki, Shinji Tsuruta
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Patent number: 5403695Abstract: Disclosed herein is a resist for forming patterns, which is greatly sensitive to ultraviolet rays an ionizing radiation, and which can therefore form a high-resolution resist pattern if exposed to ultra violet rays or an unionizing radiation. Hence, the resist is useful in a method of manufacturing semicon ductor devices having high integration densities. The resist comprises tert-butoxycarbonyl methoxypolyhydroxy styrene and an o-quinonediazide compound.Type: GrantFiled: April 30, 1992Date of Patent: April 4, 1995Assignee: Kabushiki Kaisha ToshibaInventors: Rumiko Hayase, Yasunobu Onishi, Hirokazu Niki, Naohiko Oyasato, Yoshihito Kobayashi, Shuzi Hayase
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Patent number: 5372914Abstract: On a substrate a protective layer is formed which can suppress the diffusion of a contaminant from the substrate. On the protective layer, thus formed, a resin layer is formed. The resin layer comprises a photosensitive composition containing a compound which has a substituent group capable of being decomposed or cross-linked in the presence of an acid, and a compound which can generate an acid when exposed to light. The resin layer is pattern-exposed to light and then baked at a predetermined temperature. The resin layer is developed, whereby the exposed portions of the resin layer are removed or left, thus forming a pattern comprising lines and spaces each having a predetermined width. Each of the lines of the pattern has a cross-section having neither sloped profile nor undercut profile, and the pattern therefore has an improved resolution.Type: GrantFiled: March 24, 1993Date of Patent: December 13, 1994Assignee: Kabushiki Kaisha ToshibaInventors: Takuya Naito, Osamu Sasaki, Tsukasa Tada, Naoko Kihara, Toru Ushirogouchi, Satoshi Saito, Takashi Jonai, Hirokazu Niki
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Patent number: 5364711Abstract: In a fuel cell comprising a stack having superposed a plurality of electromotive parts composed of a fuel electrode, an oxidizing electrode, and an electrolyte layer nipped by the two electrodes and using a liquid fuel as the fuel for the fuel cell, this invention contemplates forming a liquid fuel introducing path destined to be directly exposed to the liquid fuel on terminal surfaces of the component parts of the electromotive parts in a direction perpendicular to the flow of an oxidizing gas along at least one of the outer peripheral surfaces of the stack including the terminal surface of the fuel electrode and lying parallelly to the flow of the oxidizing gas and enabling the liquid fuel in the liquid fuel introducing path to be supplied to the fuel electrodes by a capillary attraction.Type: GrantFiled: March 31, 1993Date of Patent: November 15, 1994Assignee: Kabushiki Kaisha ToshibaInventors: Shuji Yamada, Motoya Kanda, Masao Yamamoto, Nobukazu Suzuki, Yoshiko Kanazawa, Akinori Hongu, Yuu Kondou, Ken Uchida, Koji Hasimoto, Hirokazu Niki, Kunihiko Sasaki, Shinji Tsuruta
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Patent number: 5326675Abstract: A radiation-sensitive layer comprising as a main component a radiation-sensitive composition containing a compound capable of generating an acid when exposed to a chemical radiation and a compound having at least one linkage decomposable by an acid is formed on a substrate. An acidic coating layer is formed on the radiation-sensitive layer. The radiation-sensitive layer and the acidic coating layer are pattern-exposed to a chemical radiation. The radiation-sensitive layer and the acidic coating layer are baked and developed by using an aqueous alkaline solution to obtain a pattern comprising lines and spaces, each having a predetermined width. A fine pattern of a rectangular sectional shape can be formed without producing eaves caused by a surface inhibition layer layer, which is produced on the film surface.Type: GrantFiled: December 9, 1992Date of Patent: July 5, 1994Assignee: Kabushiki Kaisha ToshibaInventors: Hirokazu Niki, Rumiko Hayase, Naohiko Oyasato, Yasunobu Onishi, Akitoshi Kumagae, Kazuo Sato, Masataka Miyamura, Yoshihito Kobayashi
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Patent number: 5279921Abstract: Disclosed is a pattern formation resist which can be exposed with deep UV, has a high dry etching resistance, has a large allowance in a development manipulation using an aqueous alkali solution, and can form a fine pattern having a good sectional shape. The resist comprises an alkali-soluble polymer and a compound represented by the following formula (I) and simultaneously containing, in a single molecule, a substituent which decomposes with an acid and a group which produces an acid with deep UV: ##STR1## wherein the substituent which decomposes with an acid is present in at least one of R.sub.1 to R.sub.4, and when R.sub.1 to R.sub.4 have a group except for the substituent which decomposes with an acid, R.sub.1 represents a nonsubstituted or substituted aliphatic hydrocarbon group, each of R.sub.2 and R.sub.3 independently represents a hydrogen atom or a non-substituted or substituted aliphatic hydrocarbon group, and R.sub.4 represents a nonsubstituted or substituted aliphatic hydrocarbon group.Type: GrantFiled: November 27, 1991Date of Patent: January 18, 1994Assignee: Kabushiki Kaisha ToshibaInventors: Yasunobu Onishi, Yoshihito Kobayashi, Hirokazu Niki
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Patent number: 5188924Abstract: A pattern forming method, comprising the steps of providing a resist film on a substrate; providing a photosensitive film containing a photosensitive diazonium salt on the resist film; and then subjecting the resultant composite to pattern exposure by use of a light to which both of the resist film and the photosensitive diazonium salt are sensitive, can employ a composition for pattern formation which comprises a photosensitive diazonium salt, a resin binder and a solvent. By this method, a minute pattern of 1 .mu.m or less can be formed, utilizing effectively the UV-ray exposure technique of the prior art, with good dimensional precision and stability.Type: GrantFiled: October 16, 1991Date of Patent: February 23, 1993Assignee: Kabushiki Kaisha ToshibaInventors: Kunihiro Ikari, deceased, Hirokazu Niki, Makoto Nakase, Toshiaki Shinozaki
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Patent number: 5100768Abstract: A photosensitive composition contains an alkali-soluble polymer having a phenol skeleton in its structure and a heterocyclic compound represented by formula (I-1) or (I-2), formula (II-1) or (II-2), any of formulas (III-1) to (III-8), any of formulas (IV-1) to (IV-12), or any of formulas (V-1) to (V-4) described in the claims and specification. A photosensitive composition containing a heterocyclic compound represented by formula (I-1) or (I-2), any of formulas (III-1) to (III-8), any of formulas (IV-1) to (IV-12), or any of formulas (V-1) to (V-4) can be suitably used as a negative resist. A photosensitive composition containing a heterocyclic compound represented by formula (II-1) or (II-2) can be suitably used as a positive resist. A photosensitive composition containing an alkali-soluble polymer having a phenol skeleton in its structure and a polymer having a nitrogen-containing heterocyclic compound as a polymeric unit is also included in this invention.Type: GrantFiled: May 4, 1990Date of Patent: March 31, 1992Assignee: Kabushiki Kaisha ToshibaInventors: Hirokazu Niki, Yasunobu Onishi, Yoshihito Kobayashi, Rumiko Hayase
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Patent number: 5091282Abstract: This invention includes a photosensitive composition containing an alkali-soluble resin and a compound represented by formula (I), (II) or (III) described in the claims and the specification, a photosensitive composition containing an alkali-soluble polymer, a compound represented by formula (IV) described in the claims and the specification and a basic compound, and a photosensitive composition containing an alkali-soluble polymer, a compound represented by formula (VI) described in the claims and the specification and a compound which produces an acid upon radiation of light.Type: GrantFiled: April 3, 1990Date of Patent: February 25, 1992Assignee: Kabushiki Kaisha ToshibaInventors: Yasunobu Onishi, Hirokazu Niki, Yoshihito Kobayashi, Rumiko Hayase, Toru Ushirogouchi
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Patent number: 4037033Abstract: An improved rechargeable nickel-zinc battery is described which is capable of undergoing many charge-discharge cycles (cycle life), with deep discharge, and of high performance with heavy drain discharge during use. The increased cycle life is accomplished by a suitable combination of electrochemical generating elements. The high performance with heavy drain discharge service is obtained by an improved zinc electrode construction. The battery of this invention has a sheet-like kneaded zinc electrode, a sheet-like nickel oxide electrode with limited capacity ratio thereof, a separator, an electrolyte absorber, and a concentrated alkaline electrolyte in limited amounts.Type: GrantFiled: January 20, 1976Date of Patent: July 19, 1977Assignee: Tokyo Shibaura Electric Co. Ltd.Inventors: Tsutomu Takamura, Tamotsu Shirogami, Hirokazu Niki, Kazuo Aizawa
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Patent number: 3951687Abstract: Provided is a nickel-zinc storage battery prepared, preferably, by winding into a whirlpool a sheet-like zinc electrode, a sheet-like nickel electrode and a separator with the separator interposed between the zinc and nickel electrodes, said zinc electrode being obtained by bonding under pressure to a collector a mixture sheet consisting of zinc oxide, zinc, bismuth oxide, calcium hydroxide and fluoroplastic, said nickel electrode being obtained by bonding under pressure an oxide of nickel to a collector together with a conductive material, said separator being obtained by coating on an alkali-resisting nonwoven fabric a mixture of polyvinyl alcohol and at least either of one selected from the group consisting of boric acids and metal oxides having low solubility to alkali solution and drying the nonwoven fabric thus coated.Type: GrantFiled: November 20, 1974Date of Patent: April 20, 1976Assignee: Tokyo Shibaura Electric Co., Ltd.Inventors: Tsutomu Takamura, Tamotsu Shirogami, Yuichi Sato, Kenji Murata, Hirokazu Niki
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Patent number: RE38256Abstract: Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin.Type: GrantFiled: November 24, 1999Date of Patent: September 23, 2003Assignee: Kabushiki Kaisha ToshibaInventors: Toru Ushirogouchi, Naomi Shida, Takuya Naito, Koji Asakawa, Akinori Hongu, Makoto Nakase, Hirokazu Niki
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Patent number: RE35821Abstract: A radiation-sensitive layer comprising as a main component a radiation-sensitive composition containing a compound capable of generating an acid when exposed to a chemical radiation and a compound having at least one linkage decomposable by an acid is formed on a substrate. An acidic coating layer is formed on the radiation-sensitive layer. The radiation-sensitive layer and the acidic coating layer are pattern-exposed to a chemical radiation. The radiation-sensitive layer and the acidic coating layer are baked and developed by using an aqueous alkaline solution to obtain a pattern comprising lines and spaces, each having a predetermined width. A fine pattern of a rectangular sectional shape can be formed without producing eaves caused by a surface inhibition layer layer, which is produced on the film surface.Type: GrantFiled: April 29, 1996Date of Patent: June 9, 1998Assignee: Kabushiki Kaisha ToshibaInventors: Hirokazu Niki, Rumiko Hayase, Naohiko Oyasato, Yasunobu Onishi, Akitoshi Kumagae, Kazuo Sato, Masataka Miyamura, Yoshihito Kobayashi