Patents by Inventor Hirokazu Sakai
Hirokazu Sakai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11611017Abstract: A layer of a crystal of a group 13 nitride selected from gallium nitride, aluminum nitride, indium nitride and the mixed crystals thereof has an upper surface and a bottom surface. The upper surface of a crystal layer of the group 13 nitride includes a linear high-luminance light-emitting part and a low-luminance light-emitting region adjacent to the high-luminance light-emitting part, observed by cathode luminescence. The high-luminance light-emitting part includes a portion extending along an m-plane of the crystal of the group 13 nitride. The crystal of the nitride of the group 13 element contains oxygen atoms in a content of 1×1018 atom/cm3 or less, silicon atoms, manganese atoms, carbon atoms, magnesium atoms and calcium atoms in contents of 1×1017 atom/cm3 or less, chromium atoms in a content of 1×1016 atom/cm3 or less and chlorine atoms in a content of 1×1015 atom/cm3 or less.Type: GrantFiled: February 21, 2020Date of Patent: March 21, 2023Assignee: NGK INSULATORS, LTD.Inventors: Takayuki Hirao, Hirokazu Nakanishi, Mikiya Ichimura, Takanao Shimodaira, Masahiro Sakai, Takashi Yoshino
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Publication number: 20230030778Abstract: A semiconductor device includes a semiconductor substrate, a semiconductor layer, a first insulating film, and a conductive film. The semiconductor layer is formed on the semiconductor substrate. A first trench reaching the semiconductor substrate is formed within the semiconductor layer. The first insulating film is formed on the inner side surface of the first trench such that a portion of the semiconductor substrate is exposed in the first trench. The conductive film is electrically connected with the semiconductor substrate and formed on the inner side surface of the first trench through the first insulating film. In plan view, a first length of the first trench in an extending direction of the first trench is greater than a second length of the first trench in a width direction perpendicular to the extending direction, and equal to or less than 30 ?m.Type: ApplicationFiled: October 6, 2022Publication date: February 2, 2023Inventors: Hirokazu SAYAMA, Fumihiko HAYASHI, Junjiro SAKAI
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Patent number: 11555257Abstract: A layer of a crystal of a group 13 nitride selected from gallium nitride, aluminum nitride, indium nitride and the mixed crystals thereof has an upper surface and a bottom surface. The upper surface includes a linear high-luminance light-emitting part and a low-luminance light-emitting region adjacent to the high-luminance light-emitting part. The high-luminance light-emitting part includes a portion extending along an m-plane of the crystal of the group 13 nitride. A normal line to the upper surface has an off-angle of 2.0° or less with respect to <0001> direction of the crystal of the nitride of the group 13 element.Type: GrantFiled: February 21, 2020Date of Patent: January 17, 2023Assignee: NGK INSULATORS, LTD.Inventors: Takayuki Hirao, Hirokazu Nakanishi, Mikiya Ichimura, Takanao Shimodaira, Masahiro Sakai, Takashi Yoshino
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Patent number: 11502036Abstract: A semiconductor device includes a semiconductor substrate, a semiconductor layer, a first insulating film, and a conductive film. The semiconductor layer is formed on the semiconductor substrate. A first trench reaching the semiconductor substrate is formed within the semiconductor layer. The first insulating film is formed on the inner side surface of the first trench such that a portion of the semiconductor substrate is exposed in the first trench. The conductive film is electrically connected with the semiconductor substrate and formed on the inner side surface of the first trench through the first insulating film. In plan view, a first length of the first trench in an extending direction of the first trench is greater than a second length of the first trench in a width direction perpendicular to the extending direction, and equal to or less than 30 ?m.Type: GrantFiled: February 7, 2020Date of Patent: November 15, 2022Assignee: RENESAS ELECTRONICS CORPORATIONInventors: Hirokazu Sayama, Fumihiko Hayashi, Junjiro Sakai
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Patent number: 11486590Abstract: A soundproof part that covers a compressor includes a side surface cover including two or more sound absorbing materials and two or more sound insulating materials, and configured to cover a side surface of the compressor. The two or more sound insulating materials include sound insulating materials having different specific gravities. The side surface cover is formed such that one sound absorbing material is disposed adjacent to the compressor, and a sound absorbing material and a sound insulating material are alternately arranged. The side surface cover is also formed such that as a distance from the compressor increases, the sound insulating materials having relatively lower specific gravities are disposed.Type: GrantFiled: July 24, 2018Date of Patent: November 1, 2022Assignee: Mitsubishi Electric CorporationInventors: Mizuo Sakai, Noka Sakabe, Tetsuya Yamashita, Hirokazu Murakami, Yuya Hata, Motoki Otsuka
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Patent number: 11447612Abstract: The purpose of the present invention is to provide a composite sheet in which the dimension stability when it is tensed is high and the appearance deterioration and the yellowness change are suppressed. The present invention relates to a sheet comprising; cellulose fibers having a fiber width of 1000 nm or less and having a phosphoric acid group or a phosphoric acid group-derived substituent; and a polyvinyl alcohol-based resin, wherein the sheet has a tensile elastic modulus of 3.4 GPa or more.Type: GrantFiled: July 7, 2017Date of Patent: September 20, 2022Assignee: OJI HOLDINGS CORPORATIONInventors: Koh Sakai, Hayato Fushimi, Hirokazu Sunagawa
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Patent number: 10266918Abstract: There is provided a Ni-based alloy excellent in hot forgeability, high-temperature oxidation resistance, and high-temperature halogen gas corrosion resistance that is suitable as constituent materials, such as a baking tray for chip capacitor, a baking tray for lithium battery cathode material, a CVD apparatus member, a PVD apparatus member, an LCD apparatus member, and a semiconductor manufacturing apparatus member. The Ni-based alloy contains, by weight, 2.0 to 5.0% Al, 0.1 to 2.5% Si, 0.1 to 1.5% Mn, 0.001 to 0.01% B, 0.001 to 0.1% of Zr, and the balance of Ni with inevitable impurities and excels in hot forgeability, high-temperature oxidation resistance, and high-temperature halogen gas corrosion resistance. The Ni-based alloy may further contain 0.8 to 4.0% Cr.Type: GrantFiled: March 31, 2014Date of Patent: April 23, 2019Assignee: Hitachi Metals, Ltd.Inventors: Hirokazu Sakai, Katsuo Sugahara
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Patent number: 10100503Abstract: A float rise speed control tank in a flush toilet is formed so that when the flush water level inside a flush water tank rises and the flush water level reaches a window due to supply of flush water into the flush water tank by a water supply device, the inflow into the float rise speed control tank by flush water in the flush water tank from a window formed above the bottom edge part of the float causes the rise speed of the flush water level in the float rise speed control tank to increase more than the rise speed of the flush water in the flush water tank.Type: GrantFiled: January 17, 2017Date of Patent: October 16, 2018Assignee: Toto Ltd.Inventors: Hirokazu Sakai, Takaaki Kuwahara, Teiji Nakamura, Ayako Habu, Koichiro Matsushita, Haruo Tsutsui, Takashi Yoshioka, Koichi Takayama, Hirotaka Shiokama, Hiroshi Yuki, Satoshi Kato
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Publication number: 20170211263Abstract: A float rise speed control tank in a flush toilet is formed so that when the flush water level inside a flush water tank rises and the flush water level reaches a window due to supply of flush water into the flush water tank by a water supply device, the inflow into the float rise speed control tank by flush water in the flush water tank from a window formed above the bottom edge part of the float causes the rise speed of the flush water level in the float rise speed control tank to increase more than the rise speed of the flush water in the flush water tank.Type: ApplicationFiled: January 17, 2017Publication date: July 27, 2017Inventors: Hirokazu SAKAI, Takaaki KUWAHARA, Teiji NAKAMURA, Ayako HABU, Koichiro MATSUSHITA, Haruo TSUTSUI, Takashi YOSHIOKA, Koichi TAKAYAMA, Hirotaka SHIOKAMA, Hiroshi YUKI, Satoshi KATO
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Publication number: 20160215367Abstract: There is provided a Ni-based alloy excellent in hot forgeability, high-temperature oxidation resistance, and high-temperature halogen gas corrosion resistance that is suitable as constituent materials, such as a baking tray for chip capacitor, a baking tray for lithium battery cathode material, a CVD apparatus member, a PVD apparatus member, an LCD apparatus member, and a semiconductor manufacturing apparatus member. The Ni-based alloy contains, by weight, 2.0 to 5.0% Al, 0.1 to 2.5% Si, 0.1 to 1.5% Mn, 0.001 to 0.01% B, 0.001 to 0.1% of Zr, and the balance of Ni with inevitable impurities and excels in hot forgeability, high-temperature oxidation resistance, and high-temperature halogen gas corrosion resistance. The Ni-based alloy may further contain 0.8 to 4.0% Cr.Type: ApplicationFiled: March 31, 2014Publication date: July 28, 2016Inventors: Hirokazu SAKAI, Katsuo SUGAHARA
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Patent number: 7897143Abstract: Provided is a hair cleansing composition containing (A) an amphipathic amide lipid, (B) an anionic surfactant and (C) an organic or inorganic acid, or a salt thereof, and having a pH of from 1 to 4.5 when diluted with water to 20 times the weight. The hair cleansing composition of the present invention has advantages including protecting hair from physical or chemical stimulation and preventing split ends or breakage of hair without impairing the cleansing ability and feeling upon use, imparting hair with a pleasant feeling to the touch and moisture retention properties such as natural smoothness, moist feeling, and suppleness which healthy hair inherently possesses, and has excellent stability.Type: GrantFiled: December 24, 2003Date of Patent: March 1, 2011Assignee: Kao CorporationInventors: Hirokazu Sakai, Hiroto Tanamachi, Yoshimasa Okamoto
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Patent number: 7892526Abstract: Provided is a hair cosmetic composition containing (A) an amphipathic amide lipid, (B) a cationic surfactant or a tertiary amine type compound represented by the following formula (N): wherein, A represents a hydrogen atom or a linear or branched, saturated or unsaturated amide, (N-hydrocarbon)carbamoyl, acyloxy or hydrocarbonoxy group each having 12 to 24 carbon atoms in total, B represents a linear or branched, saturated or unsaturated C1-22 hydrocarbon group, and Z1 and Z2 each represents a C1-4 alkyl group; or a salt of the compound, and (C) a silicone; and having a pH at 25° C. of from 1 to 4.5 when diluted with water to 20 times the weight of the composition.Type: GrantFiled: March 18, 2009Date of Patent: February 22, 2011Assignee: Kao CorporationInventors: Hirokazu Sakai, Hiroto Tanamachi, Yoshimasa Okamoto, Koji Morita
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Patent number: 7862806Abstract: Provided is a hair cosmetic composition containing (A) from 0.001 to 10 wt. % of an amphipathic amide lipid, and (B): from 0.05 to 10 wt. % of a dialkyl ether or ethylene glycol dialkyl ether with an alkyl group having from 18 to 22 carbon atoms, or an ethylene glycol monofatty acid ester, ethylene glycol difatty acid ester, fatty acid monoethanolamide or acylated ?-alanine with an acyl group having from 18 to 22 carbon atoms. The hair cosmetic composition of the present invention for example, protects the hair from physical or chemical stimulation, prevents appearance of split ends and broken hair, imparts natural smoothness, moist feeling, resilience and strength, and moisture retention property to the hair after treatment (shampooing), and at the same time has excellent storage stability.Type: GrantFiled: April 16, 2004Date of Patent: January 4, 2011Assignee: Kao CorporationInventors: Hirokazu Sakai, Yoshimasa Okamoto
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Patent number: 7612141Abstract: Provided is a hair cleansing composition comprising (A) an amphipathic amide lipid, (B) an anionic surfactant and (C) a silicone. The hair cleansing composition of the present invention has advantages such as protecting hair from physical or chemical stimulation and preventing split ends or hair breakage without impairing its cleansing ability and feeling upon use, and moreover, gives to hair after shampooing a pleasant feeling to the touch and moisture retention properties such as natural smoothness, moist feeling, and suppleness which healthy hair inherently possesses, and has excellent stability.Type: GrantFiled: October 7, 2005Date of Patent: November 3, 2009Assignee: Kao CorporationInventors: Hirokazu Sakai, Hiroto Tanamachi, Yoshimasa Okamoto
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Publication number: 20090181059Abstract: Provided is a hair cosmetic composition containing (A) an amphipathic amide lipid, (B) a cationic surfactant or a tertiary amine type compound represented by the following formula (N): wherein, A represents a hydrogen atom or a linear or branched, saturated or unsaturated amide, (N-hydrocarbon)carbamoyl, acyloxy or hydrocarbonoxy group each having 12 to 24 carbon atoms in total, B represents a linear or branched, saturated or unsaturated C1-22 hydrocarbon group, and Z1 and Z2 each represents a C1-4 alkyl group; or a salt of the compound, and (C) a silicone; and having a pH at 25° C. of from 1 to 4.5 when diluted with water to 20 times the weight of the composition. The hair cosmetic composition of the present invention can protect hair from physical and chemical stimulation, thereby preventing split ends or broken hair, and impart hair with good feeling to the touch, for example, moist feeling, smoothness and suppleness which healthy hair inherently possesses, and has excellent storage stability.Type: ApplicationFiled: March 18, 2009Publication date: July 16, 2009Applicant: KAO CORPORATIONInventors: Hirokazu SAKAI, Hiroto TANAMACHI, Yoshimasa OKAMOTO, Koji MORITA
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Patent number: 7544648Abstract: The present invention relates to a hair shampoo composition containing (A) an amphipathic amide lipid, and (B), from 5 to 30 wt. % of sulfate surfactants which are each represented by the formula: R—O—(C2H4O)a—SO3M (wherein, R represents a C8-18 alkyl or alkenyl group, a stands for 0 or a positive integer, and M represents an alkali metal, alkaline earth metal, or the like); are made of from 30 to 45 wt. % of a sulfate exhibiting a=0, from 18 to 27 wt. % of another sulfate exhibiting a=1, from 10 to 20 wt. % of a further sulfate exhibiting a=2, and the balance of further sulfates exhibiting a=3 or greater; and contain the sulfates exhibiting a=0 to 2 in an amount of 70 wt. % or greater based on the total sulfates.Type: GrantFiled: April 16, 2004Date of Patent: June 9, 2009Assignee: Kao CorporationInventors: Hirokazu Sakai, Yoshimasa Okamoto
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Publication number: 20060036046Abstract: Provided is a hair cleansing composition containing (A) an amphipathic amide lipid, (B) an anionic surfactant and (C) a silicone. The hair cleansing composition of the present invention has advantages such as protecting hair from physical or chemical stimulation and preventing split ends or hair breakage without impairing its cleansing ability and feeling upon use, and moreover, gives to hair after shampooing a pleasant feeling to the touch and moisture retention properties such as natural smoothness, moist feeling, and suppleness which healthy hair inherently possesses, and has excellent stability.Type: ApplicationFiled: October 7, 2005Publication date: February 16, 2006Applicant: Kao CorporationInventors: Hirokazu Sakai, Hiroto Tanamachi, Yoshimasa Okamoto
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Publication number: 20050013789Abstract: Provided are a preparation process for a hair cosmetic composition having the step of emulsifying an aqueous composition having (A) an amphipathic amide lipid, (B) a quaternary ammonium salt (b-1) or tertiary amine type compound (B-2) or salt thereof, and (C) a higher alcohol (c): ?R?—OH??(c) (wherein, R and R? represents C12-28 aliphatic hydrocarbon, R? represents C1-3 alkyl, X? represents anion, A represents H or amide group having 12 to 24 carbon atoms in total, N-(hydrocarbon carbamoyl), acyloxy or hydrocarbon oxy, B represents C1-22 divalent hydrocarbon, and Y1 and Y2 represents C1-4 alkyl) at a temperature equal to or greater than the melting point of Component (C) but less than the phase transition temperature of a composition composed of Components (B) and (C), each in an amount equal to the content of the intended hair cosmetic composition, and balance water; and a hair cosmetic composition thus obtained.Type: ApplicationFiled: June 18, 2004Publication date: January 20, 2005Applicant: KAO CORPORATIONInventors: Hirokazu Sakai, Yoshimasa Okamoto
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Patent number: D509752Type: GrantFiled: September 7, 2004Date of Patent: September 20, 2005Assignee: Kao CorporationInventors: Hirokazu Sakai, Hiroyuki Hasegawa, Koji Tanaka
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Patent number: D516919Type: GrantFiled: May 2, 2005Date of Patent: March 14, 2006Assignee: Kao CorporationInventors: Hirokazu Sakai, Hiroyuki Hasegawa, Koji Tanaka