Abstract: An aberration corrector includes: a first multipole and a second multipole configured to form a hexapole field; and a transfer optics including a plurality of round lenses. The transfer optics is disposed between the first multipole and the second multipole, and acts on a charged particle beam such that an absolute value of a slope of the charged particle beam passing through the first multipole is different from an absolute value of a slope of the charged particle beam passing through the second multipole.

Abstract: A charged particle beam apparatus includes a movement mechanism, a particle source, an optical element, a detector, and a control mechanism configured to control, based on an observation condition, the movement mechanism, the particle source, the optical element, and the detector. The control mechanism is configured to acquire a diffraction pattern image including a plurality of Kikuchi lines as a comparison image after inclining the movement mechanism by a first angle, evaluate an error between an inclination angle of the sample and a target inclination angle using a reference image of a reference diffraction pattern and the comparison image, and control inclination of the movement mechanism based on an evaluation result.

Abstract: A charged particle beam apparatus includes: a movement mechanism; a particle source; an optical element; a detector; and a control mechanism, in which the control mechanism acquires a diffraction pattern including a plurality of Kikuchi lines, calculates a crystal zone axis of the sample by performing analysis based on a plurality of intersections at which two Kikuchi lines included in the diffraction pattern intersect with each other, calculates an inclination angle of the sample based on the crystal zone axis and an irradiation direction of the charged particle beam, and controls the moving mechanism based on the inclination angle.

Abstract: A charged particle beam device includes: a movement mechanism configured to hold and move a sample; a charged particle source configured to emit charged particles with which the sample is irradiated to obtain an image of the sample; and a control unit configured to control the movement mechanism to move the sample and to obtain the image of the sample. The control unit obtains a reference image of the sample in a reference arrangement state by the charged particles, generates a goal image of the sample in a target arrangement state different from the reference arrangement state by calculation from the reference image, moves the sample to each of different arrangement states by the movement mechanism, obtains a candidate image of the sample in each of the different arrangement states by the charged particles, and generates a comparison result between respective candidate images and the goal image.

Abstract: A charged particle beam system includes: a charged particle beam device configured to emit a charged particle beam from a charged particle source to a sample via a charged particle optical system; and a control system configured to control the charged particle beam device. The control system scans the sample with the charged particle beam in a manner of forming a scan trajectory and determines scores of signal intensities associated with different scan directions in the scan trajectory. The control system generates, based on a relation between the scores and the different scan directions, information on at least one of a focus deviation and an aberration coefficient of the charged particle optical system.

Abstract: A charged particle beam apparatus includes a movement mechanism, a particle source, an optical element, a detector, and a control mechanism configured to control, based on an observation condition, the movement mechanism, the particle source, the optical element, and the detector. The control mechanism is configured to acquire a diffraction pattern image including a plurality of Kikuchi lines as a comparison image after inclining the movement mechanism by a first angle, evaluate an error between an inclination angle of the sample and a target inclination angle using a reference image of a reference diffraction pattern and the comparison image, and control inclination of the movement mechanism based on an evaluation result.

Abstract: A charged particle beam apparatus includes: a movement mechanism; a particle source; an optical element; a detector; and a control mechanism, in which the control mechanism acquires a diffraction pattern including a plurality of Kikuchi lines, calculates a crystal zone axis of the sample by performing analysis based on a plurality of intersections at which two Kikuchi lines included in the diffraction pattern intersect with each other, calculates an inclination angle of the sample based on the crystal zone axis and an irradiation direction of the charged particle beam, and controls the moving mechanism based on the inclination angle.

Abstract: A control system of a charged particle beam apparatus obtains a first coefficient by performing multiple resolution analysis based on wavelet transform or discrete wavelet transform on at least a part of an image or a signal acquired by the charged particle beam apparatus. The control system obtains a second coefficient by performing, on at least a part of the first coefficient or an absolute value of the first coefficient, any one of calculation of a maximum value, calculation of a numerical value corresponding to a specified order in an order related to a magnitude, fitting to a histogram, calculation of an average value, and calculation of a total sum.

Abstract: A measurement system comprising: a measurement apparatus observing a sample based on an observation condition including parameters; and an observation condition database storing data in which a search key related to the sample and the observation condition, a control unit calculating information on an observation condition of a sample is configured to: receive an observation condition search request including a search key related to a target sample; refer the observation condition database to search for the first data matching or similar to the search key related to the target sample included in the observation condition search request, calculate, based on the searched first data, a candidate observation condition of the measurement apparatus for observing the target sample, and output display data for presenting the candidate observation condition.

Abstract: A charged particle beam device includes: a movement mechanism configured to hold and move a sample; a charged particle source configured to emit charged particles with which the sample is irradiated to obtain an image of the sample; and a control unit configured to control the movement mechanism to move the sample and to obtain the image of the sample. The control unit obtains a reference image of the sample in a reference arrangement state by the charged particles, generates a goal image of the sample in a target arrangement state different from the reference arrangement state by calculation from the reference image, moves the sample to each of different arrangement states by the movement mechanism, obtains a candidate image of the sample in each of the different arrangement states by the charged particles, and generates a comparison result between respective candidate images and the goal image.

Abstract: A control system of a charged particle beam apparatus obtains a first coefficient by performing multiple resolution analysis based on wavelet transform or discrete wavelet transform on at least a part of an image or a signal acquired by the charged particle beam apparatus. The control system obtains a second coefficient by performing, on at least a part of the first coefficient or an absolute value of the first coefficient, any one of calculation of a maximum value, calculation of a numerical value corresponding to a specified order in an order related to a magnitude, fitting to a histogram, calculation of an average value, and calculation of a total sum.

Abstract: A measurement system comprising: a measurement apparatus observing a sample based on an observation condition including parameters; and an observation condition database storing data in which a search key related to the sample and the observation condition, a control unit calculating information on an observation condition of a sample is configured to: receive an observation condition search request including a search key related to a target sample; refer the observation condition database to search for the first data matching or similar to the search key related to the target sample included in the observation condition search request, calculate, based on the searched first data, a candidate observation condition of the measurement apparatus for observing the target sample, and output display data for presenting the candidate observation condition.

Abstract: A charged particle beam device wherein a transmission image corresponding to an arbitrary diffraction spot or a diffraction pattern corresponding to a partial range in the transmission image are easily and automatically captured. A charged particle beam device having: an image-capturing unit for forming an image of a sample; a diaphragm disposed in the image-capturing unit, a plurality of openings having different sizes for transmitting an electron beam from the sample being formed in the diaphragm; a movement unit for varying the position of the diaphragm; and a display unit for displaying the formed image, wherein when the operator selects, e.g., a diffraction spot (A) on the display unit, the movement unit moves the diaphragm from the positional relationship between the diaphragm and the image in accordance with the position of the diffraction spot (A).

Abstract: An electron microscope for observation by illuminating an electron beam on a specimen, includes: an edge element disposed in a diffraction plane where a direct beam not diffracted by but transmitted through the specimen converges or a plane equivalent to the diffraction plane; and a control unit for controlling the electron beam or the edge element. The edge element includes a blocking portion for blocking the electron beam, and an aperture for allowing the passage of the electron beam. The aperture is defined by an edge of the blocking portion in a manner that the edge surrounds a convergence point of the direct beam in the diffraction plane. The control unit varies contrast of an observation image by shifting, relative to the edge, the convergence point of the direct beam along the edge while maintaining a predetermined distance between the convergence point of the direct beam and the edge.

Abstract: An electron microscope for observation by illuminating an electron beam on a specimen, includes: an edge element disposed in a diffraction plane where a direct beam not diffracted by but transmitted through the specimen converges or a plane equivalent to the diffraction plane; and a control unit for controlling the electron beam or the edge element. The edge element includes a blocking portion for blocking the electron beam, and an aperture for allowing the passage of the electron beam. The aperture is defined by an edge of the blocking portion in a manner that the edge surrounds a convergence point of the direct beam in the diffraction plane. The control unit varies contrast of an observation image by shifting, relative to the edge, the convergence point of the direct beam along the edge while maintaining a predetermined distance between the convergence point of the direct beam and the edge.

Abstract: A charged particle beam device wherein a transmission image corresponding to an arbitrary diffraction spot or a diffraction pattern corresponding to a partial range in the transmission image are easily and automatically captured. A charged particle beam device having: an image-capturing unit for forming an image of a sample; a diaphragm disposed in the image-capturing unit, a plurality of openings having different sizes for transmitting an electron beam from the sample being formed in the diaphragm; a movement unit for varying the position of the diaphragm; and a display unit for displaying the formed image, wherein when the operator selects, e.g., a diffraction spot (A) on the display unit, the movement unit moves the diaphragm from the positional relationship between the diaphragm and the image in accordance with the position of the diffraction spot (A).

Abstract: In general, in a multipole lens of an aberration corrector of a charged particle beam device, there is only one condition that can be set where both a spherical aberration correction condition and magnetic saturation are satisfied. Therefore, a plurality of acceleration voltages cannot be handled. Consequently, the present invention provides a spherical aberration corrector that satisfies the magnetic saturation state for a plurality of aberration correction conditions by selectively magnetizing a plurality of pole groups of the multipole lens according to the changes in the objective lens magnetization current.

Abstract: In general, in a multipole lens of an aberration corrector of a charged particle beam device, there is only one condition that can be set where both a spherical aberration correction condition and magnetic saturation are satisfied. Therefore, a plurality of acceleration voltages cannot be handled. Consequently, the present invention provides a spherical aberration corrector that satisfies the magnetic saturation state for a plurality of aberration correction conditions by selectively magnetizing a plurality of pole groups of the multipole lens according to the changes in the objective lens magnetization current.

Abstract: Provided is a phase plate for use in an electron microscope which lessens the problem of image information loss caused by interruption of an electron beam and ameliorates the problem of anisotropic potential distributions. This phase plate comprises openings (23) connected into a single opening, and multiple electrodes (11) arranged in the opening from the outer portion of the opening towards the center of the opening. The cross sections of the electrodes (11) are configured such that a voltage application layer (24) comprising a conductor or a semiconductor is covered by a shield layer comprising a conductor or a semiconductor with an intermediate insulating layer. By this means, this phase plate is capable of lessening electron beam interruption due to the electrodes (11), and of ameliorating the problem of anisotropic potential distributions.

Abstract: Provided is a phase plate for use in an electron microscope which lessens the problem of image information loss caused by interruption of an electron beam and ameliorates the problem of anisotropic potential distributions. This phase plate comprises openings (23) connected into a single opening, and multiple electrodes (11) arranged in the opening from the outer portion of the opening towards the center of the opening. The cross sections of the electrodes (11) are configured such that a voltage application layer (24) comprising a conductor or a semiconductor is covered by a shield layer comprising a conductor or a semiconductor with an intermediate insulating layer. By this means, this phase plate is capable of lessening electron beam interruption due to the electrodes (11), and of ameliorating the problem of anisotropic potential distributions.