Patents by Inventor Hiroki Endo
Hiroki Endo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250066916Abstract: A processing apparatus includes: a processing container having a substantially cylindrical shape and provided with an exhaust slit on a side wall; and a first pair of gas nozzles extending in a vertical direction along an inside of the side wall of the processing container and disposed symmetrically with respect to a straight line extending from a center of the exhaust slit to a portion of the side wall positioned opposite to the exhaust slit via a center of the processing container; a second pair of gas nozzle disposed symmetrically with respect to the straight line; at least one memory storing executable instructions; and at least one processor configured to execute the executable instructions to: control the first pair of gas nozzles and the second pair of gas nozzles to eject a same processing gas into the processing container.Type: ApplicationFiled: November 12, 2024Publication date: February 27, 2025Inventors: Hiroki IRIUDA, Yoichiro CHIBA, Atsushi ENDO
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Publication number: 20240375513Abstract: A MET and a HUD are provided inside a cabin of an host vehicle so as to be capable of being viewed by an occupant. An acquisition section is configured to acquire information regarding surrounding objects around the host vehicle. A control section is configured to suppress display on the HUD of an image of a surrounding object other than a first preceding vehicle traveling ahead in a current traveling lane of the host vehicle from out of images of surrounding objects for which the information has been acquired by the acquisition section. The control section also displays the first preceding vehicle and other surrounding objects on the MET, with display of the other surrounding objects being incrementally toned-down according to their importance level.Type: ApplicationFiled: July 22, 2024Publication date: November 14, 2024Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHAInventor: Hiroki ENDO
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Patent number: 12106948Abstract: A plasma processing apparatus includes a chamber; an apparatus-side controller configured to control plasma processing in the chamber; and a monitoring unit configured to monitor a monitoring target that is disposed within the chamber, or is connected directly or indirectly to the chamber. The apparatus-side controller sets the monitoring target and a timing at which monitoring target information is to be acquired. The monitoring unit acquires the monitoring target information transmitted from the monitoring target to the apparatus-side controller, detects an occurrence of an abnormality in the chamber based on the monitoring target information, and controls the monitoring target for the chamber in which the abnormality occurs.Type: GrantFiled: February 1, 2022Date of Patent: October 1, 2024Assignee: Tokyo Electron LimitedInventors: Ken Hirano, Hiroki Endo
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Patent number: 12086663Abstract: The inkjet printing apparatus is configured to be able to execute a batch adjustment process of performing a plurality of times of adjustment processes related to printing in succession based on one instruction from an outside. The conveyance control unit maintains the conveyance speed at a first speed in a period when a chart printing process is performed and a period when a chart imaging process is performed. The conveyance control unit decreases the conveyance speed from the first speed to the second speed after the end of the chart imaging process in an adjustment process except for an adjustment process that is performed last in the batch adjustment process, and increases the conveyance speed from the second speed to the first speed before the start of the chart printing process in an adjustment process that is performed next.Type: GrantFiled: June 7, 2023Date of Patent: September 10, 2024Assignee: SCREEN HOLDINGS CO., LTD.Inventors: Shigenori Arizono, Kohei Ueda, Ryoko Sakurai, Yuya Takagi, Hiroki Endo, Kenichi Yokouchi, Tomotaka Kato, Asuka Muramatsu, Kensuke Usui
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Publication number: 20240290577Abstract: A substrate processing apparatus comprises a power storage part and at least one unit or member that uses a power. Charges stored in the power storage part are supplied, as a power, to the unit or the member.Type: ApplicationFiled: May 10, 2024Publication date: August 29, 2024Applicant: Tokyo Electron LimitedInventors: Shinya ISHIKAWA, Shinya TAMONOKI, Naoki MATSUMOTO, Naoki MIHARA, Naoki FUJIWARA, Koichi NAGAMI, Nozomu NAGASHIMA, Hiroki ENDO
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Patent number: 12071010Abstract: A MET and a HUD are provided inside a cabin of an host vehicle so as to be capable of being viewed by an occupant. An acquisition section is configured to acquire information regarding surrounding objects around the host vehicle. A control section is configured to suppress display on the HUD of an image of a surrounding object other than a first preceding vehicle traveling ahead in a current traveling lane of the host vehicle from out of images of surrounding objects for which the information has been acquired by the acquisition section. The control section also displays the first preceding vehicle and other surrounding objects on the MET, with display of the other surrounding objects being incrementally toned-down according to their importance level.Type: GrantFiled: August 10, 2021Date of Patent: August 27, 2024Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHAInventor: Hiroki Endo
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Publication number: 20240155737Abstract: A substrate processing system includes a stage on which a substrate is placed, a heater configured to heat the substrate by being supplied with power, a power supply part configured to supply power to the heater, a sensor configured to measure a resistance value of the heater, and a controller. The controller is configured to: store a conversion table in which a plurality of resistance values are associated with a plurality of temperatures; and acquire a reference resistance value measured by the sensor when a heater temperature is equal to a reference temperature. The controller is further configured to: acquire a temperature adjustment resistance value measured by the sensor after the substrate is heated by the heater; and control the power supply part based on the conversion table, the reference temperature, the reference resistance value, and the temperature adjustment resistance value.Type: ApplicationFiled: January 15, 2024Publication date: May 9, 2024Inventors: Hiroki ENDO, Kenichiro NAKAMURA
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Publication number: 20240128064Abstract: There is provided a component replacement method comprising: a) connecting a component replacement device to a chamber of a processing device configured to process a substrate; b) inserting an end effector disposed at a tip end of a transfer arm in the component replacement device into the chamber, and measuring a first distance from a predetermined position in the chamber to the end effector using a distance sensor provided on the end effector; c) moving the end effector until a difference between the first distance and a predetermined second distance becomes less than a predetermined third distance; d) capturing a feature disposed at a predetermined position in the chamber by a camera provided on the end effector; e) moving the end effector so that the feature is captured in a predetermined position in an image captured by the camera; and f) replacing a component in the chamber using the end effector with reference to a position of the end effector in a state where the feature is captured in the predeterminType: ApplicationFiled: May 27, 2022Publication date: April 18, 2024Applicant: Tokyo Electron LimitedInventors: Hiroki ENDO, Suguru SATO
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Patent number: 11923211Abstract: A correction data creating method is provided. In the method, a source voltage is sequentially selected among a plurality of source voltages determined in advance and the selected source voltage is supplied to a heater for heating a substrate support. At the source voltage supplied to the heater, a power supplied to the heater is adjusted such that a resistance of the heater becomes a resistance value corresponding to a predetermined first temperature based on temperature conversion data indicating a relationship between the resistance of the heater and a temperature of the heater. A temperature of the substrate support is measured at a position where the heater is disposed as a second temperature. A correction value corresponding to the difference between the predetermined first temperature and the second temperature is calculated, and correction data indicating a corresponding relationship between each of the source voltages and the correction value is created.Type: GrantFiled: June 24, 2020Date of Patent: March 5, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Hiroki Endo, Tomohisa Kitayama
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Patent number: 11917729Abstract: A substrate processing system includes a stage on which a substrate is placed, a heater configured to heat the substrate by being supplied with power, a power supply part configured to supply power to the heater, a sensor configured to measure a resistance value of the heater, and a controller. The controller is configured to: store a conversion table in which a plurality of resistance values are associated with a plurality of temperatures; and acquire a reference resistance value measured by the sensor when a heater temperature is equal to a reference temperature. The controller is further configured to: acquire a temperature adjustment resistance value measured by the sensor after the substrate is heated by the heater; and control the power supply part based on the conversion table, the reference temperature, the reference resistance value, and the temperature adjustment resistance value.Type: GrantFiled: June 19, 2019Date of Patent: February 27, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Hiroki Endo, Kenichiro Nakamura
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Publication number: 20240006165Abstract: A plasma processing apparatus includes a plasma processing chamber; a base; an electrostatic chuck; a plurality of electrode layers disposed in the same plane within the electrostatic chuck; a switch group including a plurality of first switches electrically connected to the electrode layers, respectively; a power supply and a measurement unit that are electrically connected to the switch group; a second switch that selects either the power supply or the measurement unit as a connection destination of the switch group; and a controller. The power supply includes a power source that supplies a power to the electrode layers. The measurement unit includes a resistor and a voltmeter that measures a voltage applied to the resistor. The controller is capable of executing a control operation that includes switching the connection destination of the switch group to the measurement unit and then turning ON the plurality of first switches one by one.Type: ApplicationFiled: June 29, 2023Publication date: January 4, 2024Applicant: Tokyo Electron LimitedInventors: Yoshihiro YANAGI, Hiroki ENDO, Tong WU
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Publication number: 20230419065Abstract: The inkjet printing apparatus is configured to be able to execute a batch adjustment process of performing a plurality of times of adjustment processes related to printing in succession based on one instruction from an outside. The conveyance control unit maintains the conveyance speed at a first speed in a period when a chart printing process is performed and a period when a chart imaging process is performed. The conveyance control unit decreases the conveyance speed from the first speed to the second speed after the end of the chart imaging process in an adjustment process except for an adjustment process that is performed last in the batch adjustment process, and increases the conveyance speed from the second speed to the first speed before the start of the chart printing process in an adjustment process that is performed next.Type: ApplicationFiled: June 7, 2023Publication date: December 28, 2023Inventors: Shigenori ARIZONO, Kohei Ueda, Ryoko Sakurai, Yuya Takagi, Hiroki Endo, Kenichi Yokouchi, Tomotaka Kato, Asuka Muramatsu, Kensuke Usui
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Patent number: 11778124Abstract: A computer analyzes submitted data to identify insufficient data among data necessary for executing C×F color conversion process. When spectral characteristic data of a patch constituting a C×F chart is insufficient, a computer supplements the spectral characteristic data. When complete printing order data has not been obtained, the computer supplements printing order data. The color conversion process is performed using the data after supplement.Type: GrantFiled: December 5, 2022Date of Patent: October 3, 2023Assignee: SCREEN HOLDINGS CO., LTD.Inventor: Hiroki Endo
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Patent number: 11694881Abstract: A stage according to an exemplary embodiment has an electrostatic chuck. The electrostatic chuck has a base and a chuck main body. The chuck main body is provided on the base and configured to hold a substrate with electrostatic attractive force. The chuck main body has a plurality of first heaters and a plurality of second heaters. The number of second heaters is larger than the number of first heaters. The first heater controller drives the plurality of first heaters by an alternating current output or a direct current output from a first power source. The second heater controller drives the plurality of second heaters by an alternating current output or a direct current output from a second power source which has electric power lower than electric power of the output from the first power source.Type: GrantFiled: December 18, 2020Date of Patent: July 4, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Hiroki Endo, Katsuyuki Koizumi, Naohiko Okunishi
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Publication number: 20230191850Abstract: A tire includes a plurality of circumferential main grooves extending in a tire circumferential direction, and a pair of shoulder land portions and one or more rows of center land portions defined by the plurality of circumferential main grooves. Further, at least one of the pair of shoulder land portions includes a plurality of shoulder lug grooves and a plurality of shoulder blocks defined and formed by the plurality of shoulder lug grooves. Additionally, at least a part of the plurality of shoulder blocks includes a notch portion that connects edge portions separated from a tire ground contact edge and a buttress portion. Additionally, the notch portion has a step-shaped wall surface in a cross-sectional view in a tire meridian direction.Type: ApplicationFiled: December 16, 2022Publication date: June 22, 2023Inventor: Hiroki ENDO
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Publication number: 20230188667Abstract: A computer analyzes submitted data to identify insufficient data among data necessary for executing C×F color conversion process. When spectral characteristic data of a patch constituting a C×F chart is insufficient, a computer supplements the spectral characteristic data. When complete printing order data has not been obtained, the computer supplements printing order data. The color conversion process is performed using the data after supplement.Type: ApplicationFiled: December 5, 2022Publication date: June 15, 2023Inventor: Hiroki Endo
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Publication number: 20230071478Abstract: There is a substrate processing apparatus comprising: a chamber including a sidewall having an opening; a substrate support disposed in the chamber; a support member disposed above the substrate support; an inner wall member having a ceiling portion disposed above the substrate support and below the support member; a contact member attached to one of the support member and the inner wall member and configured to detachably fix the inner wall member to the support member by applying a spring reaction force to the other of the support member and the inner wall member in a horizontal direction; and an actuator configured to move the inner wall member downward to release the fixing of the inner wall member to the support member.Type: ApplicationFiled: September 6, 2022Publication date: March 9, 2023Applicant: Tokyo Electron LimitedInventors: Hiroki Endo, Nozomu Nagashima, Suguru Sato, Koei Ito, Taisei Seguchi, Dai Kitagawa
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Patent number: 11581168Abstract: A plasma processing apparatus includes a chamber; a substrate support having a lower electrode, an electrostatic chuck, and a heater; a radio frequency power supply; a DC power supply; a first controller; and a second controller. The first controller controls the radio frequency power supply to supply a pulsed radio frequency power to the lower electrode periodically with a cycle defined by a first frequency, and controls the DC power supply to apply a pulsed negative voltage to the edge ring periodically with the cycle. The second controller includes a heater controller that controls the power by obtaining a resistance value of the heater from sample values of a current and a voltage supplied to the heater. The first frequency is different from a second frequency that is a sampling frequency of the sample value of the current and the sample value of the voltage in the second controller.Type: GrantFiled: January 27, 2022Date of Patent: February 14, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Kazuhito Yamada, Hiroki Endo, Takashi Sato
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Publication number: 20230009135Abstract: A tire includes a plurality of side blocks arrayed at a predetermined interval in a tire circumferential direction in a buttress portion. The side blocks include a short portion and a long portion arrayed in a Y shape and a slit that defines a connection portion of the short portion and the long portion and are disposed with a top portion of the Y shape facing toward an inner side in a tire radial direction. A radial height Hb of the side blocks is in the range 0.20?Hb/SH?0.50 with respect to a tire cross-sectional height SH.Type: ApplicationFiled: July 5, 2022Publication date: January 12, 2023Inventor: Hiroki ENDO
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Patent number: D1042312Type: GrantFiled: December 2, 2022Date of Patent: September 17, 2024Assignee: THE YOKOHAMA RUBBER CO., LTD.Inventors: Hiroki Endo, Noboru Kuwahara