Patents by Inventor Hiroki Hane

Hiroki Hane has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
    Patent number: 7369213
    Abstract: To provide an exposure method and an exposure apparatus, using a complementary divided mask, designed to enable alignment of a complementary divided mask at a high precision over the entire region of a semiconductor wafer. Further, to provide a semiconductor device fabricated by the exposure method and a method of producing a semiconductor device using the exposure method.
    Type: Grant
    Filed: January 5, 2007
    Date of Patent: May 6, 2008
    Assignee: Sony Corporation
    Inventors: Shinichiro Noudo, Kumiko Oguni, Hiroyuki Nakano, Hiroki Hane
  • Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
    Publication number: 20070111116
    Abstract: To provide an exposure method and an exposure apparatus, using a complementary divided mask, designed to enable alignment of a complementary divided mask at a high precision over the entire region of a semiconductor wafer. Further, to provide a semiconductor device fabricated by the exposure method and a method of producing a semiconductor device using the exposure method.
    Type: Application
    Filed: January 5, 2007
    Publication date: May 17, 2007
    Inventors: Shinichiro Noudo, Kumiko Oguni, Hiroyuki Nakano, Hiroki Hane
  • Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
    Patent number: 7160655
    Abstract: To provide an exposure method and an exposure apparatus, using a complementary divided mask, designed to enable alignment of a complementary divided mask at a high precision over the entire region of a semiconductor wafer. Further, to provide a semiconductor device fabricated by the exposure method and a method of producing a semiconductor device using the exposure method.
    Type: Grant
    Filed: May 16, 2005
    Date of Patent: January 9, 2007
    Assignee: Sony Corporation
    Inventors: Shinichiro Noudo, Kumiko Oguni, Hiroyuki Nakano, Hiroki Hane
  • Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
    Patent number: 6969571
    Abstract: To provide an exposure method and an exposure apparatus, using a complementary divided mask, designed to enable alignment of a complementary divided mask at a high precision over the entire region of a semiconductor wafer. Further, to provide a semiconductor device fabricated by the exposure method and a method of producing a semiconductor device using the exposure method.
    Type: Grant
    Filed: November 29, 2002
    Date of Patent: November 29, 2005
    Assignee: Sony Corporation
    Inventors: Shinichiro Noudo, Kumiko Oguni, Hiroyuki Nakano, Hiroki Hane
  • Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
    Publication number: 20050208395
    Abstract: To provide an exposure method and an exposure apparatus, using a complementary divided mask, designed to enable alignment of a complementary divided mask at a high precision over the entire region of a semiconductor wafer. Further, to provide a semiconductor device fabricated by the exposure method and a method of producing a semiconductor device using the exposure method.
    Type: Application
    Filed: May 16, 2005
    Publication date: September 22, 2005
    Inventors: Shinichiro Noudo, Kumiko Oguni, Hiroyuki Nakano, Hiroki Hane
  • Exposure method and exposure apparatus using complementary division mask, and semiconductor device and method for making the same
    Publication number: 20040072086
    Abstract: To provide an exposure method and an exposure apparatus, using a complementary divided mask, designed to enable alignment of a complementary divided mask at a high precision over the entire region of a semiconductor wafer. Further, to provide a semiconductor device fabricated by the exposure method and a method of producing a semiconductor device using the exposure method.
    Type: Application
    Filed: July 28, 2003
    Publication date: April 15, 2004
    Inventors: Shinichiro Noudo, Kumiko Oguni, Hiroyuki Nakano, Hiroki Hane