Abstract: Provided are a desmearing method and a desmearing device which are able to reliably remove a smear derived from any of an inorganic substance and an organic substance, and eliminate the need to use a chemical that requires a waste liquid treatment. The desmearing method of the present invention is directed to a desmearing method for a wiring substrate material that is a laminated body of insulating layers made from resin containing a filler and a conductive layer, and includes an ultraviolet irradiation treatment step for irradiating the wiring substrate material with ultraviolet beams with a wavelength of 220 nm or less, and a physical vibration treatment step for applying physical vibrations to the wiring substrate material which has undergone the ultraviolet irradiation treatment step.

Abstract: Disclosed herein is an optical processing device and an optical processing method. The optical processing device comprises: a light source unit configured to emit light; and a processing unit configured to expose an object to be processed to the light emitted from the light source unit. The processing unit includes: a processing region in which the object to be processed is held and exposed to the light in an atmosphere of a processing gas; and a preparatory region through which the processing gas passes, while being exposed to the light, to move toward the processing region, the preparatory region being configured to prevent the object to be processed from being arranged thereon.

Abstract: A semiconductor device includes a first MOS transistor and a second MOS transistor of a second conductivity type. The first MOS transistor includes a first main electrode connected to a first potential and a second main electrode connected to a second potential. The second MOS transistor includes a first main electrode connected to a control electrode of the first MOS transistor and a second main electrode connected to the second potential. The control electrodes of the first and second MOS transistors are connected in common. The first and second MOS transistors are formed on a common wide bandgap semiconductor substrate. In the first MOS transistor, a main current flows in a direction perpendicular to a main surface of the wide bandgap semiconductor substrate. In the second MOS transistor, a main current flows in a direction parallel to the main surface of the wide bandgap semiconductor substrate.

Abstract: The present invention has as its object the provision of a desmear treatment device and a desmear treatment method capable of reliably performing a desmear treatment with high treatment efficiency. In the desmear treatment method of the present invention, when irradiating a to-be-treated object disposed in a treatment space with vacuum ultraviolet rays via an ultraviolet transmitting window member to remove smear in the to-be-treated object, a treatment gas containing active species to be activated by the irradiation of the vacuum ultraviolet rays and having contained moisture is supplied into the treatment space. The desmear treatment device includes treatment gas supply means having a humidifying mechanism for causing a treatment gas containing active species to be activated by vacuum ultraviolet rays from an ultraviolet light source to contain moisture.

Abstract: The present invention has as its object the provision of a desmear treatment device and a desmear treatment method capable of reliably performing a desmear treatment with high treatment efficiency. In the desmear treatment method of the present invention, when irradiating a to-be-treated object disposed in a treatment space with vacuum ultraviolet rays via an ultraviolet transmitting window member to remove smear in the to-be-treated object, a treatment gas containing active species to be activated by the irradiation of the vacuum ultraviolet rays and having contained moisture is supplied into the treatment space. The desmear treatment device includes treatment gas supply means having a humidifying mechanism for causing a treatment gas containing active species to be activated by vacuum ultraviolet rays from an ultraviolet light source to contain moisture.

Abstract: The present invention has as its object the provision of a desmear treatment device and a desmear treatment method capable of sufficiently removing smear remaining in a to-be-treated object in a short amount of time. The desmear treatment device of the present invention includes: a treatment chamber in which a to-be-treated object is disposed; a light source unit in which an ultraviolet lamp for irradiating the to-be-treated object with ultraviolet rays is housed; a light transmissive window that is disposed between the treatment chamber and the light source unit and that transmits the ultraviolet rays from the ultraviolet lamps; and treatment gas supply means for supplying a treatment gas containing a source of active species to the treatment chamber. The treatment gas supply means includes a treatment gas supply source and a control unit for controlling a supplied amount of the treatment gas from the treatment gas supply source.

Abstract: Provided are a desmearing method and a desmearing device which are able to reliably remove a smear derived from any of an inorganic substance and an organic substance, and eliminate the need to use a chemical that requires a waste liquid treatment. The desmearing method of the present invention is directed to a desmearing method for a wiring substrate material that is a laminated body of insulating layers made from resin containing a filler and a conductive layer, and includes an ultraviolet irradiation treatment step for irradiating the wiring substrate material with ultraviolet beams with a wavelength of 220 nm or less, and a physical vibration treatment step for applying physical vibrations to the wiring substrate material which has undergone the ultraviolet irradiation treatment step.

Abstract: A template washing method and a photowashing apparatus which ensure removal of resist residual remaining on a pattern surface of a template, a pattern forming method and a nanoimprint apparatus which ensure formation of patterns with fewer defects are provided. The template washing method of the invention for photowashing the pattern surface of the template used in nanoimprint includes a vacuum-ultraviolet light irradiation process for irradiating the pattern surface of the template with vacuum ultraviolet light under an atmosphere of dry air.

Abstract: A template washing method and a photowashing apparatus which ensure removal of resist residual remaining on a pattern surface of a template, a pattern forming method and a nanoimprint apparatus which ensure formation of patterns with fewer defects are provided. The template washing method of the invention for photowashing the pattern surface of the template used in nanoimprint includes a vacuum-ultraviolet light irradiation process for irradiating the pattern surface of the template with vacuum ultraviolet light under an atmosphere of dry air.