Patents by Inventor Hiroki Kintaka

Hiroki Kintaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PLASMA ETCHING METHOD
    Publication number: 20130071955
    Abstract: A method for processing a substrate to form a desired pattern by an etching process after forming a mask pattern over the substrate includes the steps of: forming two layers over the substrate; measuring a width of the mask pattern or an etched pattern of one of the two layers; and adjusting a flow rate of any one of HBr and other gases, used in the etching process, based on the measured width. The two layers may include a silicon nitride layer and an organic dielectric layer.
    Type: Application
    Filed: September 16, 2011
    Publication date: March 21, 2013
    Applicant: Tokyo Electron Limited
    Inventors: Hiroki Kintaka, Toshihisa Ozu, Masahiko Takahashi