Patents by Inventor Hiroki MOTOYAMA

Hiroki MOTOYAMA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
    Publication number: 20220244629
    Abstract: The present invention provides a method for producing a radiation-sensitive resin composition, in which an inter-lot variation in performance of radiation-sensitive resin compositions that have been filtered is suppressed, a pattern forming method, and a method for producing an electronic device. The method for producing a radiation-sensitive resin composition of an embodiment of the present invention has a step 1 of bringing a first solution including a first organic solvent into contact with a first filter to clean the first filter, and a step 2 of filtering a radiation-sensitive resin composition using the first filter cleaned in the step 1.
    Type: Application
    Filed: April 6, 2022
    Publication date: August 4, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Takumi TANAKA, Takashi BANNAI, Hiroyuki EZOE, Shoichiro IWAGAYA, Hiroki MOTOYAMA, Kenichi HARADA