Abstract: An air purifier includes a detection apparatus, calculates a relative value of the number of microorganisms detected from airborne particles by the detection apparatus to a prescribed total value, and determines a central angle ? corresponding to the relative value. Further, regarding the number of airborne particles other than microorganisms detected by the detection apparatus as the number of dusts, relative value of dust particles to a prescribed total value is calculated, and the central angle ? corresponding to the relative value is determined. On a display panel, the amount of microorganisms is displayed as a bacteria meter by the area from the start position to the angle ?, and by the following area to the angle ?, the number of dusts is displayed as a dust meter, in a circle graph.

Abstract: A light receiving element provides a current signal corresponding to an amount of received light scattered by suspended particles moving at a predetermined speed to a pulse width measurement circuit and a current-voltage conversion circuit via a filter circuit. A pulse width measured from the current signal is converted into a voltage value based on a predetermined relationship by a pulse width-voltage conversion circuit, and is provided to a voltage comparison circuit. The current-voltage conversion circuit converts a peak value of the current signal into a voltage value, and an amplifier circuit amplifies the signal at a predetermined amplification factor and provides the same to the voltage comparison circuit. The voltage comparison circuit uses the voltage value converted from the pulse width as a boundary value, and the suspended particles causing the scattered light are detected as microorganisms when the peak voltage value is smaller than the boundary value.

Abstract: An apparatus for controlling the distortion of a reticle (28) includes a temperature adjuster (258) and a control system (226). The temperature adjuster (258) includes a plurality of adjuster elements (258E) that individually adjust the temperature of a plurality of regions (28R) of the reticle (28). The control system (226) includes a state observer (250) and a controller (260). The state observer (250) estimates an estimated physical condition (250C) of the reticle (28). The controller (260) controls the adjuster elements (258E) of the temperature adjuster (258) based at least in part on the estimated physical condition (250C).

Abstract: After exposure of a divided area on a wafer is completed, for exposure of the next divided area, a control unit sends configuration information on control parameters necessary to expose the next divided area to a stage control system, sometime before the stage control system begins deceleration of a reticle stage and a wafer stage in a scanning direction. Therefore, both stages do not have to be suspended before acceleration for the stage control system to receive the configuration information on control parameters necessary to expose the next divided area, and since suspension time is not required, throughput can be improved. In this case, no serious problems occur, so the performance of other devices is not disturbed.

Abstract: After exposure of a divided area on a wafer is completed, for exposure of the next divided area, a control unit sends configuration information on control parameters necessary to expose the next divided area to a stage control system, sometime before the stage control system begins deceleration of a reticle stage and a wafer stage in a scanning direction. Therefore, both stages do not have to be suspended before acceleration for the stage control system to receive the configuration information on control parameters necessary to expose the next divided area, and since suspension time is not required, throughput can be improved. In this case, no serious problems occur, so the performance of other devices is not disturbed.