Patents by Inventor Hiroki Sunada

Hiroki Sunada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9284657
    Abstract: A replenisher which is capable of supplying Zr ions to a metal surface treatment solution, while suppressing an increase in the HF concentration in the metal surface treatment solution, so that a chemical conversion coating film can be continuously formed on a steel sheet by electrolysis and contains (A) zirconium hydrofluoric acid or a salt thereof and/or (B) hydrofluoric acid or a salt thereof and (C) a fluorine-free zirconium compound. The total concentration (g/l) of zirconium ions derived from the components (A) and (C) is 20 or more, and the ratio of the total molar amount (MF) of the fluorine ions derived from the components (A) and (B) relative to the total molar amount (MZr) of the zirconium ions derived from the components (A) and (C), namely MF/MZr is 0.01 or more but less than 4.00.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: March 15, 2016
    Assignee: NIHON PARKERIZING CO., LTD.
    Inventors: Yuta Yoshida, Hiroki Sunada, Shigeki Yamamoto, Hidehiro Yamaguchi
  • Publication number: 20150021192
    Abstract: The purpose of the present invention is to provide a replenisher which is capable of supplying Zr ions to a metal surface treatment solution, while suppressing an increase in the HF concentration in the metal surface treatment solution, so that a chemical conversion coating film can be continuously formed on a steel sheet by electrolysis. A replenisher of the present invention is a replenisher which is used for the purpose of supplying zirconium ions to a metal surface treatment solution that contains zirconium ions and fluorine ions, and the replenisher contains (A) zirconium hydrofluoric acid or a salt thereof and/or (B) hydrofluoric acid or a salt thereof and (C) a fluorine-free zirconium compound.
    Type: Application
    Filed: November 30, 2011
    Publication date: January 22, 2015
    Inventors: Yuta Yoshida, Hiroki Sunada, Shigeki Yamamoto, Hidehiro Yamaguchi