Abstract: A substrate processing system provided with a plurality of apparatuses to perform a patterning on a plurality of the substrates, wherein a transfer container accommodating the plurality of substrates is transferred to the plurality of apparatuses in a sequential manner. The substrate processing system includes: a first apparatus of the plurality of apparatuses, which is configured to form a metal-containing resist film on each substrate; a second apparatus of the plurality of apparatuses, which is configured to perform a development on the metal-containing resist film after exposure; and an atmosphere regulator having an accommodation space where the substrates, on each of which the metal-containing resist film before being subjected to the development is formed, are accommodated and configured to regulate an atmosphere of the accommodation space so as to regulate a degree of progress of a reaction of the metal-containing resist film on each substrate.

Abstract: A substrate transfer method of transferring a substrate on which a metal-containing resist film is formed from a first placement part to a second placement part, includes transferring, depending on an abnormality in a transfer path, the substrate to a standby chamber in which a second atmosphere different from a first atmosphere of the first placement part is formed, without transferring the substrate to the second placement part, and putting the substrate on standby in the second atmosphere.

Abstract: A substrate processing apparatus includes a first transfer path that is a transfer path for a substrate after MOR film formation and before exposure, and a second transfer path that is a transfer path for the substrate after exposure; and one or a plurality of nitrogen atmosphere placement stages provided on at least one of the first transfer path and the second transfer path and configured to place the substrate in an environment with a nitrogen concentration of an atmosphere set higher than that of air.

Abstract: A substrate treatment method includes: developing a substrate which has a coating film of a metal-containing resist formed thereon and has been subjected to an exposure treatment and a heat treatment after the exposure treatment, the developing including: exposing the substrate to an acid atmosphere being an atmosphere containing gas of a weak acid under a pressure of an atmospheric pressure or higher; and removing a product produced by a reaction between the metal-containing resist and the gas of the weak acid, by heating the substrate.

Abstract: An optical transmission device includes: a reception unit configured to receive a plurality of light beams and wavelength allocation information of optical signals included in each of the light beams; a demultiplexing unit configured to demultiplex the plurality of light beams received; a plurality of switches configured to switch between transmitting or blocking with respect to the demultiplexed plurality of light beams; a multiplexing unit configured to multiplex light beams transmitted from the plurality of switches; a monitoring unit configured to monitor an intensity of the multiplexed light beams; and a controller configured to, based on the wavelength allocation information, obtain a combination of the light beams not including the optical signals having overlapping wavelengths, and control the plurality of switches in accordance with the combination.

Abstract: An optical transmission device includes: a reception unit configured to receive a plurality of light beams and wavelength allocation information of optical signals included in each of the light beams; a demultiplexing unit configured to demultiplex the plurality of light beams received; a plurality of switches configured to switch between transmitting or blocking with respect to the demultiplexed plurality of light beams; a multiplexing unit configured to multiplex light beams transmitted from the plurality of switches; a monitoring unit configured to monitor an intensity of the multiplexed light beams; and a controller configured to, based on the wavelength allocation information, obtain a combination of the light beams not including the optical signals having overlapping wavelengths, and control the plurality of switches in accordance with the combination.

Abstract: The provider network that interconnects user networks includes a plurality of edge routers. At least one of the plurality of edge routers includes an obtaining unit for obtaining information of a packet transferred by the edge router itself, a creating unit for creating a flow list in which flow information of packets transferred from the user network side to the provider network side is registered based on the packet information, a monitoring unit for monitoring a traffic state of a flow of each packet registered in the flow list based on information of packets transferred from the provider network to the user network, and a notifying unit for notifying the traffic state of the flow registered in the flow list to a maintenance engineer.

Abstract: The provider network that interconnects user networks includes a plurality of edge routers. At least one of the plurality of edge routers includes an obtaining unit for obtaining information of a packet transferred by the edge router itself, a creating unit for creating a flow list in which flow information of packets transferred from the user network side to the provider network side is registered based on the packet information, a monitoring unit for monitoring a traffic state of a flow of each packet registered in the flow list based on information of packets transferred from the provider network to the user network, and a notifying unit for notifying the traffic state of the flow registered in the flow list to a maintenance engineer.