Patents by Inventor Hiroki Takei

Hiroki Takei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition for vapor deposition, method for forming an antireflection film, and optical element
    Patent number: 7106515
    Abstract: A method for producing an optical element having a multi-layered antireflection film formed on a synthetic resin substrate, in which the antireflection film formed has good heat resistance, and its heat resistance lowers little with time. At least one high-refraction layer of the multi-layered anti-reflection film contains niobium oxide, zirconium oxide, yttrium oxide, and optionally aluminum oxide. High-refraction layers can be formed within a shorter period of time while not detracting from the good physical properties intrinsic to the layers.
    Type: Grant
    Filed: November 13, 2001
    Date of Patent: September 12, 2006
    Assignee: Hoya Corporation
    Inventors: Takeshi Mitsuishi, Hitoshi Kamura, Kenichi Shinde, Hiroki Takei, Akinori Kobayashi, Yukihiro Takahashi, Yuko Watanabe
  • Method for producing composition for vapor deposition, composition for vapor deposition, and method for producing optical element with antireflection film
    Patent number: 6627320
    Abstract: A method for producing a composition for vapor deposition comprising sintering a vapor source mixture prepared by mixing vapor sources that contain titanium dioxide and niobium pentoxide. The method is capable of forming a high-refraction layer even in low-temperature vapor deposition on a substrate. An antireflection film is formed having good scratch resistance, good chemical resistance and good heat resistance, of which the heat resistance decreases little with time, that is useful in a variety of optical elements.
    Type: Grant
    Filed: November 29, 2001
    Date of Patent: September 30, 2003
    Assignee: Hoya Corporation
    Inventors: Takeshi Mitsuishi, Hitoshi Kamura, Kenichi Shinde, Hiroki Takei, Akinori Kobayashi, Yukihiro Takahashi, Yuko Watanabe
  • Method for producing composition for vapor deposition, composition for vapor deposition, and method for producing optical element with antireflection film
    Publication number: 20020102414
    Abstract: A method for producing a composition for vapor deposition comprising sintering a vapor source mixture prepared by mixing vapor sources that contain titanium dioxide and niobium pentoxide. The method is capable of forming a high-refraction layer even in low-temperature vapor deposition on a substrate. An antireflection film is formed having good scratch resistance, good chemical resistance and good heat resistance, of which the heat resistance decreases little with time, that is useful in a variety of optical elements.
    Type: Application
    Filed: November 29, 2001
    Publication date: August 1, 2002
    Inventors: Takeshi Mitsuishi, Hitoshi Kamura, Kenichi Shinde, Hiroki Takei, Akinori Kobayashi, Yukihiro Takahashi, Yuko Watanabe
  • Composition for vapor deposition, method for forming an antireflection film, and optical element
    Publication number: 20020089751
    Abstract: A method for producing an optical element having a multi-layered antireflection film formed on a synthetic resin substrate, in which the antireflection film formed has good heat resistance, and its heat resistance lowers little with time. At least one high-refraction layer of the multi-layered anti-reflection film contains niobium oxide, zirconium oxide, yttrium oxide, and optionally aluminum oxide. High-refraction layers can be formed within a shorter period of time while not detracting from the good physical properties intrinsic to the layers.
    Type: Application
    Filed: November 13, 2001
    Publication date: July 11, 2002
    Applicant: Hoya Corporation
    Inventors: Takeshi Mitsuishi, Hitoshi Kamura, Kenichi Shinde, Hiroki Takei, Akinori Kobayashi, Yukihiro Takahashi, Yuko Watanabe