Patents by Inventor Hiroki Takei

Hiroki Takei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260138007
    Abstract: A system includes a plurality of main body apparatuses and a plurality of controllers removably attachable to the main body apparatuses. The system includes a receiver that receives from a first main body apparatus, first data corresponding to an appearance of a first controller attached to the first main body apparatus, a generator that generates a third image including a first image that depicts an appearance of the main body apparatus and a second image that depicts the appearance of the first controller based on the first data, and a representation control unit that causes second main body apparatus different from the first main body apparatus to show the third image.
    Type: Application
    Filed: October 27, 2025
    Publication date: May 21, 2026
    Inventors: Taiyo WATANABE, Masayuki SHAMOTO, Masahiro YOSHINO, Hiroki TAKEI, Takahiro KAWAHARA
  • Publication number: 20260016354
    Abstract: A bolt axial force monitoring system is disclosed, enabling detection of bolt loosening from a remote location using a simple structure. The system includes a bolt 1 with a display 2 that changes color based on axial force variation. A sensor (e.g., RGB sensor 4) detects this color change. A first communication unit 51 transmits the sensor data, supported by a power supply. At a remote site, a second communication unit 52 receives the data. A determination unit 10 evaluates the change in axial force from the received data, and an output unit such as a display 11 and storage 12 outputs the evaluated information.
    Type: Application
    Filed: July 14, 2025
    Publication date: January 15, 2026
    Applicant: IKEDA METAL INDUSTRIAL CO., LTD.
    Inventor: Hiroki TAKEI
  • Patent number: 7106515
    Abstract: A method for producing an optical element having a multi-layered antireflection film formed on a synthetic resin substrate, in which the antireflection film formed has good heat resistance, and its heat resistance lowers little with time. At least one high-refraction layer of the multi-layered anti-reflection film contains niobium oxide, zirconium oxide, yttrium oxide, and optionally aluminum oxide. High-refraction layers can be formed within a shorter period of time while not detracting from the good physical properties intrinsic to the layers.
    Type: Grant
    Filed: November 13, 2001
    Date of Patent: September 12, 2006
    Assignee: Hoya Corporation
    Inventors: Takeshi Mitsuishi, Hitoshi Kamura, Kenichi Shinde, Hiroki Takei, Akinori Kobayashi, Yukihiro Takahashi, Yuko Watanabe
  • Patent number: 6627320
    Abstract: A method for producing a composition for vapor deposition comprising sintering a vapor source mixture prepared by mixing vapor sources that contain titanium dioxide and niobium pentoxide. The method is capable of forming a high-refraction layer even in low-temperature vapor deposition on a substrate. An antireflection film is formed having good scratch resistance, good chemical resistance and good heat resistance, of which the heat resistance decreases little with time, that is useful in a variety of optical elements.
    Type: Grant
    Filed: November 29, 2001
    Date of Patent: September 30, 2003
    Assignee: Hoya Corporation
    Inventors: Takeshi Mitsuishi, Hitoshi Kamura, Kenichi Shinde, Hiroki Takei, Akinori Kobayashi, Yukihiro Takahashi, Yuko Watanabe
  • Publication number: 20020102414
    Abstract: A method for producing a composition for vapor deposition comprising sintering a vapor source mixture prepared by mixing vapor sources that contain titanium dioxide and niobium pentoxide. The method is capable of forming a high-refraction layer even in low-temperature vapor deposition on a substrate. An antireflection film is formed having good scratch resistance, good chemical resistance and good heat resistance, of which the heat resistance decreases little with time, that is useful in a variety of optical elements.
    Type: Application
    Filed: November 29, 2001
    Publication date: August 1, 2002
    Inventors: Takeshi Mitsuishi, Hitoshi Kamura, Kenichi Shinde, Hiroki Takei, Akinori Kobayashi, Yukihiro Takahashi, Yuko Watanabe
  • Publication number: 20020089751
    Abstract: A method for producing an optical element having a multi-layered antireflection film formed on a synthetic resin substrate, in which the antireflection film formed has good heat resistance, and its heat resistance lowers little with time. At least one high-refraction layer of the multi-layered anti-reflection film contains niobium oxide, zirconium oxide, yttrium oxide, and optionally aluminum oxide. High-refraction layers can be formed within a shorter period of time while not detracting from the good physical properties intrinsic to the layers.
    Type: Application
    Filed: November 13, 2001
    Publication date: July 11, 2002
    Applicant: Hoya Corporation
    Inventors: Takeshi Mitsuishi, Hitoshi Kamura, Kenichi Shinde, Hiroki Takei, Akinori Kobayashi, Yukihiro Takahashi, Yuko Watanabe