Patents by Inventor Hiroko Inage

Hiroko Inage has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5853869
    Abstract: A thin conductive film which excels in film strength, weather resistance, transparency, and electric field shielding effect is formed on a glass substrate at a low temperature as a multilayer film which is formed of an ITO-dispersed silicate layer and an overcoat silicate layer, or at least two layers of an ITO dispersed silicate and a high-conductivity oxide-dispersed silicate, and a topmost layer of an overcoat silicate. The ITO dispersed silicate layer includes ultra fine particles of indium tin oxide and a silicate-based glass matrix, and the high-conductivity oxide-dispersed silicate layer consists of includes ultra fine particles selected from the group of ruthenium dioxide, rhenium trioxide, iridium dioxide, rhodium dioxide and irridium-based pyrochlore and a silicate-based glass matrix.
    Type: Grant
    Filed: July 14, 1997
    Date of Patent: December 29, 1998
    Assignees: Sumitomo Metal Mining Co., Ltd., Tohoku Chemical Industries, Ltd.
    Inventors: Kenji Adachi, Atsushi Yamanaka, Atsushi Toufuku, Sadahiro Iida, Masaya Yukinobu, Keiichi Orita, Hiroko Inage, Hiromitsu Takeda