Patents by Inventor Hiroko Sakai

Hiroko Sakai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070237890
    Abstract: A negative radiation-sensitive two-layer laminated film for forming bumps includes a lower layer that includes a composition including a polymer (A) with a specific structural unit and an organic solvent (B). A process for forming bumps uses the laminated film. The negative radiation-sensitive two-layer laminated film for forming bumps permits excellent printing of a solder paste, is patternable with good configuration, and is easily peeled from a substrate. The bump-forming process using the laminated film provides the same effects.
    Type: Application
    Filed: February 18, 2005
    Publication date: October 11, 2007
    Applicant: JSR Corporation
    Inventors: Hiroko Sakai, Masaru Ohta, Katsumi Inomata, Shin-ichrio Iwanaga
  • Publication number: 20070231747
    Abstract: A process is provided whereby thick platings such as bumps and wirings are produced with high precision while a resist shows high swelling resistance to a plating solution and the plating solution is prevented from leaking in between the pattern and substrate. A radiation-sensitive negative resin composition shows high sensitivity in the production process and possesses excellent resolution and heat resistance. A transfer film includes the composition.
    Type: Application
    Filed: March 30, 2007
    Publication date: October 4, 2007
    Applicant: JSR Corporation
    Inventors: Nami Onimaru, Hiroko Sakai
  • Patent number: 5413527
    Abstract: A substrate holder containing semiconductor substrates is held in an air-tight container for conveyance which is placed over the entrance of a chamber. The gas drawn by a first fan for circulating gas through the bottom wall of the chamber flows through a first duct for circulating gas so as to be cleaned by a first high-efficiency filter and to be supplied into the chamber again in a horizontal laminar flow. The clean gas is supplied into the chamber in a vertical laminar flow from a second duct for circulating gas which has a second fan for circulating gas and a second high-efficiency filter.
    Type: Grant
    Filed: August 31, 1993
    Date of Patent: May 9, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yoshitaka Dansui, Hiroko Sakai