Abstract: A rotating electrical machine includes a stator and a rotor, the rotor includes a rotor core and a plurality of magnetic poles, the plurality of magnetic poles includes a plurality of magnet poles formed by permanent magnets, and a plurality of dummy poles, the magnet poles and the dummy poles are alternately disposed in both an axial direction and a circumferential direction, non-magnetic holes are provided between the magnet poles and the dummy poles that are adjacent in the axial direction, and when a length of each magnet pole in the axial direction is tm, a length of each dummy pole in the axial direction is tc, a length of each non-magnetic hole in the axial direction is ta, and a length of the rotor core in the axial direction is lc, the rotating electrical machine satisfies tm>tc and lc<(2×tm)+ta.

Abstract: More accurate prediction of reactor water quality of a nuclear reactor is implemented. A device for prediction of reactor water quality of a nuclear reactor in a nuclear power plant is disclosed. The device stores a reactor water quality prediction model which is learned using learning data, and with which future reactor water quality is predicted. An explanatory variable of the reactor water quality prediction model includes a value in a predetermined period unit that is generated from data acquired in an operating nuclear power plant. The device generates the value in a predetermined period unit from data acquired in a target operating nuclear power plant, and acquires a predicted value of the reactor water quality in the target nuclear power plant based on the reactor water quality prediction model and the value in a predetermined period unit.

Abstract: An image forming apparatus includes an electrophotographic photoreceptor that has a photosensitive layer constituting a surface of the electrophotographic photoreceptor, a charging device that charges the surface of the electrophotographic photoreceptor, an electrostatic charge image forming device that forms an electrostatic charge image on the charged surface of the electrophotographic photoreceptor, a developing device that accommodates a developer containing a toner which contains toner particles and an external additive, and develops the electrostatic charge image formed on the surface of the electrophotographic photoreceptor by the developer as a toner image, a transfer device that transfers the toner image formed on the surface of the electrophotographic photoreceptor to a surface of a recording medium, and a cleaning device that includes a cleaning blade coming into contact with the surface of the electrophotographic photoreceptor and cleaning at least residual toner particles on the surface of the el

Abstract: An electrophotographic photoreceptor includes a conductive substrate, and a lamination type photosensitive layer disposed on the conductive substrate and including a charge generation layer and a charge transport layer, in which the charge transport layer contains a charge transport material, at least one of a polyester resin (PEz) or a polycarbonate resin (PCz) that has at least one of a structure (Z1) represented by Formula (Z1) or a structure (Z2) represented by Formula (Z2) at at least one terminal, and a resin (X) that has at least one of a unit (X1) represented by Formula (X1) or a unit (X2) represented by Formula (X2), a mass proportion of the resin (X) in a total amount of the polyester resin (PEz), the polycarbonate resin (PCz), and the resin (X) in the charge transport layer is 0.

Abstract: A nozzle for supplying a fluid includes a tubular part including a tubular passage thereinside and a fluid discharge surface having a plurality of fluid discharge holes formed therein along a lengthwise direction of the tubular passage. A partition plate is provided in the tubular passage and extends along the lengthwise direction so as to partition the tubular passage into a first area including the fluid discharge surface and a second area without the fluid discharge surface. The partition plate has distribution holes whose number is less than a number of the plurality of fluid discharge holes in the lengthwise direction. A fluid introduction passage is in communication with the second area.

Abstract: A method of detoxifying an exhaust pipe in a film forming apparatus configured to supply a raw material gas contending a harmful component and a reaction gas capable of generating a harmless reaction product by reaction with the raw material gas into a process chamber to perform a film forming process on a substrate while independently exhausting the raw material gas and the reaction gas from a raw material exhaust pipe and a reaction gas exhaust pipe connected to the process chamber, respectively, is provided. The method includes supplying the reaction gas into the raw material exhaust pipe to detoxify an interior of the raw material exhaust pipe during a predetermined period in which the film forming apparatus is operated and the film forming process is not performed.

Abstract: A method of depositing a film is provided. In the method, one operation of a unit of film deposition process is performed by carrying a substrate into a processing chamber, by depositing a nitride film on the substrate, and by carrying the substrate out of the processing chamber after finishing depositing the nitride film on the substrate. The one operation is repeated a predetermined plurality of number of times continuously to deposit the nitride film on a plurality of substrates continuously. After that, an inside of the processing chamber is oxidized by supplying an oxidation gas into the processing chamber.

Abstract: A method of detoxifying an exhaust pipe in a film forming apparatus configured to supply a raw material gas contending a harmful component and a reaction gas capable of generating a harmless reaction product by reaction with the raw material gas into a process chamber to perform a film forming process on a substrate while independently exhausting the raw material gas and the reaction gas from a raw material exhaust pipe and a reaction gas exhaust pipe connected to the process chamber, respectively, is provided. The method includes supplying the reaction gas into the raw material exhaust pipe to detoxify an interior of the raw material exhaust pipe during a predetermined period in which the film forming apparatus is operated and the film forming process is not performed.

Abstract: A nozzle for supplying a fluid includes a tubular part including a tubular passage thereinside and a fluid discharge surface having a plurality of fluid discharge holes formed therein along a lengthwise direction of the tubular passage. A partition plate is provided in the tubular passage and extends along the lengthwise direction so as to partition the tubular passage into a first area including the fluid discharge surface and a second area without the fluid discharge surface. The partition plate has distribution holes whose number is less than a number of the plurality of fluid discharge holes in the lengthwise direction. A fluid introduction passage is in communication with the second area.

Abstract: A method of depositing a film is provided. In the method, a first process gas and a second process gas that react with each other is sequentially supplied to cause an atomic layer or a molecular layer of a reaction product of the first process gas and the second process gas to deposit on a substrate in a chamber by repeating a cycle of sequentially supplying the first process gas and the second process gas to the substrate once each cycle. A cycle time of the cycle is set equal to or shorter than 0.5 seconds.

Abstract: A method of depositing a film is provided. In the method, one operation of a unit of film deposition process is performed by carrying a substrate into a processing chamber, by depositing a nitride film on the substrate, and by carrying the substrate out of the processing chamber after finishing depositing the nitride film on the substrate. The one operation is repeated a predetermined plurality of number of times continuously to deposit the nitride film on a plurality of substrates continuously. After that, an inside of the processing chamber is oxidized by supplying an oxidation gas into the processing chamber.

Abstract: A method of depositing a film is provided. In the method, a first process gas and a second process gas that react with each other is sequentially supplied to cause an atomic layer or a molecular layer of a reaction product of the first process gas and the second process gas to deposit on a substrate in a chamber by repeating a cycle of sequentially supplying the first process gas and the second process gas to the substrate once each cycle. A cycle time of the cycle is set equal to or shorter than 0.5 seconds.

Abstract: A method of depositing a film using an atomic layer deposition (ALD) method while rotating a turntable provided inside a chamber and including a substrate mounting portion, onto which a substrate can be mounted, to cause the substrate to pass through first and second process areas, into which different gases to be mutually reacted are respectively supplied, including coating the turntable with the film under a state where the wafer is not mounted onto the turntable, the turntable is rotated, and the substrate mounting portion has a predetermined temperature; and processing to deposit the film on the wafer under a state where the wafer is mounted onto the turntable, the turntable is rotated, and the substrate has a temperature equal to or less than the predetermined temperature.

Abstract: A film deposition apparatus includes a turntable; a first process gas supply portion; a gas nozzle that supplies a second process gas; a nozzle cover that is provided to cover the gas nozzle; a separation gas supply portion, wherein the nozzle cover includes an upper plate portion, and an upstream sidewall portion and a downstream sidewall portion that extend downward from upstream and downstream edge portions of the upper plate portion in a rotational direction of the turntable, respectively, wherein an inner surface of the upstream sidewall portion is formed as an inclined surface that is inclined with respect to a surface of the turntable, and wherein an angle ?1 between the inner surface of the upstream sidewall portion and the surface of the turntable is smaller than an angle ?2 between an inner surface of the downstream sidewall portion and the surface of the turntable.

Abstract: A method of depositing a film using an atomic layer deposition (ALD) method while rotating a turntable provided inside a chamber and including a substrate mounting portion, onto which a substrate can be mounted, to cause the substrate to pass through first and second process areas, into which different gases to be mutually reacted are respectively supplied, including coating the turntable with the film under a state where the wafer is not mounted onto the turntable, the turntable is rotated, and the substrate mounting portion has a predetermined temperature; and processing to deposit the film on the wafer under a state where the wafer is mounted onto the turntable, the turntable is rotated, and the substrate has a temperature equal to or less than the predetermined temperature.

Abstract: A light illumination portion illuminates light to a sample surface. A probe has a tip which is smaller than the wavelength of light illuminated by the light illumination portion, the tip is provided near the sample surface to which the light is illuminated, and scatters the light. A light detection portion detects light scattered by the probe. A scanning portion relatively scans the sample and the tip of the probe. A near field optical microscope has a constitution such that plasmon resonance is generated during scattering by the probe. Another light illumination portion illuminates light to the surface of a sample. Another probe has a tip provided near to the sample, and the tip of the probe generates scattered light originating in light illuminated by the light illumination portion. Another light detection portion detects light scattered by the probe. An illumination light modulation portion modulates the wavelength of the light illuminated by the light illumination portion at a predetermined frequency.

Abstract: A near-field optical microscope comprises an illumination part, a probe, a light detection part, and a scanning part. The illumination part illuminates a sample surface with light. The probe is provided at a position near the sample surface illuminated with the light. The light detection part detects light scattered by the probe. The scanning part scans the sample and a top end of the probe relatively to each, other. The top end of the probe is a top end of an extending part extending in one direction from a body of the probe. In the side of the top end of the extending part, the extending part is at most three times or less as thick as a top end diameter, over a length of a wavelength of the illuminating light. The near-field optical microscope further comprises means for vibrating the probe in a lengthwise direction of the extending part.