Patents by Inventor Hiroko Shimozuma

Hiroko Shimozuma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7568904
    Abstract: A supply part for supplying resin, a smoothing part for smoothing the resin, and an objective lens for exposing the smoothed resin to light are provided in separate positions within substantially the same horizontal plane, and a modeling part is movable by a horizontal drive mechanism under the three above-mentioned components. For processing in the three above-mentioned components, the modeling part is moved to positions immediately under the three above-mentioned components in order by the horizontal drive mechanism. Thus, the modeling part is brought as close to the three above-mentioned components as possible for processing. The exposure is performed, with the objective lens fixed to a base body. Exposure light is focused onto a resin layer on a modeling base, and the light reflected from the resin layer is received by the objective lens, directed by a beam splitter toward an image surface optical system and received as an image by a CCD camera.
    Type: Grant
    Filed: February 22, 2006
    Date of Patent: August 4, 2009
    Assignee: Laser Solutions Co., Ltd.
    Inventors: Yasuyuki Koyagi, Hiroko Shimozuma, Hiroshi Yaze, Ichiro Miyaki
  • Publication number: 20070069744
    Abstract: A photo-fabrication apparatus (1) has a stage (2) for holding a base board (9) thereon, a feeding part (3) for feeding photosensitive material onto the base board (9), a layer forming part (4) for smoothly spreading the fed photosensitive material to form a material layer and a light emitting part (5) for emitting a spatially-modulated light beam onto the material layer. The photo-fabrication apparatus (1) forms a lot of elastic microstructures for fine probe and arranges the microstructures at microscopic intervals in a very small range with high positional accuracy on the base board (9) by repeating formation of a material layer and light emission. The microstructures become elastic probes through plating in a later process.
    Type: Application
    Filed: May 10, 2004
    Publication date: March 29, 2007
    Inventors: Yasuyuki Koyagi, Hiroko Shimozuma, Takayoshi Tanabe, Takao Yashiro
  • Publication number: 20060198918
    Abstract: A supply part for supplying resin, a smoothing part for smoothing the resin, and an objective lens for exposing the smoothed resin to light are provided in separate positions within substantially the same horizontal plane, and a modeling part is movable by a horizontal drive mechanism under the three above-mentioned components. For processing in the three above-mentioned components, the modeling part is moved to positions immediately under the three above-mentioned components in order by the horizontal drive mechanism. Thus, the modeling part is brought as close to the three above-mentioned components as possible for processing. The exposure is performed, with the objective lens fixed to a base body. Exposure light is focused onto a resin layer on a modeling base, and the light reflected from the resin layer is received by the objective lens, directed by a beam splitter toward an image surface optical system and received as an image by a CCD camera.
    Type: Application
    Filed: February 22, 2006
    Publication date: September 7, 2006
    Inventors: Yasuyuki Koyagi, Hiroko Shimozuma, Hiroshi Yaze, Ichiro Miyaki
  • Patent number: 7083405
    Abstract: A photo-fabrication apparatus comprises a stage for holding a photosensitive member which is a substrate coated with a photosensitive material, a head part for emitting a spatially-modulated light beam to said photosensitive member and a computer. The head part has a DMD having a plurality of micromirrors arranged in a two-dimensional array, and a light beam from a light source is reflected on only some of the group of micromirrors in the DMD which have a predetermined tilt angle and led onto the photosensitive member. In the photo-fabrication apparatus, the tilt angle of each micromirror in the DMD is controlled by the computer. This can control the quantity of irradiation light for an irradiation region on the photosensitive member corresponding to each micromirror, to perform an exposure in accordance with a three-dimensional shape of a desired object for a short time. The exposed photosensitive member is developed by another apparatus.
    Type: Grant
    Filed: January 20, 2004
    Date of Patent: August 1, 2006
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Yasuyuki Koyagi, Hiroko Shimozuma
  • Publication number: 20040160590
    Abstract: A photo-fabrication apparatus (1) comprises a stage (2) for holding a photosensitive member (9) which is a substrate coated with a photosensitive material, a head part (3) for emitting a spatially-modulated light beam to said photosensitive member (9) and a computer (5). The head part (3) has a DMD (32) having a plurality of micromirrors arranged in a two-dimensional array, and a light beam from a light source (31) is reflected on only some of the group of micromirrors in the DMD (32) which have a predetermined tilt angle and led onto the photosensitive member (9). In the photo-fabrication apparatus (1), the tilt angle of each micromirror in the DMD (32) is controlled by the computer (5). This can control the quantity of irradiation light for an irradiation region on the photosensitive member (9) corresponding to each micromirror, to perform an exposure in accordance with a three-dimensional shape of a desired object for a short time. The exposed photosensitive member (9) is developed by another apparatus.
    Type: Application
    Filed: January 20, 2004
    Publication date: August 19, 2004
    Applicant: DAINIPPON SCREEN MFG. CO., LTD.
    Inventors: Yasuyuki Koyagi, Hiroko Shimozuma