Abstract: A antiglare layer 12 having a fine uneven surface is formed directly or through other layer(s) on a transparent substrate film 11, and a layer 13 having a low refractive index, which is lower than the refractive index of the antiglare layer 12, is formed thereon. The refractive index of the antiglare layer 12 is higher than the refractive index of a layer in contact with said antiglare layer 12 on its surface remote from the layer 13 having a low refractive index. An SiOx film may be used as the layer 13 having a low refractive index. The SiOx film per se has excellent gas barrier property and antifouling property as an optical functional membrane and is an optical functional material characterized by having excellent moistureproofness, scratch resistance, adhesion to a substrate, transparency, low refractive index, dye deterioration preventive property, and other properties.

Abstract: An antireflection film containing a transparent substrate film, a hard coat layer on the substrate film, and first and second refractive index layers on the hard coat layer. The hard coat layer has a refractive index higher than the refractive index of the transparent substrate film; the first refractive index layer has a refractive index higher than the refractive index of the hard coat layer; the second refractive index layer has a refractive index lower than the refractive index of the hard coat layer.

Abstract: A low reflective antistatic film is provided which can prevent electrostatic deposition of foreign materials on the surface thereof, has hardness enough high not to cause a deterioration in transparency derived from a scratch or the like created upon being rubbed, and can prevent reflection of outdoor daylight from the surface of a transparent substrate. The low reflective antistatic film comprises: a transparent substrate film; and, provided on the transparent substrate film in the following order, a transparent conductive layer, a hardcoat layer, and a low refractive layer, the low refractive layer having a lower refractive index than the hardcoat.

Abstract: A antiglare layer 12 having a fine uneven surface is formed directly or through other layer(s) on a transparent substrate film 11, and a layer 13 having a low refractive index, which is lower than the refractive index of the antiglare layer 12, is formed thereon. The refractive index of the antiglare layer 12 is higher than the refractive index of a layer in contact with said antiglare layer 12 on its surface remote from the layer 13 having a low refractive index. An SiO.sub.x film may be used as the layer 13 having a low refractive index. The SiO.sub.x film per se has excellent gas barrier property and antifouling property as an optical functional membrane and is an optical functional material characterized by having excellent moistureproofness, scratch resistance, adhesion to a substrate, transparency, low refractive index, dye, deterioration preventive property, and other properties.

Abstract: An antireflection film, containing ultrafine particles, formed of a resin composition having excellent dispersibility of ultrafine particles in a binder resin and capable of preventing whitening, a polarizing plate, and a liquid crystal display device are provided.At least one resin layer is provided on a transparent substrate film directly or through other layer(s), and at least one of the resin layer has a controlled refractive index and is formed of a resin composition containing ultrafine particles. The outermost layer has a lower refractive index than an underlying layer in direct contact therewith. The resin composition contains a carboxyl-containing (meth)acrylate as part or the whole of a binder resin component. A polyfunctional acrylate having in its molecule three or more acryloyl groups may be added to the binder resin component in order to further enhance the properties of the hard coating.

Abstract: The present invention provides a transparent functional film comprising a transparent plastic substrate film and a hard coat layer provided thereon, wherein functional ultrafine particles are present in a highly localized form, thereby enabling the functional ultrafine particles to effectively exhibit their function and, at the same time, the hard coat layer to have a good adhesion to the functional ultrafine particle layer; and also an antireflection film and processes for producing the transparent functional film and the antireflection film.A functional ultrafine particle layer 2 is formed on a release film 1. Separately, a resin composition for a hard coat layer is coated on a transparent plastic substrate film 3.

Abstract: A antiglare layer 12 having a fine uneven surface is formed directly or through other layer(s) on a transparent substrate film 11, and a layer 13 having a low refractive index, which is lower than the refractive index of the antiglare layer 12, is formed thereon. The refractive index of the antiglare layer 12 is higher than the refractive index of a layer in contact with said antiglare layer 12 on its surface remote from the layer 13 having a low refractive index. An SiO.sub.x film may be used as the layer 13 having a low refractive index. The SiO.sub.x film per se has excellent gas barrier property and antifouling property as an optical functional membrane and is an optical functional material characterized by having excellent moistureproofness, scratch resistance, adhesion to a substrate, transparency, low refractive index, dye deterioration preventive property, and other properties.

Abstract: An antireflection film, containing ultrafine particles, formed of a resin composition having excellent dispersibility of ultrafine particles in a binder resin and capable of preventing whitening, a polarizing plate, and a liquid crystal display device are provided.At least one resin layer is provided on a transparent substrate film directly or through other layer(s), and at least one of the resin layer has a controlled refractive index and is formed of a resin composition containing ultrafine particles. The outermost layer has a lower refractive index than an underlying layer in direct contact therewith. The resin composition contains a carboxyl-containing (meth)acrylate as part or the whole of a binder resin component. A polyfunctional acrylate having in its molecule three or more acryloyl groups may be added to the binder resin component in order to further enhance the properties of the hard coating.

Abstract: A transparent functional film comprising a transparent plastic substrate film and a hard coat layer provided thereon, wherein functional ultrafine particles are present in a highly localized form, thereby enabling the functional ultrafine particles to effectively exhibit their function and, at the same time, the hard coat layer to have a good adhesion to the functional ultrafine particle layer; and also an antireflection film and processes for producing the transparent functional film and the antireflection film.

Abstract: In feather comforters and other comforters (primarily coverlet comforters) having a heat insulating material filled therein, to provide an air controlled comforter which makes it possible to obtain good sleep under comfortable sleeping conditions in terms of both temperature and humidity with the aid of warm or cool air, and which will not be moisturized itself so as to be free from the need of drying it each time after use. In a comforter in which a front cloth (1) and a rear cloth (2) is joined together at their peripheral edges to form a shape of bag, where a heat insulating material such as feather, wool, and cotton is filled in the bag, an air-permeable cloth (3) is joined with the rear cloth to define an air passage (4) ranging from hem to center part of the comforter. The air passage (4) is opened at the hem of the comforter, where an air opening (7) is provided for feeding warm or cool air.

Abstract: In feather comforters and other comforters having a heat insulating material filled therein, to provide an air controlled comforter which makes it possible to obtain good sleep under comfortable sleeping conditions in terms of both temperature and humidity with the aid of warm or cool air, and which will not be moisturized itself so as to be free from the need of drying it each time after use. In a comforter in which a front cloth and a rear cloth is joined together at their peripheral edges to form a shape of bag, where a heat insulating material such as feather, wool, and cotton is filled in the bag, an air-permeable cloth is joined with the rear cloth to define an air passage ranging from hem to center part of the comforter. The air passage is opened at the hem of the comforter, where an air opening is provided for feeding warm or cool air.

Abstract: In a cubic-quilt type feather quilt in which a plurality of compartments are defined by partitioning the interior of the quilt with partition cloths and feathers are filled inside, there is provided a feather quilt which functions to cover up the body, eliminating the possibility that outside air may flow in the bed due to clearances on the body side or when peripheral portions of the quilt are turned up, and thus which offers a comfortable sleep. Among the partition cloths to define the interior of the quilt, which are arranged in the central part of the quilt except at least its peripheral portions, the lateral partition cloths (3) are so formed that both right and left side portions are curved downward and the central part is floated up. Thus, the feather quilt is formed into such a dome shape that the quilt wholly covers up the body during sleep.

Abstract: Carboxamide derivatives of the following general formula (I): ##STR1## (wherein R.sup.1 and R.sup.2 are C.sub.1 -C.sub.3 alkyl group or both taken together C.sub.1 -C.sub.3 alkylene group,R.sup.3 is hydrogen atom, dialkylamino group, etc.,R.sup.4 is hydrogen atom, C.sub.1 -C.sub.10 alkyl group,R.sup.5 is C.sub.1 -C.sub.10 alkyl group,m, n, q are an integer from 0-3,p is 0, 1,A ring is ##STR2## B ring is 5 or 6 membered nitrogen containing aromatic ring, are provided, which are useful as medicinals for treating hyperlipemia or atherosclerosis.

Abstract: A method of treating positive photoresist materials applied on a semiconductor wafer placed on a support, which meets the demand for high-speed treatment and improvement in heat-resistance and plasma-resistance of the developed positive photoresist image. The developed positive photoresist image is exposed to radiant lights including ultraviolet rays in an chamber filled with gas in which oxygen and/or moisture are reduced or not included.

Abstract: Ultraviolet radiation process applies to manufacture semiconductor devices in order to enhance the thermal stability of the developed positive photoresist film on semiconductor wafers.A method, in ultraviolet radiation process, and an apparatus enabling the high-speed and effective treatment of the positive photoresist empolying ultraviolet irradiation by preventing the deformation of the developed positive photoresist image which is caused by the light radiated from a discharge lamp such as high pressure mercury vapor lamp. These method and apparatus employ ultraviolet irradiation, in which ultraviolet rays are applied to the developed positive photoresist image, placed in a chamber filled with gas of lower pressure than 1 atmospheric pressure using a means to intercept or reduce selectively all or part of the wavelengths in the spectral response region of the positive photoresist out of radiant lights obtained from the discharge lamp.

Abstract: Ultraviolet radiation process applies to manufacture to semiconductor devices in order to enhance the thermal stability of the developed positive photoresist film on semiconductor's wafers.A method, in ultraviolet radiation process, and an apparatus enabling the high-speed and effective treatmnent of the positive photoresist employing ultraviolet irradiation by preventing the deformation of the positive photoresist which is caused by the light radiated form the microwave-excited electrodeless discharge lamp. These method and apparatus employ ultraviolet irradiation, in which ultraviolet rays are applied to the developed positive photoresist image placed under lower or pressure than 1 atmospheric pressure, using a means to intercept or reduce selectively all or part of the wavelengths in the spectral response region of the positive photoresist out of radiant lights obtained from the microwave-excited electrodeless discharge lamp.

Abstract: Ultraviolet radiation process applied to manufacture semiconductor devices in order to enhance the thermal stability of the photoresist film on semiconductor wafers.A method, in ultraviolet radiation process, enabling effective treatment of the developed positive photoresist image employing ultraviolet irradiation by preventing the deformation of the developed positive photoresist image which is caused by exposing it to high ultraviolet radiation at the beginning of exposure. This method employs ultraviolet irradiation, in which the developed positive photoresist image placed in gas of a lower atmospheric pressure is exposed to ultraviolet radiation of low intensity at the beginning of exposure, and then exposed to ultraviolet radiation, the intensity of which increases little by little or in steps.

Abstract: Ultraviolet radiation process applicable in the manufacture of semiconductor devices to enhance the thermal stability of a photoresist film on a semiconductor wafer.A method, in ultraviolet radiation process, and an apparatus enabling the high-speed and effective treatment of a photoresist pattern employing ultraviolet irradiation by preventing the deformation of the photoresist which is caused by the light radiated from a discharge lamp such as high pressure mercury vapor lamp. This method and apparatus employ ultraviolet irradiation, in which ultraviolet rays are applied to the photoresist pattern, using a means to intercept or reduce selectively all or part of the wavelengths in the spectral response region of the photoresist out of radiant energy obtained from the discharge lamp.