Abstract: The disclosed resist developer is used when developing by irradiating an energy beam onto a resist layer containing a polymer of ?-chloromethacrylate and ?-methylstyrene for rendering or exposure, and contains a fluorocarbon-containing solvent (A) and an alcohol solvent (B), the latter of which has higher solubility relative to the resist layer than the former.

Abstract: A resist developing device is provided, including: a storage part configured to store the developing solution, with a temperature controlled to a constant temperature; a holding part configured to hold the substrate to be processed; a supply pipe configured to form a flow passage for flowing the developing solution stored in the storage part, and having a discharging part for discharging the developing solution flowed through the flow passage, and configured to supply the developing solution to the substrate to be processed by discharging the developing solution from the discharging part toward the substrate to be processed which is held by the holding part; and a position-change part configured to perform the first position-change operation for varying a discharging direction of the discharging part in a non-reaching direction for not allowing the developing solution discharged from the discharging part of the supply pipe to reach the substrate to be processed, and a second position-change operation for vary

Abstract: A liquid feeding device 1 having a storage part 4 to store a developing solution 11 controlled in a constant temperature state, a holding part 8 for holding a processing target substrate 6 and a feed pipe 5 for flowing the developing solution 11 from the storage part 4 to a discharge part 14 that feeds and sprays the developing solution 11 onto the processing target substrate 6. A pump 16 pressure-feeds the developing solution 11 and a pressure adjuster 20 switches a pressure to the developing solution 11 by the pump 16 to a first pressure, set under a condition that the developing solution 11 discharged from the discharge part 14 reaches a place other than the processing target substrate 6, and a second pressure set under a condition that the developing solution 11 discharged from the discharge part 14 reaches the processing target substrate 6.

Abstract: There is provided an imprint mold for manufacturing a bit-patterned medium with an imprint method, wherein dot-shaped protrusions are formed on a main surface of a substrate, so as to be a base of a magnetic material region in the bit-patterned medium, with the dot-shaped protrusions formed at a specific cycle in a specific direction on the main surface of the substrate, wherein the dot-shaped protrusions are formed by being surrounded by lattice-shaped grooves formed by shaving the main surface of the substrate and making a plurality of continuous planar view line-shaped grooves cross each other; and a width of each line-shaped groove is smaller than a width of each dot-shaped protrusion in the specific cycle.

Abstract: The disclosed resist developer is used when developing by irradiating an energy beam onto a resist layer containing a polymer of ?-chloromethacrylate and ?-methylstyrene for rendering or exposure, and contains a fluorocarbon-containing solvent (A) and an alcohol solvent (B), the latter of which has higher solubility relative to the resist layer than the former.