Patents by Inventor Hiromasa Yamaguchi

Hiromasa Yamaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6787662
    Abstract: Fluorinated organosilicon compounds having perfluoroalkyl or perfluorooxyalkyl radicals and at least four SiH radicals are highly compatible with base polymers having high fluorine contents and useful as a crosslinking agent therefor to produce addition cured rubber having desired hardness and modulus.
    Type: Grant
    Filed: November 5, 2002
    Date of Patent: September 7, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Noriyuki Koike, Hiromasa Yamaguchi
  • Publication number: 20040082710
    Abstract: A curable composition comprising (A) a polyfluorodialkenyl compound having at least two alkenyl radicals, (B) a fluorinated organohydrogensiloxane having at least two Si—H radicals, (C) a platinum group compound, (D) a hydrophobic silica powder, and (E) an organosiloxane having a Si—H radical and a trialkyl or trialkoxy-containing organic radical attached to a silicon atom cures into a product having improved solvent resistance, chemical resistance, heat resistance, low-temperature properties, low moisture permeability and electric properties and exhibiting good adhesion to a variety of substrates including metals and plastics by brief heating at relatively low temperatures.
    Type: Application
    Filed: October 23, 2003
    Publication date: April 29, 2004
    Inventors: Hiromasa Yamaguchi, Mikio Shiono
  • Patent number: 6660392
    Abstract: An anti-reflection film which includes an inorganic anti-reflection layer including a silicon dioxide-based inorganic layer and having a monolayer structure or plural-layer structure, and a stain-resistant layer provided as a surface layer, is provided. The stain-resistant layer is composed of a cured product of a particular fluorine-containing silazane compound. An optical member having the anti-reflection film on a substrate, such as an optical element, is also provided. These have good stain resistance, wipe off cleanability, mar resistance and water and oil repellency, and these properties have good durability.
    Type: Grant
    Filed: December 7, 2001
    Date of Patent: December 9, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kouichi Yamaguchi, Hiromasa Yamaguchi, Hirofumi Kishita
  • Publication number: 20030175617
    Abstract: A resist composition comprising (A) a substantially alkali-insoluble polymer having acidic functional groups protected with acid labile groups, which becomes alkali soluble upon elimination of the acid labile groups, (B) a photoacid generator, and (C) a nonionic fluorinated organosiloxane compound consisting of perfluoroalkyl-containing siloxane bonds and polyoxyethylene type polyether bonds is exposed to UV having a wavelength of at least 150 nm and developed with an alkaline solution to form a pattern without leaving scum.
    Type: Application
    Filed: December 27, 2002
    Publication date: September 18, 2003
    Inventors: Hideto Kato, Yoshinori Hirano, Toshihiko Fujii, Hiromasa Yamaguchi
  • Publication number: 20030120100
    Abstract: Fluorinated organosilicon compounds having perfluoroalkyl or perfluorooxyalkyl radicals and at least four SiH radicals are highly compatible with base polymers having high fluorine contents and useful as a crosslinking agent therefor to produce addition cured rubber having desired hardness and modulus.
    Type: Application
    Filed: November 5, 2002
    Publication date: June 26, 2003
    Inventors: Noriyuki Koike, Hiromasa Yamaguchi
  • Patent number: 6528672
    Abstract: A novel perfluoropolyether-modified aminosilane cures into a film having improved water and oil repellency and anti-staining properties. A surface treating agent comprising the aminosilane, and an article with a coating of the aminosilane are also provided.
    Type: Grant
    Filed: October 16, 2001
    Date of Patent: March 4, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiromasa Yamaguchi, Koichi Yamaguchi, Hirofumi Kishita
  • Publication number: 20020105728
    Abstract: An anti-reflection film which includes an inorganic anti-reflection layer including a silicon dioxide-based inorganic layer and having a monolayer structure or plural-layer structure, and a stain-resistant layer provided as a surface layer, is provided. The stain-resistant layer is composed of a cured product of a particular fluorine-containing silazane compound. An optical member having the anti-reflection film on a substrate, such as an optical element, is also provided. These have good stain resistance, wipe off cleanability, mar resistance and water and oil repellency, and these properties have good durability.
    Type: Application
    Filed: December 7, 2001
    Publication date: August 8, 2002
    Applicant: Shin-Etsu Chemical Co. Ltd.
    Inventors: Kouichi Yamaguchi, Hiromasa Yamaguchi, Hirofumi Kishita
  • Patent number: 6414062
    Abstract: A fluorinated curable composition contains as main components, (A) a linear polyfluoro compound of the formula (1): CH2═CH—(X)a—Rf1—(X)a—CH═CH2  (1) wherein X is —CH2—, —CH2O—, etc., Rf1 is a divalent perfluoroalkylene or perfluorooxyalkylene group, and “a” is 0 or 1, (B) a linear polyfluoro compound of the formula (2): Rf2—(X)a—CH═CH2  (2) wherein X and “a” are as defined above, and Rf2 is a monovalent perfluoroalkyl or perfluorooxyalkyl group, (C) an organosilicon compound having at least two hydrosilyl groups, (D) a platinum group catalyst, and (E) a fluorinated organopolysiloxane. The composition is vacuum deaeratable and foam breakable, cures into a gel having improved chemical and solvent resistance, and is suited for the potting, sealing and coating of electric and electronic parts.
    Type: Grant
    Filed: September 1, 2000
    Date of Patent: July 2, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kenichi Fukuda, Hiromasa Yamaguchi, Masatoshi Arai
  • Publication number: 20020071959
    Abstract: A novel perfluoropolyether-modified aminosilane cures into a film having improved water and oil repellency and anti-staining properties. A surface treating agent comprising the aminosilane, and an article with a coating of the aminosilane are also provided.
    Type: Application
    Filed: October 16, 2001
    Publication date: June 13, 2002
    Inventors: Hiromasa Yamaguchi, Koichi Yamaguchi, Hirofumi Kishita
  • Patent number: 6200684
    Abstract: A novel perfluoropolyether-modified aminosilane cures into a film having improved water and oil repellency, parting and anti-staining properties. A surface treating agent comprising the aminosilane, and an article with a coating of the aminosilane are also provided.
    Type: Grant
    Filed: May 19, 2000
    Date of Patent: March 13, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiromasa Yamaguchi, Kouichi Yamaguchi, Hirofumi Kishita
  • Patent number: 6010815
    Abstract: An anti-offsetting oil including an organopolysiloxane having the formula (1) below and containing low molecular weight organopolysiloxanes having a molecular weight of 3,000 or less in a content of 50 ppm or less. ##STR1## wherein R.sub.f 's represent a perf luoroalkyl which may contain at least one ether linkage; R's represent a monovalent hydrocarbon group; Y's represent a divalent organic group having 2 to 5 carbon atoms; a represents an integer of 1 or more and b represents an integer of 0 or more, provided that a and b satisfy 3a+3b+2=15 to 4,000; and c and d are an integer of 0 to 3. This fluid has a good wettability to silicone rubber or fluorine forming the surfaces of fixing rolls of electrophotographic copying machines, and hence can effectively prevent offset. Since it contains no low-molecular weight organopolysiloxanes, the electric-contact failure may hardly occur.
    Type: Grant
    Filed: October 26, 1998
    Date of Patent: January 4, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiromasa Yamaguchi, Hirofumi Kishita
  • Patent number: 5927073
    Abstract: The present invention is an electric hydraulic hybrid motor which can be made smaller in size and can provide excellent performance. To this end, a hydraulic pump (20) and a hydraulic motor (60) are respectively placed inwardly of the stator (12) of an electric motor (10) and the rotor (14) of the electric motor (10), and the hydraulic pump (20) includes a cylinder block (21) for the pump and a plunger (23) for the pump which are adapted to rotate together with the rotor (14), and the hydraulic motor (60) includes a cylinder block (61) for the motor and a plunger (23a) for the motor.
    Type: Grant
    Filed: September 5, 1997
    Date of Patent: July 27, 1999
    Assignee: Komatsu Ltd.
    Inventors: Naoki Ishizaki, Kazuo Uehara, Hiromasa Yamaguchi
  • Patent number: 5877577
    Abstract: The present invention is an electric hydraulic hybrid motor, a control device, and a control method for the same motor, which is small in size and simple in construction, which can be equal horsepower controlled or torque limiter controlled when required. To this end, an electric hybrid motor includes a cylinder block (21), provided for common use by a hydraulic pump (20) and by a hydraulic motor (50) and rotated integrally with a rotor (14); a number of plungers (23), provided for the hydraulic pump (20) and rotated integrally with the rotor (14); a number of plungers (23a), provided for the hydraulic motor (50); a variable swash plate control device (33), for setting the discharge rate from the hydraulic pump (20); a swash plate setting device (56), for setting the discharge rate from the hydraulic motor (50); and a case (11) in which these constituent members are disposed.
    Type: Grant
    Filed: September 5, 1997
    Date of Patent: March 2, 1999
    Assignee: Komatsu Ltd.
    Inventors: Naoki Ishizaki, Kazuo Uehara, Hiromasa Yamaguchi
  • Patent number: 5858599
    Abstract: An anti-offsetting oil including an organopolysiloxane having the formula (1) below and containing low molecular weight organopolysiloxanes having a molecular weight of 3,000 or less in a content of 50 ppm or less. ##STR1## wherein R.sub.f 's represent a perfluoroalkyl which may contain at least one ether linkage; R's represent a monovalent hydrocarbon group; Y's represent a divalent organic group having 2 to 5 carbon atoms; a represents an integer of 1 or more and b represents an integer of 0 or more, provided that a and b satisfy 3a+3b+2=15 to 4,000; and c and d are an integer of 0 to 3. This fluid has a good wettability to silicone rubber or fluorine forming the surfaces of fixing rolls of electrophotographic copying machines, and hence can effectively prevent offset. Since it contains no low-molecular weight organopolysiloxanes, the electric-contact failure may hardly occur.
    Type: Grant
    Filed: November 6, 1997
    Date of Patent: January 12, 1999
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiromasa Yamaguchi, Hirofumi Kishita
  • Patent number: 5453549
    Abstract: An extremely reactive and highly copolymerizable hexafluoropropylene oxide oligoether derivative, to give bi- or ter-polymers with fluoroolefins and perfluoroalkyl vinyl ethers, which is represented by general formula: ##STR1## wherein X is a fluorine atom or trifluoromethyl group; and n is an integer of 2-5.
    Type: Grant
    Filed: May 6, 1993
    Date of Patent: September 26, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Noriyuki Koike, Kouichi Yamaguchi, Hiromasa Yamaguchi, Kouji Takano
  • Patent number: 5439962
    Abstract: The organopolysiloxane composition proposed is a blend of a conventional diorganopolysiloxane or a dimethylpolysiloxane oil and a limited amount of an (etherified) perfluoroalkyl group-containing organopolysiloxane such as those represented by the general formula ##STR1## in which Rf is a perfluoroalkyl group of 1 to 14 carbon atoms or an etherified perfluoroalkyl group of 2 to 14 carbon atoms having at least one oxygen atom between two carbon atoms forming an ether linkage, R is a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms, Y is a divalent organic group having 2 to 5 carbon atoms, the subscripts a and b are, each independently from the other, zero or a positive integer and the subscripts c and d are, each independently from the other, zero, 1, 2 or 3 with the proviso that at least one of the subscripts a, c and d is not zero.
    Type: Grant
    Filed: June 13, 1994
    Date of Patent: August 8, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiromasa Yamaguchi, Yasushi Yamamoto, Hirofumi Kishita
  • Patent number: 5288890
    Abstract: A fluorine-containing organosilicon compound having the formula (1): ##STR1## wherein X is a hydrolizable group, R.sup.1 is a monovalent organic group, R.sup.2 is a methyl group or a hydrogen atom, n is an integer of 1, 2 or 3, and m is an integer of 0 or 1, and a process of producing said compound. The compound may be used as a silane coupling agent capable of improving not only the strength of laminated sheets of polyester resin and glass and polyester resin concrete but also water and heat resistances.
    Type: Grant
    Filed: March 1, 1993
    Date of Patent: February 22, 1994
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshi Inomata, Yasuo Tarumi, Hiromasa Yamaguchi, Kenichi Fukuda, Kazutoshi Munezawa
  • Patent number: 5250637
    Abstract: An epoxy resin composition comprising an epoxy resin, a curing agent and an inorganic filler is adapted for semiconductor encapsulation. A fluorinated organic silicon compound is blended in the composition as a coupling agent whereby the composition is improved in adhesion and moisture resistance.
    Type: Grant
    Filed: November 25, 1992
    Date of Patent: October 5, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shiobara, Kazutoshi Tomiyoshi, Yasuo Tarumi, Hiromasa Yamaguchi
  • Patent number: 5227501
    Abstract: Disclosed is a novel fluorine-containing epoxide compound 6-iodo-undecafluoro-1,2-epoxy hexane which can be prepared by the epoxidation reaction of 6-iodo-undecafluoro-1-hexene with a hypochlorite such as sodium hypochlorite in a two-phase reaction system consisting of an organic phase and an aqueous phase in the presence of a quaternary ammonium compound as the catalyst.
    Type: Grant
    Filed: May 12, 1992
    Date of Patent: July 13, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Shinichi Sato, Yasuo Tarumi, Takashi Matsuda, Hiromasa Yamaguchi
  • Patent number: 5227502
    Abstract: Novel fluorinated unsaturated glycidyl ethers are prepared by reacting 1,1,1-trifluoro-2-trifluoromethyl-3-buten-2-ol or 1,1,1-trifluoro-2-trifluoromethyl-4-propen-2-ol with chloromethyloxirane in the presence of onium salts. The fluorinated unsaturated glycidyl ethers are, in turn, subject to addition reaction with hydrosilanes in the presence of transition metal catalysts, obtaining novel silicon-modified glycidyl ethers or fluorinated organic silicon compounds.
    Type: Grant
    Filed: July 31, 1992
    Date of Patent: July 13, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Takago, Hiroshi Inomata, Yasuo Tarumi, Hiromasa Yamaguchi, Kenichi Fukuda