Patents by Inventor Hiromasa Yamamoto
Hiromasa Yamamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8042436Abstract: A preparing apparatus of an NC machining program prepares an NC machining program including a position instruction of a cutting portion of a rotary tool on the basis of a two-dimensional workpiece coordinate system having a Z-axis and an X-axis as coordinate axes. An operator inputs a lead clearance ? and a radial clearance ? to the preparing apparatus via an input operation section. A processing section converts the NC machining program prepared on the basis of the two-dimensional workpiece coordinate system into an NC machining program including a position instruction of a three-dimensional workpiece coordinate system having the X-axis, a Y-axis and the Z-axis as the coordinate axes, on the basis of the lead clearance ? and the radial clearance ?.Type: GrantFiled: December 1, 2006Date of Patent: October 25, 2011Assignee: Yamazaki Mazak CorporationInventors: Toshiyuki Muraki, Hiromasa Yamamoto
-
Publication number: 20110117496Abstract: The present invention provides a negative photosensitive fluorinated aromatic resin composition having a low relative permittivity, low water absorptivity, high heat resistance and high productivity. The composition includes a photosensitizer, a solvent and a fluorinated aromatic prepolymer represented by the following formula (1): where the structural variables are described herein as well as methods of preparing the prepolymer.Type: ApplicationFiled: December 22, 2010Publication date: May 19, 2011Applicant: ASAHI GLASS COMPANY LIMITEDInventors: Takeshi Eriguchi, Hiromasa Yamamoto, Kaori Tsuruoka
-
Publication number: 20110071272Abstract: A fluorosulfonyl group-containing monomer having a high polymerization reactivity and plural fluorosulfonyl groups, a fluorosulfonyl group-containing polymer and a sulfonic acid group-containing polymer, obtained by using the monomer.Type: ApplicationFiled: November 29, 2010Publication date: March 24, 2011Applicant: Asahi Glass Company, LimitedInventors: Atsushi WATAKABE, Hiromasa Yamamoto, Masao Iwaya, Susumu Saito
-
Patent number: 7892720Abstract: To provide a negative photosensitive fluorinated aromatic resin composition having a low relative permittivity, low water absorptivity, high heat resistance and high productivity. A negative photosensitive fluorinated aromatic resin composition comprising the following fluorinated aromatic prepolymer, a photosensitizer and a solvent.Type: GrantFiled: September 15, 2008Date of Patent: February 22, 2011Assignee: Asahi Glass Company, LimitedInventors: Takeshi Eriguchi, Hiromasa Yamamoto, Kaori Tsuruoka
-
Patent number: 7790811Abstract: A useful fluoropolymer excellent in transparency and durability to a short wavelength light (an ArF excimer laser having an irradiation wavelength of 193 nm and a F2 excimer laser having an irradiation wavelength of 157 nm) as e.g. a pellicle material, wherein a polymer (I) to be used for a pellicle membrane and/or an adhesive is a polymer essentially containing the following fluorine atom-containing unit (1), wherein a chain forming the polymer main chain comprises a carbon atom and an etheric oxygen atom, at least one carbon atom forming the main chain is a carbon atom forming a cyclic group, and at least one etheric oxygen atom forming the main chain is an oxygen atom forming no cyclic group.Type: GrantFiled: June 5, 2006Date of Patent: September 7, 2010Assignee: Asahi Glass Company, LimitedInventors: Ikuo Matsukura, Hiromasa Yamamoto, Yuichiro Ishibashi, Shinji Okada, Naoko Shirota
-
Patent number: 7754903Abstract: The present invention discloses a curable polycyclic compound represented by the following formula (1): {wherein A is a di- to hexa-valent group derived from a polycyclic hydrocarbon compound; R1 is an alkyl group of 1 to 4 carbon atoms, a perfluoroalkyl group of 1 to 4 carbon atoms, or a fluorine atom; n is an integer of 0 to 2; m is an integer of 2 to 4; and Y is a group represented by the following formula (2) or (3): (wherein R2, R3, R5 and R6 are each independently a hydrogen atom, a fluorine atom or an alkyl group of 1 to 4 carbon atoms; R4 is a methyl group or an ethyl group; and p and q are each independently an integer of 0 to 4)}.Type: GrantFiled: June 18, 2004Date of Patent: July 13, 2010Assignee: Tokuyama CorporationInventors: Junji Takenaka, Hiromasa Yamamoto, Kenji Tanaka
-
Patent number: 7696291Abstract: A material having properties required for a chromatic aberration-free lens and excellent in moldability and impact resistance, which material is an amorphous fluoropolymer containing a carbon atom chain as a main chain and containing a fluorinated atom-bonded carbon atom as a carbon atom of the main chain, wherein vd>75, ?gF>0.50, and ??gF>0.03, where vd represents an Abbe number, ?gF represents a relative partial dispersion of a g-F line, and ??gF represents a deviation from a standard line of the relative partial dispersion of the g-F line.Type: GrantFiled: July 25, 2008Date of Patent: April 13, 2010Assignee: Asahi Glass Company, LimitedInventors: Hiromasa Yamamoto, Hideki Sato
-
Publication number: 20090048424Abstract: To provide a fluorosulfonyl group-containing monomer having a high polymerization reactivity and plural fluorosulfonyl groups. Further, to provide a fluorosulfonyl group-containing polymer and a sulfonic acid group-containing polymer, obtained by using the monomer. A perfluoro(2-methylene-1,3-dioxolane) derivative which is represented by the following formula (3) and which has two fluorosulfonyl groups, and its production process and its synthetic intermediate. A fluorosulfonyl group-containing polymer having monomer units represented by the following formula (3U) obtained by polymerizing the compound (3) by itself or with a comonomer, and a sulfonic acid group-containing polymer having the following units (5U) obtained by hydrolyzing a fluorosulfonyl group of the polymer. In the following formulae, each of Rf1 and Rf2 which are independent of each other, is a C1-8 perfluoroalkylene group which may have an etheric oxygen atom between carbon atoms.Type: ApplicationFiled: August 6, 2008Publication date: February 19, 2009Applicant: ASAHI GLASS COMPANY LIMITEDInventors: Atsushi WATAKABE, Hiromasa YAMAMOTO, Masao IWAYA, Susumu SAITO
-
Publication number: 20090030175Abstract: There is provided a polymer having electrical/optical functions attributed to the stability of a C—F bond in addition to chemical stability by efficiently polymerizing a fluorinated epoxy compound. A process for producing a fluoropolymer having two or more units of a repeating unit represented by the following formula (2), which comprises ring-opening polymerization of a fluorinated epoxy compound represented by the following formula (1) in the presence of a trialkylaluminum and a salt having an organic cation as a counter cation: wherein Q represents a single bond or a bivalent linking group containing no fluorine atom; RF represents a monovalent organic group containing a fluorine atom; and * indicates that the carbon atom marked with * is an asymmetric carbon atom.Type: ApplicationFiled: September 9, 2008Publication date: January 29, 2009Inventors: Hiromasa Yamamoto, Kyoko Nozaki, Koji Nakano
-
Publication number: 20090017265Abstract: To provide a negative photosensitive fluorinated aromatic resin composition having a low relative permittivity, low water absorptivity, high heat resistance and high productivity. A negative photosensitive fluorinated aromatic resin composition comprising the following fluorinated aromatic prepolymer, a photosensitizer and a solvent.Type: ApplicationFiled: September 15, 2008Publication date: January 15, 2009Applicant: ASAHI GLASS COMPANY LIMITEDInventors: Takeshi ERIGUCHI, Hiromasa Yamamoto, Kaori Tsuruoka
-
Publication number: 20080306232Abstract: To provide a material having properties required for a chromatic aberration-free lens and excellent in moldability and impact resistance. A fluoropolymer for a chromatic aberration-free lens, which is an amorphous fluoropolymer containing a carbon atom chain as a main chain and containing a fluorinated atom-bonded carbon atom as a carbon atom of the main chain, characterized in that vd>75, ?gF>0.50, and ??gF>0.03, where vd represents an Abbe number, ?gF represents a relative partial dispersion of a g-F line, and ??gF represents a deviation from a standard line of the relative partial dispersion of the g-F line.Type: ApplicationFiled: July 25, 2008Publication date: December 11, 2008Applicant: ASAHI GLASS CO., LTD.Inventors: Hiromasa YAMAMOTO, Hideki Sato
-
Publication number: 20080282854Abstract: A carriage is moved in a direction including a Y axis component in order to move a turning process tool that is attached to a tool spindle along a horizontal line that is perpendicular to a Z axis, and thus, a turning process is carried out on a workpiece which is attached to a workpiece spindle.Type: ApplicationFiled: May 15, 2008Publication date: November 20, 2008Applicant: YAMAZAKI MAZAK CORPORATIONInventors: Shoji MOMOI, Toshihito OKUDA, Hiromasa YAMAMOTO
-
Publication number: 20070144316Abstract: A preparing apparatus of an NC machining program prepares an NC machining program including a position instruction of a cutting portion of a rotary tool on the basis of a two-dimensional workpiece coordinate system having a Z-axis and an X-axis as coordinate axes. An operator inputs a lead clearance ? and a radial clearance ? to the preparing apparatus via an input operation section. A processing section converts the NC machining program prepared on the basis of the two-dimensional workpiece coordinate system into an NC machining program including a position instruction of a three-dimensional workpiece coordinate system having the X-axis, a Y-axis and the Z-axis as the coordinate axes, on the basis of the lead clearance ? and the radial clearance ?.Type: ApplicationFiled: December 1, 2006Publication date: June 28, 2007Applicant: YAMAZAKI MAZAK CORPORATIONInventors: Toshiyuki Muraki, Hiromasa Yamamoto
-
Publication number: 20060252911Abstract: The present invention discloses a curable polycyclic compound represented by the following formula (1): {wherein A is a di- to hexa-valent group derived from a polycyclic hydrocarbon compound; R1 is an alkyl group of 1 to 4 carbon atoms, a perfluoroalkyl group of 1 to 4 carbon atoms, or a fluorine atom; n is an integer of 0 to 2; m is an integer of 2 to 4; and Y is a group represented by the following formula (2) or (3): (wherein R2, R3, R5 and R6 are each independently a hydrogen atom, a fluorine atom or an alkyl group of 1 to 4 carbon atoms; R4 is a methyl group or an ethyl group; and p and q are each independently an integer of 0 to 4)}.Type: ApplicationFiled: June 18, 2004Publication date: November 9, 2006Applicant: Tokyuyama CorporationInventors: Junji Takenaka, Hiromasa Yamamoto, Kenji Tanaka
-
Publication number: 20060240222Abstract: It is to provide a useful fluoropolymer excellent in transparency and durability to a short wavelength light (an ArF excimer laser having an irradiation wavelength of 193 nm and a F2 excimer laser having an irradiation wavelength of 157 nm) as e.g. a pellicle material. A pellicle wherein a polymer (I) to be used for a pellicle membrane and/or an adhesive is a polymer essentially containing the following unit (1). The unit (1) is a unit containing a fluorine atom, wherein a chain forming the polymer main chain comprises a carbon atom and an etheric oxygen atom, at least one carbon atom forming the main chain is a carbon atom forming a cyclic group, and at least one etheric oxygen atom forming the main chain is an oxygen atom forming no cyclic group.Type: ApplicationFiled: June 5, 2006Publication date: October 26, 2006Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Ikuo Matsukura, Hiromasa Yamamoto, Yuichiro Ishibashi, Shinji Okada, Naoko Shirota
-
Patent number: 7071352Abstract: A magnesium halide salt of a 2-alkyl-2-adamantanol is reacted with a carboxylic acid halide such as acrylic chloride or the like in the presence of a tertiary amine to produce a 2-alkyl-2-adamantyl ester (the first invention). A 2-alkyl-2-adamantanol is reacted with a carboxylic acid such as acrylic acid or the like in the presence of an acid catalyst such as concentrated sulfuric acid or the like and a drying agent composed of an acidic or neutral inorganic compound (e.g. magnesium sulfate) which is a solid at ordinary temperature in a dried state or of a water-absorbing high-molecular compound, to produce a 2-alkyl-2-admantyl ester (the second invention). The above ester is important as a raw material for a resist for semiconductor production.Type: GrantFiled: July 18, 2001Date of Patent: July 4, 2006Assignee: Tokuyama CorporationInventors: Masao Yamaguchi, Yoshihiro Hirota, Hiromasa Yamamoto
-
Patent number: 7026504Abstract: There is provided a method for obtaining a high-purity alkyladamantyl ester from an alkyladamantyl ester composition containing a large quantity of alkyladamantyl halide obtained by, for example, alkylating raw material 2-adamantanone obtained through oxidation of adamantane by use of an organic metal reagent and then causing an acid halide to react with the resulting product, efficiently by a simple process. To an alkyladamantyl ester composition containing an alkyladamantyl halide such as 2-chloro-2-methyladamantane in an amount of larger than 0.5 parts by weight based on 100 parts by weight of alkyladamantyl ester such as 2-methyl-2-adamantyl methacrylate, a mixed solution of, for example, methanol and a sodium hydroxide aqueous solution is added. By bringing the alkali compound into contact with the alkyladamantyl halide in a homogeneous system so as to convert the halide into a compound which produces no acid when heated, the amount of the alkyladamantyl halide in the composition is reduced to 0.Type: GrantFiled: January 26, 2001Date of Patent: April 11, 2006Assignee: Tokuyama CorporationInventors: Masao Yamaguchi, Hiromasa Yamamoto, Hideki Kikuchi, Yoshihiro Hirota
-
Publication number: 20060045976Abstract: A coil component of the present invention has prismatic base body (1), copper plated layer (2) formed on the outer periphery of base body (1), coil section (3) that is formed by spirally grooving copper plated layer (2) and has linear section (3a) and groove (3b), exterior section (8) formed on coil section (3), and electrode section (9). Insulating coating layer (4) is disposed between copper plated layer (2) formed on the outer periphery of longitudinal section (1a) of base body (1) and exterior section (8). The copper plated layer of the coil section can be suppressed from being exposed at the surface of exterior section (8).Type: ApplicationFiled: August 1, 2003Publication date: March 2, 2006Inventors: Hideaki Nakayama, Toshiyuki Seo, Hiromasa Yamamoto, Toshihiro Yoshizawa, Akira Fujimori, Toyonori Kanetaka
-
Patent number: 6867133Abstract: Method of manufacturing a chip inductor including the steps of, a conductive layer forming process for forming conductive layer 4 on an outer periphery 2 and end surfaces 3 of a substrate 1, a coil portion forming process for forming coil portion 7 having conductor 5 and groove 6 by cutting spirally the conductive layer 4, an etching process for etching the substrate 1 having the coil portion 7 formed thereon; an insulation resin coating process for forming outer coating 8 by coating a surface of the conductive layer 4 with insulation resin 13; and an electrode forming process for forming electrodes 9 at both ends of the coil portion 7, and for making electric contacts between electrodes 9 and the conductive layer 4. A chip inductor having a flattened mounting surface of the outer coating is obtained when insulation resin layer 8 is formed by an electrodeposition method in the insulation resin coating process. The chip inductor can be securely mounted to a circuit board.Type: GrantFiled: April 12, 2001Date of Patent: March 15, 2005Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Toyonori Kanetaka, Toshihiro Yoshizawa, Akira Fujimori, Hideaki Nakayama, Hiromasa Yamamoto, Mikio Taoka, Kenichi Yamada
-
Patent number: 6864774Abstract: An inductance component comprising a column-shaped magnetic material substrate 21, conductor layer 24 covering ends and a peripheral surface of the substrate, coil portion 27 having groove portion 25 and wire conductor portion 26 formed in the conductor layer covering the peripheral surface, electrode portions 28 including the conductor layer covering the ends of the substrate, and magnetic material portion 31 made of sintered magnetic material on the coil portion, wherein the conductor layer has a melting point higher than a sintering temperature of the sintered magnetic material. The manufacturing process comprises forming a substrate, forming a conductor layer, forming a coil portion, forming electrode portions at ends of the substrate, and forming a magnetic material portion of sintered magnetic material on the coil portion. The present invention provides an inductance component with high inductance, low magnetic flux leakage, and less undesirable magnetic effects on adjacent components.Type: GrantFiled: October 10, 2001Date of Patent: March 8, 2005Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Toyonori Kanetaka, Toshihiro Yoshizawa, Hiromasa Yamamoto