Abstract: A diamond sensor unit includes: a diamond having a color center with electron spin; an excitation light irradiation part that irradiates the diamond with excitation light; a first patch antenna that receives electromagnetic waves; an electromagnetic wave irradiation part that irradiates the diamond with the electromagnetic waves received by the first patch antenna; a detection part that detects radiated light radiated from the color center of the diamond after the diamond is irradiated with the excitation light and the electromagnetic waves; and an optical waveguide that transmits the excitation light and the radiated light.

Abstract: A diamond sensor unit includes: a sensor part that includes a diamond having a color center with electron spin; an irradiation part that irradiates the diamond with excitation light; a detection part that detects radiated light from the color center of the diamond; and an optical waveguide that transmits the excitation light, and the radiated light.

Abstract: coating film having excellent adhesion, even without the presence of a chemical conversion film treatment out as an undercoat and a metal automotive part having the coating film. A powder is deposited by powder-coating onto the surface of a metal automotive part that has been quenched after simultaneously forging, and tempering the metal automotive part and bake-hardening the deposited powder to form a skin film on the surface of the metal automotive part. The surface of the metal automotive part before the powder is powder-coated thereon is a work-hardened material surface that has been not been subjected to a chemical conversion filming treatment.

Abstract: An object of the present invention is to provide a compound and a pharmaceutical composition which exhibit strong antibacterial activity against Gram-negative bacteria and drug-resistant Gram-negative bacteria. According to the present invention, a compound represented by General Formula [1] (the reference signs in the formula have the same definitions as those described in the present specification) or a salt thereof has strong antibacterial activity against Gram-negative bacteria such as Pseudomonas aeruginosa and drug-resistant Gram-negative bacteria including multidrug-resistant Pseudomonas aeruginosa, and the pharmaceutical composition containing the compound or a salt thereof is useful as an antibacterial agent.

Abstract: An object of the present invention is to provide a compound and a pharmaceutical composition which exhibit strong antibacterial activity against Gram-negative bacteria and drug-resistant Gram-negative bacteria. According to the present invention, a compound represented by General Formula [1] (the reference signs in the formula have the same definitions as those described in the present specification) or a salt thereof has strong antibacterial activity against Gram-negative bacteria such as Pseudomonas aeruginosa and drug-resistant Gram-negative bacteria including multidrug-resistant Pseudomonas aeruginosa, and the pharmaceutical composition containing the compound or a salt thereof is useful as an antibacterial agent.

Abstract: The invention provides a coating film having excellent adhesion, even without a chemical conversion film treatment being carried out as an undercoat treatment, and a metal automotive part having the coating film. A powder is deposited by powder-coating onto the surface of a metal automotive part that has been quenched after forging, and tempering of the metal automotive part and bake-hardening of the deposited powder are carried out simultaneously, thereby forming a skin film on the surface of the metal automotive part. The surface of the metal automotive part before the powder is powder-coated thereon is a work-hardened basis material surface that has been not subjected to a chemical conversion filming treatment.

Abstract: It is an object of the present invention to provide a method for uniformly forming a film on an outer circumferential portion of a metal automotive part by preventing penetration of a coating substance into a portion thereof unnecessary to be coated with paint.

Abstract: The invention provides a coating film having excellent adhesion, even without a chemical conversion film treatment being carried out as an undercoat treatment, and a metal automotive part having the coating film. A powder is deposited by powder-coating onto the surface of a metal automotive part that has been quenched after forging, and tempering of the metal automotive part and bake-hardening of the deposited powder are carried out simultaneously, thereby forming a skin film on the surface of the metal automotive part. The surface of the metal automotive part before the powder is powder-coated thereon is a work-hardened basis material surface that has been not subjected to a chemical conversion filming treatment.

Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Abstract: This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition.

Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Abstract: An isolation list containing information on a master/slave relation of isolation devices is stored in a history file. A range setting unit sets an isolation range according to a specifying operation with respect to the system diagram of equipment displayed on the screen. A master device registration unit extracts an isolation device present in the set range and registers it as a master device in the isolation list during editing. A slave device search unit successively selects a master device from the isolation list during editing, searches an isolation device which is in a relation of slave device with respect to the selected master device from the history file, and displays a slave device list. A slave device registration unit inserts and places a slave device selected based on the selecting operation of the slave device list after the corresponding master device in the isolation list during editing, thereby completing the list.

Abstract: An industrially advantageous purification method for a cyclic compound with a particular structure is provided. A purification method for a cyclic compound, including a step of contacting a solution containing a cyclic compound with a particular structure and an organic solvent with water or an acidic aqueous solution.

Abstract: Disclosed are: an underlayer underlayer film material for use in the formation of a resist underlayer film, which is highly soluble in safe solvents, has excellent etching resistance, and does not substantially cause the production of any sublimation product; and a resist pattern formation method using the underlayer film material. Specifically disclosed are: an underlayer film material comprising a cyclic compound that can have two or more specific structures; and a resist pattern formation method using the underlayer film material.

Abstract: This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition.

Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.