Abstract: An exposure apparatus includes a control unit configured to calculate a target exposure amount distribution in a scanning direction within the target shot region using a target exposure amount at a position in the target shot region and a target exposure amount at a position in an adjacent shot region adjacent to the target shot region in the scanning direction and configured to perform a scan exposure for the target shot region while controlling an exposure amount according to scanning of the substrate so as to obtain the calculated target exposure amount distribution as an exposure amount distribution in a scanning direction within the target shot region.

Abstract: An exposure apparatus includes a control unit configured to calculate a target exposure amount distribution in a scanning direction within the target shot region using a target exposure amount at a position in the target shot region and a target exposure amount at a position in an adjacent shot region adjacent to the target shot region in the scanning direction and configured to perform a scan exposure for the target shot region while controlling an exposure amount according to scanning of the substrate so as to obtain the calculated target exposure amount distribution as an exposure amount distribution in a scanning direction within the target shot region.

Abstract: A method of exposing a substrate to a pattern using an exposure apparatus. The method includes performing an update of a parameter, necessary for processing in the exposure apparatus, through measurement, in which the measurement is performed for each update of the parameter, setting a validity period for the updated parameter, in which the validity period represents a period in which the updated parameter is valid for the processing, predicting a completion time for a next exposure processing segment to be performed by the exposure apparatus, determining whether the predicted completion time is after expiration of the validity period, in which the setting of the validity period is performed after the performing of the update and before the determining step, and causing the update of the parameter to be performed if it is determined in the determining step that the predicted completion time is after the expiration of the validity period.

Abstract: An apparatus, which scans an original and a substrate relative to light slit-shaped on the original and on the substrate, comprises an adjusting device configured to adjust a distribution of a width of the light slit-shaped, the width being a width in a scanning direction, the distribution being a distribution in a perpendicular direction perpendicular to the scanning direction, and a controller. The controller is configured to obtain information representing a relationship between a position on the substrate and a target dose, calculate a distribution of the target dose in the perpendicular direction with respect to each of the shot regions based on the relationship represented by the obtained information, and control the adjusting device so as to achieve the calculated distribution of the target dose with respect to each of the shot regions.

Abstract: A method for exposing a substrate by an exposure apparatus having an illumination optical system which is configured to illuminate an original and includes an adjusting mechanism that adjusts an effective light source distribution, and a projection optical system which projects a pattern of the original illuminated by the illumination optical system onto a substrate. The method includes steps of obtaining correlation information indicating a correlation between an effective light source distribution and a line width difference in a pattern formed on a substrate by exposure, determining an effective light source distribution corresponding to a target line width difference based on the correlation information, controlling the adjusting mechanism so as to obtain the effective light source distribution determined in the determining step, and exposing the substrate after the controlling step.

Abstract: A method for exposing a substrate by an exposure apparatus comprising an illumination optical system which is configured to illuminate an original and includes an adjusting mechanism that adjusts an effective light source distribution, and a projection optical system which projects a pattern of the original illuminated by the illumination optical system onto a substrate, the method comprises obtaining correlation information indicating a correlation between an effective light source distribution and a line width difference in a pattern formed on a substrate by exposure, determining an effective light source distribution corresponding to a target line width difference based on the correlation information, controlling the adjusting mechanism so as to obtain the effective light source distribution determined in the determining step, and exposing the substrate after the controlling step.

Abstract: An apparatus, which scans an original and a substrate relative to light slit-shaped on the original and on the substrate, comprises an adjusting device configured to adjust a distribution of a width of the light slit-shaped, the width being a width in a scanning direction, the distribution being a distribution in a perpendicular direction perpendicular to the scanning direction, and a controller. The controller is configured to obtain information representing a relationship between a position on the substrate and a target dose, calculate a distribution of the target dose in the perpendicular direction with respect to each of the shot regions based on the relationship represented by the obtained information, and control the adjusting device so as to achieve the calculated distribution of the target dose with respect to each of the shot regions.

Abstract: An exposure apparatus for exposing a substrate to a pattern. The apparatus includes an update system to update a parameter necessary for processing in the exposure apparatus through measurement, a setting system to set a validity period of the parameter updated by the update system, and a control system to cause the update system to update the parameter. Prior to execution of a unit of the processing, the control system determines that the update system is to update the parameter if a predicted completion time of the unit is after expiration of the validity period.

Abstract: An apparatus for exposing a plurality of lots of substrates to light. The apparatus includes a designating unit for designating, on the basis of an exposure condition being related to two consecutive lots of the plurality of lots of substrates and being reserved in the apparatus, an exposure preparation process being related to the latter one of the two consecutive lots and going to be omitted. The apparatus further includes an estimating unit for estimating a process time to be saved by the omission of the exposure preparation process designated by the designating unit, and a generating unit for generating a sequence for the plurality of lots, on the basis of the estimation made by the estimating unit, so as to minimize a required process time.

Abstract: An exposure apparatus for exposing a substrate to a pattern. The apparatus includes an update system to update a parameter necessary for processing in the exposure apparatus through measurement, a setting system to set a validity period of the parameter updated by the update system, and a control system to cause the update system to update the parameter. Prior to execution of a unit of the processing, the control system determines that the update system is to update the parameter if a predicted completion time of the unit is after expiration of the validity period.

Abstract: An exposure apparatus for exposing a subject to a pattern. The apparatus includes an update system to update a parameter necessary for processing in the exposure apparatus through measurement, a setting system to set a validity period of the parameter updated by the update system, and a control system to cause the update system to perform an update based on the validity period. Prior to execution of a unit of the processing, the control system determines whether the update by the update system is to be performed, based on a predicted completion time of the unit and the validity period.

Abstract: An exposure apparatus for exposing a subject to a pattern. The apparatus includes an update system to update a parameter necessary for processing in the exposure apparatus through measurement, a setting system to set a validity period of the parameter updated by the update system, and a control system to cause the update system to perform an update based on the validity period.

Abstract: An exposure apparatus having a plurality of units includes a scheduling unit which schedules a process step with respect to each lot, a combining unit which combines process steps of first and second lots, to be processed consecutively, with respect to which the scheduling unit has scheduled process steps, and a control unit which controls the plurality of units based on the process steps which are combined by the combining unit. The combining unit combines the process steps such that before completion of a process of the first lot and before loading of the second lot, a unit which is no longer used for the first lot starts a first process concerning the second lot.

Abstract: Disclosed is an apparatus for exposing a plurality of lots of substrates to light, and a method of generating a sequence for exposure of the plurality of lots of substrate. The apparatus includes a designating unit for designating, on the basis of an exposure condition being related to two consecutive lots of the plurality of lots of substrates and being reserved in the apparatus, an exposure preparation process being related to the latter one of the two consecutive lots and being to be omitted; an estimating unit for estimating a process time to be saved by the omission of the exposure preparation process designated by the designating unit; and a generating unit for generating a sequence for the plurality of lots on the basis of the estimation made by the estimating unit, so as to minimize a required process time.

Abstract: An exposure apparatus having a plurality of units includes a scheduling unit which schedules a process step with respect to each lot, a combining unit which combines process steps of first and second lots, to be processed consecutively, with respect to which the scheduling unit has scheduled process steps, and a control unit which controls the plurality of units based on the process steps which are combined by the combining unit. The combining unit combines the process steps such that before completion of a process of the first lot and before loading of the second lot, a unit which is no longer used for the first lot starts a first process concerning the second lot.

Abstract: An exposure apparatus which exposes a subject to a pattern. A parameter necessary for processing in the exposure is updated, and a validity period of the updated parameter is set. The update is performed based on the validity period.