Abstract: A subject motion measuring apparatus includes at least one memory storing a program, and at least one processor which, by executing the program, causes the subject motion measuring apparatus to measure motion of a subject and output motion information related to the motion of the subject, reduce, from the motion information, an error caused by a disturbance other than the motion of the subject by using a trained model, and output the motion information in which the error is reduced. The trained model has functions of receiving a data set including the motion information with a plurality of degrees of freedom and outputting the motion information with the plurality of degrees of freedom in which the error is reduced.

Abstract: Provided is a lithography apparatus that performs patterning on a substrate with a plurality of beams, the apparatus comprising: an optical system configured to irradiate the substrate with the plurality of beams; and a controller configured to control the optical system, wherein the controller is configured to control the optical system so as to form a first pattern for an article in a first region of the substrate and form a second pattern for an inspection of the plurality of beams in a second region, different from the first region, of the substrate.

Abstract: A drawing apparatus performs drawing on a first partial region and a second partial region. The first and second partial regions having an overlap region in which the first and second partial regions overlap each other. The apparatus includes a transformation device configured to transform first pattern data for the first partial region into first quantized pattern data in accordance with a first transformation rule, and to transform second pattern data for the second partial region into second quantized pattern data in accordance with a second transformation rule different from the first transformation rule, and a controller configured to control the drawing on the first partial region based on the first quantized pattern data, and to control the drawing on the second partial region based on the second quantized pattern data.

Abstract: The present invention provides a lithography apparatus which forms a pattern on a substrate, the apparatus including a first dosing device configured to apply a first dose to the substrate based on data corresponding to the pattern, an acquiring device configured to acquire information of an error of a dimension of a pattern formed on the substrate via application of the first dose thereto, and a second dosing device configured to apply a second dose to the substrate based on the acquired information.

Abstract: A lithography apparatus that performs drawing on a substrate with an energy beam based on bitmap data generated via an error diffusion from pattern data includes a smoothing device configured to perform smoothing on the pattern data before the error diffusion.

Abstract: A drawing apparatus performs drawing on a first partial region and a second partial region. The first and second partial regions having an overlap region in which the first and second partial regions overlap each other. The apparatus includes a transformation device configured to transform first pattern data for the first partial region into first quantized pattern data in accordance with a first transformation rule, and to transform second pattern data for the second partial region into second quantized pattern data in accordance with a second transformation rule different from the first transformation rule, and a controller configured to control the drawing on the first partial region based on the first quantized pattern data, and to control the drawing on the second partial region based on the second quantized pattern data.