Patents by Inventor Hiromi Kumagai

Hiromi Kumagai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20010012483
    Abstract: The apparatus comprising a partition, a plurality of inner magnetic rings, and a plurality of outer magnetic rings is disclosed. The outer magnetic rings are magnetically coupled to the inner magnetic rings via the partition. The inner magnetic rings comprises a plurality of magnets disposed around a first yoke member. The outer magnetic rings comprise a plurality of magnets disposed around a second yoke member. One or both of the first and second yoke members can be disassembled.
    Type: Application
    Filed: January 31, 2001
    Publication date: August 9, 2001
    Applicant: BKS Lab. Ltd.
    Inventors: Hiroko Kono, Hiromi Kumagai
  • Patent number: 6247889
    Abstract: The apparatus comprising a partition, a plurality of inner magnetic rings, and a plurality of outer magnetic rings is disclosed. The outer magnetic rings are magnetically coupled to the inner magnetic rings via the partition. The inner magnetic rings comprises a plurality of magnets disposed around a first yoke member. The outer magnetic rings comprise a plurality of magnets disposed around a second yoke member. One or both of the first and second yoke members can be disassembled.
    Type: Grant
    Filed: June 4, 1999
    Date of Patent: June 19, 2001
    Assignee: BKS Lab. Ltd.
    Inventors: Hiroko Kono, Hiromi Kumagai
  • Patent number: 5916455
    Abstract: A low pressure plasma ignition method and apparatus includes an ignition cylinder which passes through an anode of a vacuum chamber, where the outlet of the ignition cylinder forms a nozzle. A coil is arranged around the cylinder and a plasma-generating gas supply pipe passes through an upper part of the cylinder. A plasma-generating gas, such as Argon gas, is supplied to the ignition cylinder in this structure, such that a high density plasma is formed in the ignition cylinder that is expelled into the vacuum chamber while the pressure is reduced through the nozzle. In the vacuum chamber, the expelled plasma becomes a seed plasma, such that a low pressure plasma is readily generated in the vacuum chamber.
    Type: Grant
    Filed: July 8, 1996
    Date of Patent: June 29, 1999
    Assignee: Applied Materials, Inc.
    Inventor: Hiromi Kumagai
  • Patent number: 5888338
    Abstract: The invention provides a novel magnetron plasma processing apparatus comprising the following, a vacuum chamber storing an etching object, the first electrode which is provided in the vacuum chamber and holds the etching object, the second electrode which is disposed in opposition from the first electrode, where the first and second electrodes are in parallel with each other, a gas-supply unit feeding etching gas to the vacuum chamber, a magnetic-field generating means which is disposed on the part opposite from the first electrode in opposition from the second electrode, and a power-supply unit which feeds power to either of these first and second electrodes and generates discharge between these parallel electrodes. Magnetic-field generating means is provided with a magnetic block whose both-end surfaces are provided with magnetic poles having polarity inverse from each other, and in addition, a plane recess opposite from the second electrode is provided between both-end surfaces of the magnetic block.
    Type: Grant
    Filed: March 27, 1997
    Date of Patent: March 30, 1999
    Assignees: Tokyo Electron Limited, Kabushiki Kaisha Toshiba
    Inventors: Hiromi Harada, Sinji Kubota, Hiromi Kumagai, Junichi Arami, Keiji Horioka, Isahiro Hasegawa, Haruo Okano, Katsuya Okumura, Yukimasa Yoshida
  • Patent number: 5660671
    Abstract: A magnetron plasma processing apparatus includes, a vacuum chamber storing an etching object, a first electrode which is provided in the vacuum chamber and holds the etching object, a second electrode which is disposed in opposition from the first electrode and parallel with the first electrode. A gas-supply unit feeding etching gas to the vacuum chamber while, a magnetic-field generating means is disposed on the part opposite from the first electrode in opposition from the second electrode, and a power-supply unit feeds power to either the first or second electrodes and generates discharge between the electrodes. The magnetic-field generating means is provided with a magnetic block whose both-end surfaces are provided with magnetic poles having polarity inverse from each other, and in addition, a plane recess opposite from the second electrode is provided between both-end surfaces of the magnetic block.
    Type: Grant
    Filed: June 28, 1994
    Date of Patent: August 26, 1997
    Assignees: Tokyo Electron Limited, Kabushiki Kaisha Toshiba
    Inventors: Hiromi Harada, Sinji Kubota, Hiromi Kumagai, Junichi Arami, Keiji Horioka, Isahiro Hasegawa, Haruo Okano, Katsuya Okumura, Yukimasa Yoshida
  • Patent number: 5439547
    Abstract: In a semiconductor manufacturing apparatus, provided are a vacuum processing chamber which implements a required processing to an object of processing under an atmosphere of reduced pressure, a single spare vacuum processing chamber provided to one side and adjacent to the vacuum processing chamber and provided with a support mechanism to support the object of processing and a conveyor arm to convey the object of processing internally. Thus the object of processing is conveyed to the vacuum processing chamber and conveyed from the vacuum processing chamber via the spare vacuum processing chamber.
    Type: Grant
    Filed: October 25, 1993
    Date of Patent: August 8, 1995
    Assignee: Tokyo Electron Kabushiki Kaisha
    Inventor: Hiromi Kumagai
  • Patent number: 5376211
    Abstract: A magnetron plasma processing apparatus including a vacuum chamber storing an object to be etched, a first electrode provided in the vacuum chamber to hold the object, a second electrode disposed to one side of the first electrode, where the first and second electrodes are in parallel with each other, a gas-supply unit feeding etching gas to the vacuum chamber, a magnetic-field generating means including a magnetic block disposed outside the chamber on the opposite side of the second electrode and rotatable about an axis normal to the object held by the first electrode, and a power-supply unit which feeds power to either of the first and second electrodes and generates discharge between these parallel electrodes. The magnetic block has end surfaces provided with magnetic poles having polarity inverse from each other, and in addition, a plane recess opposite from the second electrode is provided between the magnetic poles.
    Type: Grant
    Filed: September 27, 1991
    Date of Patent: December 27, 1994
    Assignees: Tokyo Electron Limited, Kabushiki Kaisha Toshiba
    Inventors: Hiromi Harada, Sinji Kubota, Hiromi Kumagai, Junichi Arami, Keiji Horioka, Isahiro Hasegawa, Haruo Okano, Katsuya Okumura, Yukimasa Yoshida
  • Patent number: 5332442
    Abstract: The present invention relates to a surface processing apparatus which performs heating processing of an object of heating which is mounted on a mounting device provided inside a process container, and which includes a plural number of lamps provided so as to oppose a rear surface of a processing surface of an object of processing, a rotating unit which has the plural number of lamps mounted to it in a ring shape, and a drive unit which drives the rotating unit. Also, the present invention relates to a processing apparatus for leading a process gas from a gas supply tube to a gas chamber partitioned inside a process container, and which blows process gas from an outlet of the gas chamber and onto an object of processing which is mounted on a mounting device provided inside the process container, and which includes a plural number of partition plates each provided with a plural number of through holes, being provided at required intervals in a direction of gas flow and inside the gas chamber.
    Type: Grant
    Filed: November 12, 1992
    Date of Patent: July 26, 1994
    Assignee: Tokyo Electron Kabushiki Kaisha
    Inventors: Masao Kubodera, Masaki Narushima, Masahito Ozawa, Hiromi Kumagai, Tomihiro Yonenaga, Sumi Tanaka
  • Patent number: 4954685
    Abstract: A heating furnace for semiconductor wafers having a heater arranged around a core tube, layers of a heat insulating material made of a porous heat insulating material or ceramic fibers arranged around the heater, and layers of a heat reflecting material arranged in the layers of the heat insulating material.
    Type: Grant
    Filed: July 25, 1988
    Date of Patent: September 4, 1990
    Assignee: Tokyo Electron Limited
    Inventors: Hiromi Kumagai, Kaoru Sato, Yoshio Imai
  • Patent number: 4733632
    Abstract: A wafer feeding apparatus comprises a horizontally movable arm section, an electrostatic chuck mechanism having a vertically movable support member attached to the arm section and moving mechanism for moving the support member, and an electrostatic chuck attached to the support member and having two semi-circular electrodes located in a manner to be electrically isolated from each other and each having a wafer attraction section and an insulating film formed on the wafer attraction section. A direct-current voltage is across the electrodes to electrostatically attract a semiconductor wafer to the wafer attraction sections of the electrodes through the insulating film.
    Type: Grant
    Filed: September 25, 1986
    Date of Patent: March 29, 1988
    Assignee: Tokyo Electron Limited
    Inventors: Tadahiro Ohmi, Hiromi Kumagai, Yoshiaki Yanagi