Patents by Inventor Hiromi Sasaki
Hiromi Sasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9293562Abstract: To improve performance of a semiconductor device. Over a semiconductor substrate, a gate electrode is formed via a first insulating film for a gate insulating film, and a second insulating film extends from over a side wall of the gate electrode to over the semiconductor substrate. Over the semiconductor substrate in a part exposed from the second insulating film, a semiconductor layer, which is an epitaxial layer for source/drain, is formed. The second insulating film has a part extending over the side wall of the gate electrode and a part extending over the semiconductor substrate, and a part of the semiconductor layer lies over the second insulating film in the part extending over the semiconductor substrate.Type: GrantFiled: June 2, 2015Date of Patent: March 22, 2016Assignee: RENESAS ELECTRONICS CORPORATIONInventors: Kenichi Yamamoto, Hiromi Sasaki, Tomotake Morita, Masashige Moritoki
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Publication number: 20150289708Abstract: A beverage dispensing machine (2) has a housing that provides a receptacle for receiving an expandable cartridge (12) that is coupled into the machine so that it can receive a charge of water. A kneading system (40) is provided to act on the cartridge within the receptacle. The kneading system is activated after water has been allowed to enter the cartridge and mechanically acts on or from the exterior of the cartridge in order to compress and release regions of the cartridge in order to create vigorous agitation to move the contents of the cartridge around inside the main compartment and bring them into close contact with a charge of water from the supply. Such a machine allows a wide variety of beverages to be created conveniently on demand from freeze-dried ingredients that can be stored inside the cartridges with a long shelf life.Type: ApplicationFiled: October 11, 2013Publication date: October 15, 2015Inventors: Khosro Ezaz-Nikpay, Daniel Kohn, Hendrick Sabert, Hiromi Sasaki, Aurelie Schmitt
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Publication number: 20150263133Abstract: To improve performance of a semiconductor device. Over a semiconductor substrate, a gate electrode is formed via a first insulating film for a gate insulating film, and a second insulating film extends from over a side wall of the gate electrode to over the semiconductor substrate. Over the semiconductor substrate in a part exposed from the second insulating film, a semiconductor layer, which is an epitaxial layer for source/drain, is formed. The second insulating film has a part extending over the side wall of the gate electrode and a part extending over the semiconductor substrate, and a part of the semiconductor layer lies over the second insulating film in the part extending over the semiconductor substrate.Type: ApplicationFiled: June 2, 2015Publication date: September 17, 2015Inventors: Kenichi YAMAMOTO, Hiromi SASAKI, Tomotake MORITA, Masashige MORITOKI
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Patent number: 9064889Abstract: To improve performance of a semiconductor device. Over a semiconductor substrate, a gate electrode is formed via a first insulating film for a gate insulating film, and a second insulating film extends from over a side wall of the gate electrode to over the semiconductor substrate. Over the semiconductor substrate in a part exposed from the second insulating film, a semiconductor layer, which is an epitaxial layer for source/drain, is formed. The second insulating film has a part extending over the side wall of the gate electrode and a part extending over the semiconductor substrate, and a part of the semiconductor layer lies over the second insulating film in the part extending over the semiconductor substrate.Type: GrantFiled: July 30, 2013Date of Patent: June 23, 2015Assignee: RENESAS ELECTRONICS CORPORATIONInventors: Kenichi Yamamoto, Hiromi Sasaki, Tomotake Morita, Masashige Moritoki
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Publication number: 20140082116Abstract: A design assistance device includes: a design information storage section configured to store design information containing at least information of slave devices and information of a topology in a network system in accordance with a design created by a user; an actual configuration information generation section configured to generate actual configuration information containing at least the information of the slave devices and the information of the topology in the actual network system; a comparison section configured to compare the design information and the actual configuration information; and an output section configured to generate a comparison screen indicating the respective configurations of the designed network system and the actual network system along with their commonalities and differences and outputting the comparison screen to a display device.Type: ApplicationFiled: March 23, 2011Publication date: March 20, 2014Applicant: OMRON CORPORATIONInventors: Hiromi Sasaki, Hiroshi Yoshida, Takeshi Jinkawa, Masaki Namie, Hirohito Mizumoto, Yutaka Tahara, Shigenori Sawada
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Publication number: 20140077288Abstract: To improve performance of a semiconductor device. Over a semiconductor substrate, a gate electrode is formed via a first insulating film for a gate insulating film, and a second insulating film extends from over a side wall of the gate electrode to over the semiconductor substrate. Over the semiconductor substrate in apart exposed from the second insulating film, a semiconductor layer, which is an epitaxial layer for source/drain, is formed. The second insulating film has a part extending over the side wall of the gate electrode and a part extending over the semiconductor substrate, and a part of the semiconductor layer lies over the second insulating film in the part extending over the semiconductor substrate.Type: ApplicationFiled: July 30, 2013Publication date: March 20, 2014Applicant: RENESAS ELECTRONICS CORPORATIONInventors: Kenichi YAMAMOTO, Hiromi SASAKI, Tomotake MORITA, Masashige MORITOKI
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Publication number: 20140075320Abstract: Provided is a design assistance system that enables even a user having no expert knowledge to easily design a network system taking into consideration the types of port connection interfaces. The design assistance system has a storage section for storing slave information data in which unique information of the slave device is described; an acquisition section for acquiring information of a connection interface of a port of the slave device from the slave information data; and a generation section for generating a device component serving as a GUI component representing the slave device based on the slave information data, generates a line component serving as a GUI component representing connection of the ports of the slave devices in different aspects in accordance with different types of the connection interface, and generates a design assisting GUI having a topology display screen configured to display the topology of the network system.Type: ApplicationFiled: March 23, 2011Publication date: March 13, 2014Applicant: OMRON CORPORATIONInventors: Hiromi Sasaki, Hiroshi Yoshida, Shintaro Iwamura, Masaki Namie
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Publication number: 20140059440Abstract: Provided is a design assistance system that enables a user having no expert knowledge to easily design a network system, taking into consideration the order in which slave devices are connected and the connection-destination ports. The design assistance system has a storage section that stores slave information data in which unique information of the slave device is described; an acquisition section that acquires information of a port of the slave device from the slave information data; and a generation section that generates a port component serving as a GUI component representing the port of the slave device based on the information of the port, generate a device component serving as a GUI component representing the slave device based on the slave information data, and generate a design assisting GUI containing a topology display screen that displays the topology of the network system which includes the device component and port component.Type: ApplicationFiled: March 23, 2011Publication date: February 27, 2014Applicant: OMRON CORPORATIONInventors: Hiromi Sasaki, Hiroshi Yoshida, Shintaro Iiwamura, Masaki Namie
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Apparatus for manufacturing magnetic recording disk, and in-line type substrate processing apparatus
Patent number: 8147924Abstract: An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.Type: GrantFiled: September 2, 2008Date of Patent: April 3, 2012Assignee: Canon Anelva CorporationInventors: Naoki Watanabe, Nobuyoshi Watanabe, Kazunori Tani, Shinji Furukawa, Hiromi Sasaki, Osamu Watabe -
Patent number: 7879680Abstract: Photoresist on a metal is removed with less oxidation of the metal surface by the invented ashing. During process, the matching of oxygen gas ratio and wafer temperature under downstream plasma which means no RF bias plasma is controlled for oxidation amount not to depend on ashing time with required photo resist rate in manufacturing.Type: GrantFiled: September 25, 2008Date of Patent: February 1, 2011Assignee: Renesas Electronics CorporationInventors: Hiromi Sasaki, Masashige Moritoki
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Apparatus for manufacturing magnetic recording disk, and in-line type substrate processing apparatus
Patent number: 7824497Abstract: An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.Type: GrantFiled: February 25, 2008Date of Patent: November 2, 2010Assignee: Canon Anelva CorporationInventors: Naoki Watanabe, Nobuyoshi Watanabe, Kazunori Tani, Shinji Furukawa, Hiromi Sasaki, Osamu Watabe -
Apparatus for Manufacturing Magnetic Recording Disk, and In-Line Type Substrate Processing Apparatus
Publication number: 20090151634Abstract: An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.Type: ApplicationFiled: January 5, 2009Publication date: June 18, 2009Applicants: CANON ANELVA CORPORATION, NIHON MICRO COATING CO., LTD.Inventors: Naoki WATANABE, Nobuyoshi WATANABE, Kazunori TANI, Shinji FURUKAWA, Hiromi SASAKI, Osamu WATABE -
Publication number: 20090087957Abstract: Photoresist on a metal is removed with less oxidation of the metal surface by the invented ashing. During process, the matching of oxygen gas ratio and wafer temperature under downstream plasma which means no RF bias plasma is controlled for oxidation amount not to depend on ashing time with required photo resist rate in manufacturing.Type: ApplicationFiled: September 25, 2008Publication date: April 2, 2009Applicant: NEC Electronics CorporationInventors: Hiromi Sasaki, Masashige Moritoki
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Apparatus for Manufacturing Magnetic Recording Disk, and In-Line Type Substrate Processing Apparatus
Publication number: 20090011140Abstract: An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.Type: ApplicationFiled: September 2, 2008Publication date: January 8, 2009Applicant: Canon Anelva CorporationInventors: Naoki Watanabe, Nobuyoshi Watanabe, Kazunori Tani, Shinji Furukawa, Hiromi Sasaki, Osamu Watabe -
Apparatus for Manufacturing Magnetic Recording Disk, and In-Line Type Substrate Processing Apparatus
Publication number: 20080216744Abstract: An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.Type: ApplicationFiled: February 25, 2008Publication date: September 11, 2008Applicant: CANON ANELVA CORPORATIONInventors: Naoki WATANABE, Nobuyoshi WATANABE, Kazunori TANI, Shinji FURUKAWA, Hiromi SASAKI, Osamu WATABE -
Apparatus for Manufacturing Magnetic Recording Disk, and In-Line Type Substrate Processing Apparatus
Publication number: 20080178804Abstract: An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.Type: ApplicationFiled: February 25, 2008Publication date: July 31, 2008Applicant: CANON ANELVA CORPORATIONInventors: Naoki WATANABE, Nobuyoshi WATANABE, Kazunori TANI, Shinji FURUKAWA, Hiromi SASAKI, Osamu WATABE -
Apparatus for Manufacturing Magnetic Recording Disk, and In-Line Type Substrate Processing Apparatus
Publication number: 20070234958Abstract: This invention presents a method and an apparatus for manufacturing a magnetic recording disk, where steps from magnetic-film deposition to lubricant-layer preparation are carried out without vacuum breaking. The invention also presents a method and an apparatus for manufacturing a magnetic recording disk, where a substrate is cleaned prior to the lubricant-layer preparation. The invention also presents a method and an apparatus for manufacturing a magnetic recording disk, where burnishing is carried out in vacuum after the magnetic-film deposition. The invention also presents a method and an apparatus for manufacturing a magnetic recording disk, where post-preparation treatment to coordinate adhesive strength and surface lubricity of the lubricant layer is carried out in vacuum.Type: ApplicationFiled: April 13, 2007Publication date: October 11, 2007Applicants: CANON ANELVA CORPORATION, NIHON MICRO COATING CO. INC.Inventors: Naoki WATANABE, Nobuyoshi WATANABE, Kazunori TANI, Shinji FURUKAWA, Hiromi SASAKI, Osamu WATABE -
Apparatus for manufacturing magnetic recording disk, and in-line type substrate processing apparatus
Publication number: 20050103271Abstract: An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.Type: ApplicationFiled: December 9, 2004Publication date: May 19, 2005Inventors: Naoki Watanabe, Nobuyoshi Watanabe, Kazunori Tani, Shinji Furukawa, Hiromi Sasaki, Osamu Watabe -
Apparatus for manufacturing magnetic recording disk, and in-line type substrate processing apparatus
Publication number: 20030200927Abstract: An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.Type: ApplicationFiled: April 3, 2003Publication date: October 30, 2003Inventors: Naoki Watanabe, Nobuyoshi Watanabe, Kazunori Tani, Shinji Furukawa, Hiromi Sasaki, Osamu Watabe -
Patent number: 6571729Abstract: An apparatus for depositing a protective film on a data recording disk, including the steps of depositing a magnetic film layer as a data recording layer on a surface of a substrate while the substrate is at a magnetic film deposition temperature; heating the substrate with the magnetic film layer thereon to a protective film deposition temperature; and depositing a protective film on the magnetic film layer while the substrate is at the protective film deposition layer; wherein the protective film deposition temperature is higher than the magnetic film deposition temperature.Type: GrantFiled: November 1, 2001Date of Patent: June 3, 2003Assignee: Anelva CorporationInventors: Hiromi Sasaki, Osamu Watabe, Naoki Watanabe