Abstract: Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): (wherein R1 represents a hydrogen atom or a methyl group, R2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).

Abstract: A steering device includes a pipe, a housing, a telescopic mechanism, and a load absorbing mechanism. The load absorbing mechanism includes an extending portion provided in the telescopic mechanism and extending in a front-rear direction, a first sliding portion provided on a first side in the left-right direction with respect to the extending portion, and a second sliding portion provided on a second side in the left-right direction with respect to the extending portion. The sliding portion includes a front pressing portion that comes into contact with a side surface of the extending portion, and a rear pressing portion provided behind the front pressing portion, and in which a distance in the left-right direction between the rear pressing portion and the other sliding portion facing the one sliding portion across the extending portion is shorter than a distance in the left-right direction between the front pressing portion and the other sliding portion.

Abstract: Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): (wherein R1 represents a hydrogen atom or a methyl group, R2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).

Abstract: A steering device includes a pipe, a housing, a telescopic mechanism, and a load absorbing mechanism. The load absorbing mechanism includes an extending portion coupled to the telescopic mechanism and extending in a front-rear direction, a first sliding portion provided on a first side in a left-right direction with respect to the extending portion, and a second sliding portion provided on a second side in the left-right direction with respect to the extending portion.

Abstract: Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): (wherein R1 represents a hydrogen atom or a methyl group, R2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).

Abstract: A steering device includes a pipe, a housing, a telescopic mechanism, and a load absorbing mechanism. The load absorbing mechanism includes an extending portion coupled to the telescopic mechanism and extending in a front-rear direction, a first sliding portion provided on a first side in a left-right direction with respect to the extending portion, and a second sliding portion provided on a second side in the left-right direction with respect to the extending portion.

Abstract: A steering device includes a pipe, a housing, a telescopic mechanism, and a load absorbing mechanism. The load absorbing mechanism includes an extending portion provided in the telescopic mechanism and extending in a front-rear direction, a first sliding portion provided on a first side in the left-right direction with respect to the extending portion, and a second sliding portion provided on a second side in the left-right direction with respect to the extending portion. The sliding portion includes a front pressing portion that comes into contact with a side surface of the extending portion, and a rear pressing portion provided behind the front pressing portion, and in which a distance in the left-right direction between the rear pressing portion and the other sliding portion facing the one sliding portion across the extending portion is shorter than a distance in the left-right direction between the front pressing portion and the other sliding portion.

Abstract: In a steering device according to an aspect of the present disclosure, a load absorbing mechanism includes a large diameter shaft portion provided in an EA block, a long hole provided in a housing and guiding the large diameter shaft portion at the time of a secondary collision, a guide plate projecting inside the long hole and having a resistance portion plastically deformed by the large diameter shaft portion at the time of the secondary collision, and an EA guide overlapping the guide plate when viewed in a front-rear direction, provided in the EA block to be slidable on the guide plate at the time of the secondary collision, and formed of a material having a friction coefficient smaller than that of the EA block.

Abstract: In a steering device according to an aspect of the present disclosure, a load absorbing mechanism includes a large diameter shaft portion provided in an EA block, a long hole provided in a housing and guiding the large diameter shaft portion at the time of a secondary collision, a guide plate projecting inside the long hole and having a resistance portion plastically deformed by the large diameter shaft portion at the time of the secondary collision, and an EA guide overlapping the guide plate when viewed in a front-rear direction, provided in the EA block to be slidable on the guide plate at the time of the secondary collision, and formed of a material having a friction coefficient smaller than that of the EA block.

Abstract: Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): (wherein R1 represents a hydrogen atom or a methyl group, R2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).

Abstract: Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): (wherein R1 represents a hydrogen atom or a methyl group, R2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).

Abstract: A liquid molding resin component for a reaction injection molding process includes a liquid resin reaction monomer including metathesis polymerizable cycloolefin and a plurality of nonswelling mica. The plurality of nonswelling mica have an average particle size in a range of about 35 micro m to about 500 micro m and have a bulk density in a range of about 0.10 g/ml to about 0.27 g/ml. Further, a liquid resin component system for a reaction injection molding process includes a plurality of liquid resin components, at least one of which includes a catalyst, at least one of which includes an activator, and at least one of which includes a plurality of nonswelling mica having an average particle size in a range of about 35 micro m to about 500 micro m and having a bulk density in a range of about 0.10 g/ml to 0.27 g/ml.

Abstract: A resist polymer solution comprising a resist polymer containing a repeating unit decomposed by the action of an acid so as to be soluble in alkali and a repeating unit having a polar group, the resist polymer dissolved in a solvent for coating film formation, wherein the amount of impurities whose boiling point is not higher than that of the solvent for coating film formation is 1 mass % or less based on the resist polymer. Further, there is provided a process for producing a resist polymer solution, comprising the step (1) of redissolving a solid matter containing a resist polymer in a solvent for coating film formation (a) and/or a solvent (b) whose boiling point at atmospheric pressure is not higher than that of the solvent (a); and the impurity removing step (2) of distilling off the solvent (b) and/or any excess amount of solvent (a) in vacuum from the redissolution solution obtained in the step (1).

Abstract: In a method and system for transmitting and receiving data, specified data can be transmitted only to a specific receiving terminal by assigning unique terminal information to the receiving terminal. When transmitted with data, the unique terminal information identifies the specific receiving terminal as the destination of transmission from among a plurality of receiving terminals. An update program for changing the processing of the receiving terminal may be transmitted to the specific receiving terminal along with the unique terminal information. The unique terminal information and the update program are stored in a prescribed storage location in the specific receiving terminal. Thus, a one-to-one broadcasting system is achieved.

Abstract: A camera system includes a camera apparatus for shooting an object to output an image signal and a camera control apparatus for controlling the camera apparatus such that the camera apparatus shoots a plurality of images constructing a panorama image in a predetermined order while changing zoom magnifications based on previously-determined setting and making a panorama image by joining a plurality of images with different zoom magnifications shot by the camera apparatus together.

Abstract: In a method and system for transmitting and receiving data, specified data can be transmitted only to a specific receiving terminal by assigning unique terminal information to the receiving terminal. When transmitted with data, the unique terminal information identifies the specific receiving terminal as the destination of transmission from among a plurality of receiving terminals. An update program for changing the processing of the receiving terminal may be transmitted to the specific receiving terminal along with the unique terminal information. The unique terminal information and the update program are stored in a prescribed storage location in the specific receiving terminal. Thus, a one-to-one broadcasting system is achieved.

Abstract: In a method and system for transmitting and receiving data, specified data can be transmitted only to a specific receiving terminal by assigning unique terminal information to the receiving terminal. When transmitted with data, the unique terminal information identifies the specific receiving terminal as the destination of transmission from among a plurality of receiving terminals. An update program for changing the processing of the receiving terminal may be transmitted to the specific receiving terminal along with the unique terminal information. The unique terminal information and the update program are stored in a prescribed storage location in the specific receiving terminal. Thus, a one-to-one broadcasting system is achieved.

Abstract: A camera system includes a camera apparatus for shooting an object to output an image signal and a camera control apparatus for controlling the camera apparatus such that the camera apparatus shoots a plurality of images constructing a panorama image in a predetermined order while changing zoom magnifications based on previously-determined setting and making a panorama image by joining a plurality of images with different zoom magnifications shot by the camera apparatus together.

Abstract: A resist polymer solution comprising a resist polymer containing a repeating unit decomposed by the action of an acid so as to be soluble in alkali and a repeating unit having a polar group, the resist polymer dissolved in a solvent for coating film formation, wherein the amount of impurities whose boiling point is not higher than that of the solvent for coating film formation is 1 mass % or less based on the resist polymer. Further, there is provided a process for producing a resist polymer solution, comprising the step (1) of redissolving a solid matter containing a resist polymer in a solvent for coating film formation (a) and/or a solvent (b) whose boiling point at atmospheric pressure is not higher than that of the solvent (a); and the impurity removing step (2) of distilling off the solvent (b) and/or any excess amount of solvent (a) in vacuum from the redissolution solution obtained in the step (1).

Abstract: Disclosed is an information-processing apparatus comprising: storage means for storing application programs and data files; calculating means for activating an application program stored in the storage means to carry out predetermined processing; media drive means for recording and playing back information into and from an external recording medium; and control means which controls the media-drive means and the storage means when the external recording medium for recording an application program is mounted on the media drive means so that: when the storage means includes a remaining free storage area with a size large enough for accommodating the application program recorded in the external recording medium, the application program recorded in the external recording medium is installed in the storage means; but when the storage means includes a remaining free storage area with a size not large enough for accommodating the application program recorded in the external recording medium, on the other hand, an app