Patents by Inventor Hiromitsu Miura

Hiromitsu Miura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6951956
    Abstract: Crystalline polyglycolic acid wherein a difference between the melting point Tm and the crystallization temperature Tc2 is not lower than 35° C., and a difference between the crystallization temperature Tc1 and the glass transition temperature Tg is not lower than 40° C. A production process of polyglycolic acid modified in crystallinity, comprising applying heat history to crystalline polyglycolic acid at a temperature of not lower than (the melting point Tm of the crystalline polyglycolic acid+38° C.). A polyglycolic acid composition comprising crystalline polyglycolic acid and a heat stabilizer, wherein a difference (T2?T1) between the temperature T2 at 3%-weight loss on heating of the polyglycolic acid composition and the temperature T1 at 3%-weight loss on heating of the crystalline polyglycolic acid is not lower than 5° C.
    Type: Grant
    Filed: April 25, 2002
    Date of Patent: October 4, 2005
    Inventors: Kazuyuki Yamane, Hiromitsu Miura, Toshihiko Ono, Junji Nakajima, Daisuki Itoh
  • Publication number: 20050214489
    Abstract: At least one layer of an aliphatic polyester resin, which is biodegradable and is also excellent in gas-barrier property and mechanical strength, is laminated with another thermoplastic resin layer to provide a satisfactory multilayer stretched product. The aliphatic co-polyester (A) has a crystallization temperature Tc1 due to crystallization in the course of heating, which is higher than the glass transition temperature Tg of another thermoplastic resin.
    Type: Application
    Filed: May 22, 2003
    Publication date: September 29, 2005
    Inventors: Hiroyuki Sato, Yoshinori Suzuki, Hiromitsu Miura
  • Publication number: 20030125508
    Abstract: Crystalline polyglycolic acid wherein a difference between the melting point Tm and the crystallization temperature Tc2 is not lower than 35° C., and a difference between the crystallization temperature Tc1 and the glass transition temperature Tg is not lower than 40° C. A production process of polyglycolic acid modified in crystallinity, comprising applying heat history to crystalline polyglycolic acid at a temperature of not lower than (the melting point Tm of the crystalline polyglycolic acid+38° C.). A polyglycolic acid composition comprising crystalline polyglycolic acid and a heat stabilizer, wherein a difference (T2−T1) between the temperature T2 at 3%-weight loss on heating of the polyglycolic acid composition and the temperature T1 at 3%-weight loss on heating of the crystalline polyglycolic acid is not lower than 5° C.
    Type: Application
    Filed: November 2, 2001
    Publication date: July 3, 2003
    Inventors: Kazuyuki Yamane, Hiromitsu Miura, Toshihiko Ono, Junji Nakajima, Daisuke Itoh
  • Publication number: 20030125431
    Abstract: Crystalline polyglycolic acid wherein a difference between the melting point Tm and the crystallization temperature Tc2 is not lower than 35° C., and a difference between the crystallization temperature Tc1 and the glass transition temperature Tg is not lower than 40° C. A production process of polyglycolic acid modified in crystallinity, comprising applying heat history to crystalline polyglycolic acid at a temperature of not lower than (the melting point Tm of the crystalline polyglycolic acid+38° C.). A polyglycolic acid composition comprising crystalline polyglycolic acid and a heat stabilizer, wherein a difference (T2−T1) between the temperature T2 at 3%-weight loss on heating of the polyglycolic acid composition and the temperature T1 at 3%-weight loss on heating of the crystalline polyglycolic acid is not lower than 5° C.
    Type: Application
    Filed: April 25, 2002
    Publication date: July 3, 2003
    Inventors: Kazuyuki Yamane, Hiromitsu Miura, Toshihiko Ono, Junji Nakajima, Daisuke Itoh