Patents by Inventor Hiromitsu To

Hiromitsu To has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure apparatus and method of manufacturing device
    Patent number: 7760323
    Abstract: At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate to light through an original plate including a shield configured to surround an optical path space of the exposure apparatus where a gas supply system is configured to supply gas into the optical path space which is deflected by a rectifier to direct the flow outside of the optical path space.
    Type: Grant
    Filed: February 17, 2006
    Date of Patent: July 20, 2010
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiromitsu To, Hidekazu Furumoto
  • Exposure apparatus and method
    Patent number: 7630055
    Abstract: An apparatus projects a pattern formed on an original plate onto a substrate through a projection optical system and liquid in a state where a gap between the substrate and a face of the projection optical system is filled with liquid. The apparatus includes a movable substrate stage to hold the substrate and including at least a mark unit or a measurement unit having a light-receiving unit, a determination device to determine whether the liquid is attached to the mark unit or the measurement unit, and a liquid supply device to attach liquid to at least the mark unit or the measurement unit before the attached liquid is air-dried if liquid is determined to be attached to the mark unit or the measurement unit.
    Type: Grant
    Filed: June 13, 2008
    Date of Patent: December 8, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiromitsu To
  • EXPOSURE APPARATUS AND METHOD
    Publication number: 20090002651
    Abstract: An apparatus projects a pattern formed on an original plate onto a substrate through a projection optical system and liquid in a state where a gap between the substrate and a face of the projection optical system is filled with liquid. The apparatus includes a movable substrate stage to hold the substrate and including at least a mark unit or a measurement unit having a light-receiving unit, a determination device to determine whether the liquid is attached to the mark unit or the measurement unit, and a liquid supply device to attach liquid to at least the mark unit or the measurement unit before the attached liquid is air-dried if liquid is determined to be attached to the mark unit or the measurement unit.
    Type: Application
    Filed: June 13, 2008
    Publication date: January 1, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Hiromitsu To
  • Exposure apparatus and method of manufacturing device
    Publication number: 20060209274
    Abstract: At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate to light through an original plate including a shield configured to surround an optical path space of the exposure apparatus where a gas supply system is configured to supply gas into the optical path space which is deflected by a rectifier to direct the flow outside of the optical path space.
    Type: Application
    Filed: February 17, 2006
    Publication date: September 21, 2006
    Applicant: Canon Kabushiki Kaisha
    Inventors: Hiromitsu To, Hidekazu Furumoto