Abstract: A conveying unit for conveying a device chip onto a predetermined electrode of a board has a chip chuck that holds under suction one surface of the device chip, a support base to which the chip chuck is fixed in an inclinable manner, and a moving unit that moves the support base, in which a fixing mechanism that fixes the chip chuck to the support base has a plurality of leaf springs extending laterally radially from the chip chuck, the plurality of leaf springs are connected to the support base in the surroundings of the chip chuck, and the plurality of leaf springs are pulled one another, so that the chip chuck is supported in air in an inclinable manner.

Abstract: A conveying unit for conveying a device chip onto a predetermined electrode of a board has a chip chuck that holds under suction one surface of the device chip, a support base to which the chip chuck is fixed in an inclinable manner, and a moving unit that moves the support base, in which a fixing mechanism that fixes the chip chuck to the support base has a plurality of leaf springs extending laterally radially from the chip chuck, the plurality of leaf springs are connected to the support base in the surroundings of the chip chuck, and the plurality of leaf springs are pulled one another, so that the chip chuck is supported in air in an inclinable manner.

Abstract: A cleaning apparatus includes a spinner table for holding a workpiece thereon, a cleaning nozzle for supplying cleaning water to the workpiece held on the spinner table, an ultrasonic vibrator for applying ultrasonic vibrations to the cleaning water supplied from the cleaning nozzle to the workpiece, a water layer forming unit for forming a layer of the cleaning water in a clearance between the cleaning nozzle and the workpiece, the water layer forming unit having a cover surrounding the cleaning nozzle, and a drain unit for draining the cleaning water out of the cleaning apparatus, the drain unit having a flow channel for allowing the cleaning water supplied from the cleaning nozzle to the workpiece to flow therethrough.

Abstract: A cooling structure for a first electromagnetic coil includes the first electromagnetic coil having a space extending in the direction of a predetermined axis Z; a cooling member attached to an end surface, with respect to the direction of the predetermined axis Z, of the first electromagnetic coil and having a flow path for fluid internally formed; and an inlet pipe and an outlet pipe connected, within the space, to an inlet and outlet, respectively, of the flow path of the cooling member and extending through the space to a region outside the electromagnetic coil.

Abstract: Disclosed is an armature coil that constitutes a stator of an X-axis linear motor and that generates a magnetic field by passing a current therethrough, the armature coil comprising: a band-shaped electroconductive layer that is made of copper and that is wound around a predetermined winding axis; a band-shaped insulating layer that is provided between opposing surfaces of the electroconductive layer, and that electrically insulates the opposing electroconductive layers from one another; and bonding layer that bonds together the opposing surfaces of the electroconductive layer with the insulating layer therebetween.

Abstract: A cooling structure for a first electromagnetic coil includes the first electromagnetic coil having a space extending in the direction of a predetermined axis Z; a cooling member attached to an end surface, with respect to the direction of the predetermined axis Z, of the first electromagnetic coil and having a flow path for fluid internally formed; and an inlet pipe and an outlet pipe connected, within the space, to an inlet and outlet, respectively, of the flow path of the cooling member and extending through the space to a region outside the electromagnetic coil.

Abstract: An exposure method that uses a substrate (M) held by a holding member (28) to perform exposure processing, comprising a holding process, which holds a prescribed region (AR3) of the substrate as the holding region by means of the holding member, and a deformation process, which selectively deforms one side of the holding region of the substrate held by the holding process with respect to the other side. According to the present invention, a prescribed region of the substrate is held as a holding region by means of a holding member, and one side of the holding region of said held substrate is selectively deformed with respect to the other side, so it is possible to selectively eliminate the nonlinear deformation components attributable to holding of the substrate with respect to one side from among the two sides of the substrate using the holding region as a reference.

Abstract: An exposure apparatus comprises a stage main body having a mounting surface, and a correcting mechanism that corrects a shape of the mounting surface.

Abstract: A pellicle is provided to one end surface of end surfaces of a frame. Another end surface of the end surfaces of the frame has an area that opposes a substrate. A configuration is adopted that prevents the deformation of the one end surface of the frame and the shape of the opposing area on the other end surface from affecting one another.

Abstract: An apparatus for controlling the distortion of a reticle (28) includes a temperature adjuster (258) and a control system (226). The temperature adjuster (258) includes a plurality of adjuster elements (258E) that individually adjust the temperature of a plurality of regions (28R) of the reticle (28). The control system (226) includes a state observer (250) and a controller (260). The state observer (250) estimates an estimated physical condition (250C) of the reticle (28). The controller (260) controls the adjuster elements (258E) of the temperature adjuster (258) based at least in part on the estimated physical condition (250C).

Abstract: An exposure apparatus comprises: a first moving body, which comprises guide members that extend in a first direction, that moves in a second direction, which is substantially orthogonal to the first direction, by the drive of a first drive apparatus; two second moving bodies, which are provided such that they are capable of moving independently in the first direction along the guide members, that move in the second direction together with the guide members by the movement of the first moving body; a holding member, which holds an object W and is supported by the two second moving bodies such that it is capable of moving within a two dimensional plane that includes at least the first direction and the second direction as well as a first position directly below an optical system; and a liquid holding member that is disposed adjacent to the two second moving bodies in the second direction, moves together with the holding member, which is supported by the two second moving bodies, in a direction parallel to the s

Abstract: A drive system drives the moving body based on: measurement results of a first measuring system that measures the position of the moving body within an plane by radiating a measurement beam from an arm member to a grating disposed in one surface of a moving body that is parallel to an XY plane; and measurement results of a second measuring system that uses laser interferometers to measure a change in the shape of the arm member. The drive system uses the measurement results of the second measuring system to correct measurement error, owing to a change in the shape of the arm member, included in the measurement results of the first measuring system.

Abstract: An exposure apparatus includes: a first moving body, which comprises guide members that extend in a first direction, moves in a second direction, which is substantially orthogonal to the first direction; two second moving bodies, which are provided such that they are capable of moving in the first direction along the guide members, move in the second direction together with the guide members by the movement of the first moving body; a holding apparatus holds the object and is supported by the two second moving bodies such that it is capable of moving within a two dimensional plane that includes at least the first directions and the second directions; and a transport apparatus, which comprises a chuck member that can noncontactually hold the object from above, transports the object to and from the holding apparatus.

Abstract: A stage apparatus comprises: a measuring apparatus that radiates a measurement beam to a measurement surface, which is formed on a surface on an side opposite a holding surface whereon an object of an holding member is held, and measures the position of the holding member in a direction corresponding to six degrees of freedom by receiving a reflected beam of the measurement beam reflected from the measurement surface; and a control apparatus that, based on tilt information of the positional information of the holding member, corrects information selected from the group consisting of the first direction positional information and the second direction positional information of the holding member.

Abstract: An exposure apparatus includes: a first moving body, which comprises a guide member that extends in a first direction, that moves in a second direction, which is substantially orthogonal to the first direction; two second moving bodies, which are provided such that they are capable of moving in the first direction along the guide members, that move in the second direction together with the guide member by the movement of the first moving body; and a holding member, which is detachably supported by the two second moving bodies and is capable of holding the object and moving with respect to the two second moving bodies. The second moving bodies include a first drive part and a second drive part that are independently controllable.

Abstract: A first stage unit and a second stage unit are disposed adjacently in a second direction. A first holding member, which is supported by a first stage unit, and a second holding member, which is supported by the second stage unit, move in a direction parallel to the second direction while maintaining the state wherein they are in either close proximity or contact at end parts on the second direction side and transition from a first state, wherein a liquid is held between the object on the first holding member and the optical system, to a second state, wherein the liquid is held between the object on the second holding member and the optical system.

Abstract: A stage apparatus includes a guide member that extends in first directions, that moves in second directions, which are substantially orthogonal to the first directions; two second moving bodies, which are provided along the guide member such that they are independently moveable in the first directions, that move in the second directions together with the guide member by the movement of the first moving body; and a holding member that holds an object and is supported by the two second moving bodies such that it is capable of moving within a two dimensional plane that includes at least the first directions and the second directions.

Abstract: Methods and apparatus for cooling a reticle are disclosed. According to one aspect of the present invention, an apparatus for providing top side cooling to a reticle includes a heat exchanger arrangement and an actuator. The heat exchanger arrangement includes a first surface arranged to facilitate heat transfer between the reticle and the heat exchanger arrangement. The heat transfer provides cooling to at least some portions of the reticle. The actuator positions the first surface of the heat exchanger arrangement at a distance over the reticle.

Abstract: An exposure method that uses a substrate (M) held by a holding member (28) to perform exposure processing, comprising a holding process, which holds a prescribed region (AR3) of the substrate as the holding region by means of the holding member, and a deformation process, which selectively deforms one side of the holding region of the substrate held by the holding process with respect to the other side. According to the present invention, a prescribed region of the substrate is held as a holding region by means of a holding member, and one side of the holding region of said held substrate is selectively deformed with respect to the other side, so it is possible to selectively eliminate the nonlinear deformation components attributable to holding of the substrate with respect to one side from among the two sides of the substrate using the holding region as a reference.

Abstract: An exposure apparatus comprises a stage main body having a mounting surface, and a correcting mechanism that corrects a shape of the mounting surface.