Abstract: Disclosed herein is a common mode filter that includes: a first conductor layer including a first coil pattern, a first connection pattern, and a first lead-out pattern connecting the first coil pattern and the first connection pattern; and a second conductor layer including a second coil pattern, a second connection pattern, and a second lead-out pattern connecting the second coil pattern and the second connection pattern. The extending direction of the first section of the first lead-out pattern and an extending direction of the second section of the second lead-out pattern are opposed to each other. The first section is longer than the second section. The second coil pattern is larger in diameter than the first coil pattern.

Abstract: A photoresist composition comprising: a resin which has a structural unit represented by formula (I): wherein R1 represents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group which optionally has a halogen atom, and R2 represents a C1 to C42 hydrocarbon group which optionally has a substituent; an alkali-soluble resin; an acid generator; and a solvent.

Abstract: Disclosed herein is a coil component that includes first, second, third, and fourth terminal electrodes; a first planar spiral coil formed on a substrate, the first planar spiral coil having an outer peripheral end connected to the first terminal electrode; a second planar spiral coil stacked on the first planar spiral coil through a first insulating layer, the second planar spiral coil having an outer peripheral end connected to the second terminal electrode; and first and second lead-out patterns stacked on the second planar spiral coil through a second insulating layer. The first lead-out pattern connects the third terminal electrode and an inner peripheral end of the first planar spiral coil. The second lead-out pattern connects the fourth terminal electrode and an inner peripheral end of the second planar spiral coil. The second insulating layer is thicker than the first insulating layer.

Abstract: A resin comprising a structural unit represented by formula (I0): wherein A1, A2 and A3 each independently represent a C2-C18 divalent hydrocarbon group, R1, R2, R3 and R4 each independently represent a hydrogen atom or a C1-C6 saturated hydrocarbon group, X1 and X2 each independently represent *—O—CO—, —O—CO—O— or —O—, and * represents a binding site to A2 or A3.

Abstract: A salt represented by formula (I): wherein R1 and R2 independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group, X1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, and A? represents an organic anion.

Abstract: A salt represented by formula (I): wherein R1 and R2 independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group, X1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, and A? represents an organic anion.

Abstract: A resin comprising a structural unit represented by formula (I0): wherein A1, A2 and A3 each independently represent a C2-C18 divalent hydrocarbon group, R1, R2, R3 and R4 each independently represent a hydrogen atom or a C1-C6 saturated hydrocarbon group, X1 and X2 each independently represent *—O—CO—, —O—CO—O— or —O—, and * represents a binding site to A2 or A3.

Abstract: A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 each independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, R3 represents a hydrogen atom, a fluorine atom, a C1 to C12 alkyl group or a C1 to C12 fluorinated alkyl group, R4 represents a C1 to C12 fluorinated alkyl group, L2 represents a single bond, a C1 to C12 divalent saturated hydrocarbon group, etc., R5 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a group represented by formula (b1-1), etc., * represents a bonding site to —CR3R4; Lb2 and Lb3 each independently represent a single bond or a C1 to C22 divalent saturated hydrocarbon group; Z+ represents an organic cation.

Abstract: A photoresist composition comprising an acid generator and a resin comprising a structural unit derived from a monomer represented by the formula (1): wherein R1 represents a hydrogen atom etc., R2 represents a hydrogen atom or a C1-C4 alkyl group, A1 represents a single bond etc., and B1 represents a group represented by the formula (1a): wherein R3, R4 and R5 each independently represents a C1-C16 aliphatic hydrocarbon group and R4 and R5 can be bonded each other to form a C3-C18 ring together with the carbon atom to which R4 and R5 are bonded, a C4-C20 saturated cyclic group having a lactone structure or a C5-C20 saturated cyclic hydrocarbon group having at least one hydroxyl group.

Abstract: A photoresist composition comprising: a resin which has a structural unit represented by formula (I): wherein R1 represents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group which optionally has a halogen atom, and R2 represents a C1 to C42 hydrocarbon group which optionally has a substituent; an alkali-soluble resin; an acid generator; and a solvent.

Abstract: A salt represented by the formula (I): wherein R1 represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; A1 represents a lactone ring-containing group which has 4 to 24 carbon atoms; R2 represents an acid-labile group; and “m” represents an integer of 0 to 3.

Abstract: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, A13, A14, X12, Rb1, Rb2, Lb1, ring Wb1, Rb3, Rb4, m and Z1+ are defined in the specification.

Abstract: The present invention is a salt represented by the formula (I) wherein R1 and R2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; L1 represents a C1 to C17 divalent saturated hydrocarbon group, a —CH2— contained in the saturated hydrocarbon group may be replaced by —O— or —CO—; ring W1 represents a C2 to C36 heterocycle; R3 represents a hydrogen atom or a C1 to C12 hydrocarbon group, a —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—; R4 in each occurrence independently represent a C1 to C6 hydrocarbon group, a —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—; m represents an integer of 0 to 6; and Z+ represents an organic cation.

Abstract: A salt represented by the formula (I): wherein R1 represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; A1 represents a lactone ring-containing group which has 4 to 24 carbon atoms; R2 represents an acid-labile group; and “m” represents an integer of 0 to 3.

Abstract: A salt represented by formula (1): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 each independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, R3 represents a hydrogen atom, a fluorine atom, a C1 to C12 alkyl group or a C1 to C12 fluorinated alkyl group, R4 represents a C1 to C12 fluorinated alkyl group, L2 represents a single bond, a C1 to C12 divalent saturated hydrocarbon group, etc., R5 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a group represented by formula (b1-1), etc., * represents a bonding site to —CR3R4; Lb2 and Lb3 each independently represent a single bond or a C1 to C22 divalent saturated hydrocarbon group; Z+ represents an organic cation.

Abstract: A resin comprising a structural unit represented by formula (aa): wherein T1 represents a C3-C34 sultone ring group optionally having a substituent, X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents —X2— or —X3—X4—CO—X5—, where X2, X3 and X5 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rd)—, and Rd represents a hydrogen atom or a C1-C6 alkyl group, and R1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally having a halogen atom.

Abstract: A salt represented by the formula (I): wherein R1 and R2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group which can have one or more fluorine atoms and in which one or more —CH2— can be replaced by —O— or —CO—, R3 represents a group having a cyclic ether structure, and Z1+ represents an organic cation.

Abstract: The present invention provides a salt represented by the formula (I): wherein R1 and R2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO— and which can have one or more fluorine atoms, R3 represents a hydrogen atom or a methyl group, and Z1+ represents an organic counter cation, and a photoresist composition containing the same.

Abstract: A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) at least one compound selected from the group consisting of a compound represented by the formula (II1) and a compound represented by the formula (II2), wherein R1, A1, R2, R6, X1, X2, R3, R4 and R5 are defined in the specification.

Abstract: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a compound represented by the formula (II), wherein R1, A1, A13, A14, X12, R23, R24, R25, R26, X21 and X22 are defined in the specification.