Abstract: A substrate treatment method according to the present invention is a substrate treatment method of treating at least one substrate in a treatment tank with treatment liquid. The substrate treatment method includes the following processes of: acquiring in advance treatment information of the substrate to be treated in the treatment tank; specifying a predicted concentration change pattern corresponding to the acquired treatment information of the substrate by referencing correspondence information describing a plurality of situations possible for the treatment information and a plurality of concentration change patterns of the treatment liquid prepared in advance to respectively correspond to the plurality of situations of the treatment information; and carrying out concentration control of the treatment liquid based on the predicted concentration change pattern while the substrate is treated in the treatment tank.