Patents by Inventor Hironobu Matsui
Hironobu Matsui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11609744Abstract: An open/close counting device to be attached to one of a first die and a second die which constitute a die, the die being opened by relatively moving the first die and the second die, the open/close counting device counting the number of open/close times of the die. The open/close counting device includes an open/close detecting section provided so as to face a target face of the other of the first die and the second die and to detect relative displacement of the target face along a die moving direction in non-contact condition, and includes an output section to output the open/close times counted based on detection of open/close by the open/close detecting section.Type: GrantFiled: January 29, 2021Date of Patent: March 21, 2023Assignee: MATSUI MFG. CO., LTD.Inventors: Satoru Tojyo, Hironobu Matsui
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Patent number: 11440061Abstract: An adhering matter removing method for removing adhering matter on a surface of an article includes the step of immersing a target surface of the article into a fluidized bed.Type: GrantFiled: July 24, 2020Date of Patent: September 13, 2022Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Yasuhiko Shirai, Hironobu Matsui
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Patent number: 11397550Abstract: A display device to be attached to a die, the display device including a display to rewrite and display die management information obtained in an information acquisition section to obtain the die management information for managing the die. The display uses electric power when display content is rewritten, and the display uses no electric power for keeping the display.Type: GrantFiled: January 29, 2021Date of Patent: July 26, 2022Assignee: MATSUI MFG. CO., LTD.Inventors: Satoru Tojyo, Hironobu Matsui
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Publication number: 20210263695Abstract: A display device to be attached to a die, the display device including a display to rewrite and display die management information obtained in an information acquisition section to obtain the die management information for managing the die. The display uses electric power when display content is rewritten, and the display uses no electric power for keeping the display.Type: ApplicationFiled: January 29, 2021Publication date: August 26, 2021Inventors: Satoru TOJYO, Hironobu MATSUI
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Publication number: 20210263709Abstract: An open/close counting device to be attached to one of a first die and a second die which constitute a die, the die being opened by relatively moving the first die and the second die, the open/close counting device counting the number of open/close times of the die. The open/close counting device includes an open/close detecting section provided so as to face a target face of the other of the first die and the second die and to detect relative displacement of the target face along a die moving direction in non-contact condition, and includes an output section to output the open/close times counted based on detection of open/close by the open/close detecting section.Type: ApplicationFiled: January 29, 2021Publication date: August 26, 2021Inventors: Satoru TOJYO, Hironobu MATSUI
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Publication number: 20210129191Abstract: An adhering matter removing method for removing adhering matter on a surface of an article includes the step of immersing a target surface of the article into a fluidized bed.Type: ApplicationFiled: July 24, 2020Publication date: May 6, 2021Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Yasuhiko SHIRAI, Hironobu MATSUI
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Patent number: 5442183Abstract: A charged particle beam apparatus includes a charged particle beam generating system for causing a charged particle source to generate a charged particle beam. A focusing system focuses the charged particle beam onto a sample. A deflecting system causes the focused charged particle beam to scan the surface of the sample. An evacuating system evacuates a space through which the charged particle beam passes. A detector detects information obtained by irradiating the charged particle beam onto the sample. An image display system displays as an image the status of distribution of the information over the sample surface based on a detection signal forwarded from the detector. The focusing system is entirely constituted by an electrostatic lens containing a plurality of lens electrodes, one of the lens electrodes being a final electrode located closest to the sample.Type: GrantFiled: October 19, 1993Date of Patent: August 15, 1995Assignee: Hitachi, Ltd.Inventors: Hironobu Matsui, Mikio Ichihashi, Shinjiroo Ueda, Tadashi Otaka, Kazue Takahashi, Toshiaki Kobari, Kenji Odaka
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Patent number: 5254856Abstract: A charged particle beam apparatus includes a charged particle beam generating system for causing a charged particle source to generate a charged particle beam. A focusing system focuses the charged particle beam onto a sample. A deflecting system causes the focused charged particle beam to scan the surface of the sample. An evacuating system evacuates a space through which the charged particle beam passes. A detector detects information obtained by irradiating the charged particle beam onto the sample. An image display system displays as an image the status of distribution of the information over the sample surface based on a detection signal forwarded from the detector. The focusing system is entirely constituted by an electrostatic lens containing a plurality of lens electrodes, one of the lens electrodes being a final electrode located closest to the sample.Type: GrantFiled: June 18, 1991Date of Patent: October 19, 1993Assignee: Hitachi, Ltd.Inventors: Hironobu Matsui, Mikio Ichihashi, Shinjiroo Ueda, Tadashi Otaka, Kazue Takahashi, Toshiaki Kobari, Kenji Odaka
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Patent number: 5229607Abstract: A combination apparatus having a scanning electron microscope includes equipment for performing any of observing, measuring and processing operations on a sample placed in a sample chamber. The sample chamber contains a focused electron beam irradiating unit apart from the components for performing the observing, measuring and processing operations. The focused electron beam irradiating unit irradiates a finely focused electron beam onto the surface of the sample for electron microscopic observation in scanning fashion. This setup allows the observing, measuring or processing equipment to combine with the scanning electron microscope without appreciably enlarging the construction of the combination apparatus.Type: GrantFiled: June 12, 1991Date of Patent: July 20, 1993Assignee: Hitachi, Ltd.Inventors: Hironobu Matsui, Mikio Ichihashi, Sumio Hosaka, Yoshinori Nakayama, Satoshi Haraichi, Fumikazu Itoh, Akira Shimase, Yoshimasa Kondo, Shigeyuki Hosoki, Masakazu Ichikawa, Yukio Honda, Tsuyoshi Hasegawa, Shiji Okazaki, Shunji Maeda, Hitoshi Kubota
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Patent number: 5187371Abstract: A charged particle beam apparatus includes at least a charged particle source and an objective lens for converging onto a sample a charged particle beam emitted by the charged particle source. The objective lens is an electrostatic objective lens constituted by a first and a second electrode positioned opposite to each other and having openings through which the charged particle beam passes. The first electrode and the second electrode are located close to the charged particle source and to the sample, respectively. The first electrode is supplied with a positive potential as opposed to the second electrode when the charged particle beam is a negatively charged particle beam. Conversely, the first electrode is supplied with a negative potential as opposed to the second electrode when the charged particle beam is a positively charged particle beam. The principal plane of the electrostatic objective lens is located on the side of the sample below the bottom plane of the second electrode.Type: GrantFiled: April 18, 1991Date of Patent: February 16, 1993Assignee: Hitachi, Ltd.Inventors: Hironobu Matsui, Mikio Ichihashi