Patents by Inventor Hironobu Tamura
Hironobu Tamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11704789Abstract: A defect inspection device includes an ultrasonic probe, an image acquirer, a calculator, and a corrector. The ultrasonic probe acquires an ultrasonic image of an inspection object or a simulated inspection object. The image acquirer acquires an infrared image including a first region of the simulated inspection object or a second region of the inspection object. The calculator calculates a first correction value for correcting a coordinate deviation of the first region in the ultrasonic image and the infrared image with respect to a designed coordinate of the first region, or calculate a second correction value for correcting a coordinate deviation of the second region in the infrared image with respect to a designed coordinate of the second region. The corrector performs coordinate correction with the calculated first or second correction value for the ultrasonic image of the inspection object.Type: GrantFiled: June 17, 2021Date of Patent: July 18, 2023Assignee: Kioxia CorporationInventor: Hironobu Tamura
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Patent number: 11282723Abstract: According to one embodiment, a liquid delivery member is provided which is to be arranged at a predetermined distance from a processing object, and which is configured to deliver a liquid from a slit while the liquid delivery member and the processing object are caused to make relative displacement therebetween in a first direction. The liquid delivery member includes a delivery amount adjustment part provided on a face that forms the slit, extending in a second direction orthogonal to the first direction, and configured to adjust a delivery amount of the liquid.Type: GrantFiled: September 4, 2019Date of Patent: March 22, 2022Assignee: KIOXIA CORPORATIONInventors: Hironobu Tamura, Ikuo Yoneda, Yoshiharu Ono
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Publication number: 20220084176Abstract: A defect inspection device includes an ultrasonic probe, an image acquirer, a calculator, and a corrector. The ultrasonic probe acquires an ultrasonic image of an inspection object or a simulated inspection object. The image acquirer acquires an infrared image including a first region of the simulated inspection object or a second region of the inspection object. The calculator calculates a first correction value for correcting a coordinate deviation of the first region in the ultrasonic image and the infrared image with respect to a designed coordinate of the first region, or calculate a second correction value for correcting a coordinate deviation of the second region in the infrared image with respect to a designed coordinate of the second region. The corrector performs coordinate correction with the calculated first or second correction value for the ultrasonic image of the inspection object.Type: ApplicationFiled: June 17, 2021Publication date: March 17, 2022Applicant: Kioxia CorporationInventor: Hironobu TAMURA
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Patent number: 11164843Abstract: According to one embodiment, in a substrate bonding apparatus a first chucking stage includes a first stage base, a plurality of first cylindrical members, and a plurality of first drive mechanisms. The first stage base includes a first main face facing a second chucking stage. The plurality of first cylindrical members are disposed on the first main face. The plurality of first cylindrical members are arrayed in planar directions. The plurality of first cylindrical members protrudes from the first main face in a direction toward the second chucking stage to chuck the first substrate. The plurality of first drive mechanisms are configured to drive the plurality of first cylindrical members independently of each other. The substrate bonding apparatus further comprises a first pressure control mechanism configured to control pressure states of spaces in the plurality of first cylindrical members independently of each other.Type: GrantFiled: March 12, 2020Date of Patent: November 2, 2021Assignee: Kioxia CorporationInventors: Hironobu Tamura, Yoshiharu Ono
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Publication number: 20210082863Abstract: According to one embodiment, in a substrate bonding apparatus a first chucking stage includes a first stage base, a plurality of first cylindrical members, and a plurality of first drive mechanisms. The first stage base includes a first main face facing a second chucking stage. The plurality of first cylindrical members are disposed on the first main face. The plurality of first cylindrical members are arrayed in planar directions. The plurality of first cylindrical members protrudes from the first main face in a direction toward the second chucking stage to chuck the first substrate. The plurality of first drive mechanisms are configured to drive the plurality of first cylindrical members independently of each other. The substrate bonding apparatus further comprises a first pressure control mechanism configured to control pressure states of spaces in the plurality of first cylindrical members independently of each other.Type: ApplicationFiled: March 12, 2020Publication date: March 18, 2021Applicant: Kioxia CorporationInventors: Hironobu TAMURA, Yoshiharu ONO
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Patent number: 10915018Abstract: An imprinting system according to an embodiment includes a first measuring device measuring an intensity of light reflected from an end of a shot area of a monitor substrate being an area on which imprinting has been performed, a dripping condition generating device generating a dripping condition of a resin-based mask material on the basis of the measured intensity of light, and an imprinting apparatus performing imprinting using the dripping condition. The imprinting apparatus includes a second measuring device measuring an intensity of light reflected from an end of a first shot area of a production substrate being an area on which imprinting has been performed, and a control unit adjusting arrangement of droplets of a resin-based mask material ejected on a second shot area of the production substrate being an area on which imprinting is to be performed on the basis of an intensity of light reflected from an end of the first shot area.Type: GrantFiled: August 22, 2018Date of Patent: February 9, 2021Assignee: Toshiba Memory CorporationInventors: Takahito Nishimura, Yoshihisa Kawamura, Hironobu Tamura, Kiminori Yoshino, Suigen Kanda
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Publication number: 20200258793Abstract: According to one embodiment, a liquid delivery member is provided which is to be arranged at a predetermined distance from a processing object, and which is configured to deliver a liquid from a slit while the liquid delivery member and the processing object are caused to make relative displacement therebetween in a first direction. The liquid delivery member includes a delivery amount adjustment part provided on a face that forms the slit, extending in a second direction orthogonal to the first direction, and configured to adjust a delivery amount of the liquid.Type: ApplicationFiled: September 4, 2019Publication date: August 13, 2020Applicant: Toshiba Memory CorporationInventors: Hironobu TAMURA, lkuo YONEDA, Yoshiharu ONO
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Publication number: 20190243236Abstract: An imprinting system according to an embodiment includes a first measuring device measuring an intensity of light reflected from an end of a shot area of a monitor substrate being an area on which imprinting has been performed, a dripping condition generating device generating a dripping condition of a resin-based mask material on the basis of the measured intensity of light, and an imprinting apparatus performing imprinting using the dripping condition. The imprinting apparatus includes a second measuring device measuring an intensity of light reflected from an end of a first shot area of a production substrate being an area on which imprinting has been performed, and a control unit adjusting arrangement of droplets of a resin-based mask material ejected on a second shot area of the production substrate being an area on which imprinting is to be performed on the basis of an intensity of light reflected from an end of the first shot area.Type: ApplicationFiled: August 22, 2018Publication date: August 8, 2019Applicant: Toshiba Memory CorporationInventors: Takahito NISHIMURA, Yoshihisa KAWAMURA, Hironobu TAMURA, Kiminori YOSHINO, Suigen KANDA
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Publication number: 20140147543Abstract: An imprinting device is provided which is capable of using small an opening/closing device even when a transfer area increases. The imprinting device that transfers a molding pattern of a die to a molding target includes a pressurization unit that includes a pressurization chamber to pressurize the die and the molding target by a fluid, a stage that supports the die and the molding target pressurized by the pressurization unit, a pressurization device for adjusting the pressure of the fluid inside the pressurization chamber, an opening/closing device for relatively moving the pressurization unit and the stage, and a securing tool that secures the pressurization unit and the stage so as to prevent or suppress an application of force generated by the pressurization unit to the opening/closing device.Type: ApplicationFiled: July 6, 2012Publication date: May 29, 2014Applicant: SCIVAX CORPORATIONInventors: Hirosuke Kawaguchi, Hironobu Tamura, Satoru Tanaka
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Patent number: 5958610Abstract: An EL element having a color filter formed on an upper electrode thereof enables a decrease in the pixel loss or line defects. In the EL element, a lower transparent electrode, first insulating layer, luminescent layer and upper transparent electrode are laminated on a glass substrate. Further, a color filter is formed on the upper transparent electrode. As the color filter there is used a posi-resist having an average molecular weight in a range of from 100 to 50000 or a nega-resist having a polymerization reaction percentage in a range of from 5% to 70%.Type: GrantFiled: February 20, 1997Date of Patent: September 28, 1999Assignee: Denso CorporationInventors: Tomohiro Yonekawa, Hironobu Tamura, Yutaka Hattori, Nobuei Ito, Tadashi Hattori