Patents by Inventor Hironobu Toribuchi

Hironobu Toribuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5952429
    Abstract: A carbon black graft polymer which excels in stability of dispersion in various media, coloring property, and imperviousness to light is obtained by mixing under heating a block- or graft-copolymer having a segment (A) containing a reactive group capable of reacting with a functional group on the surface of carbon black and a segment (B) different in skeletal structure from the segment (A) with carbon black. The carbon black graft polymer, by causing the graft chain thereof to incorporate therein an ethylenically unsaturated double bond and/or a carboxyl group, is enabled to manifest photosensitivity, developability with an alkali, and insulating property and acquire usefulness for a black photocurable resin composition such as, for example, the material for the formation of a black matrix particularly in a color filter.
    Type: Grant
    Filed: June 3, 1997
    Date of Patent: September 14, 1999
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Hayato Ikeda, Nobuyuki Ando, Yoshinobu Asako, Kazuhiro Anan, Tatsuhito Matsuda, Hironobu Toribuchi, Mitsuo Kushino, Keiichi Uehara, Yoshikuni Mori
  • Patent number: 5900309
    Abstract: Transparent or semitransparent fine resin particles used for a light diffusing sheet contains smectites.
    Type: Grant
    Filed: December 19, 1996
    Date of Patent: May 4, 1999
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Manabu Kitamura, Hironobu Toribuchi
  • Patent number: 5789506
    Abstract: A polymeric monomer (A) having as a main component thereof a (meth)acryl type monomer which is subjected to aqueous suspension polymerization in the presence of a compound (B) which is substantially insoluble in water and sparingly soluble in the polymeric monomer (A). The compound (B) has at least one, preferably two or more, structural units, selected from the group consisting of --SH, --S--S--, --COOH, --NO.sub.2, and --OH. The use of compound (B), in the suspension polymerization of the (meth)acryl type monomer, represses of the production of by-produced minute particles due to sympathetic emulsion polymerization. The suspension polymerization permits production of (meth)acryl type polymer particles having high heat stability and a small range of particle diameters.
    Type: Grant
    Filed: October 28, 1996
    Date of Patent: August 4, 1998
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Hironobu Toribuchi, Nobuaki Urashima, Yoshikuni Mori
  • Patent number: 5420218
    Abstract: A polymeric monomer (A) having as a main component thereof a (meth)acryl type monomer which is subjected to aqueous suspension polymerization in the presence of a compound (B) which is substantially insoluble in water and sparingly soluble in the polymeric monomer (A). The compound (B) has at least one, preferably two or more, structural units, selected from the group consisting of --SH, --S--S--, --COOH, --NO.sub.2, and --OH. The use of compound (B), in the suspension polymerization of the (meth)acryl type monomer, represses of the production of by-produced minute particles due to sympathetic emulsion polymerization. The suspension polymerization permits production of meth)acryl type polymer particles having high heat stability and a small range of particle diameters.
    Type: Grant
    Filed: June 15, 1993
    Date of Patent: May 30, 1995
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Hironobu Toribuchi, Nobuaki Urashima, Yoshikuni Mori