Patents by Inventor Hironobu Umemoto

Hironobu Umemoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7815813
    Abstract: An end point detection method in the case where a catalyst arranged in a treatment chamber of a gas phase reaction processing apparatus is heated at high temperature by supplying electric power thereto and the treatment is carried out by cracking a reaction gas by the catalyst heated at high temperature, comprises the steps of supplying the electric power to the catalyst from a constant current source, detecting electric potential difference between both ends of the catalyst, performing primary differentiation of the detected electric potential difference, and determining an end point of the treatment based on obtained primary differential value.
    Type: Grant
    Filed: August 22, 2006
    Date of Patent: October 19, 2010
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Japan Advanced Institute of Science and Technology
    Inventors: Kazuhisa Takao, Hiroshi Ikeda, Hideki Matsumura, Atsushi Masuda, Hironobu Umemoto
  • Patent number: 7771701
    Abstract: In a hydrogen atom generation source in a vacuum treatment apparatus which can effectively inhibit hydrogen atoms from being recombined due to contact with an internal wall surface of a treatment chamber of the vacuum treatment apparatus and an internal wall surface of a transport passage, and being returned into hydrogen molecules, at least a part of a surface facing a space with the hydrogen atom generation source formed therein of a member surrounding the hydrogen atom generation source is coated with SiO2. In a hydrogen atom transportation method for transporting hydrogen atoms generated by the hydrogen atom generation source in the vacuum treatment apparatus to a desired place, the hydrogen atoms are transported via a transport passage whose internal wall surface is coated with SiO2.
    Type: Grant
    Filed: July 15, 2005
    Date of Patent: August 10, 2010
    Assignee: Canon Anelva Corporation
    Inventors: Hironobu Umemoto, Atsushi Masuda, Koji Yoneyama, Keiji Ishibashi, Manabu Ikemoto
  • Publication number: 20090263911
    Abstract: The object of the present invention is to provide an end point detection method in a gas phase reaction processing apparatus. An end point detection method in the case where a catalyst 9 arranged in a treatment chamber is heated at high temperature by supplying electric power thereto and the treatment is carried out by cracking a reaction gas by the catalyst 9 heated at high temperature, comprises the steps of supplying the electric power to the catalyst 9 from a constant current source 10, detecting electric potential difference between both ends of the catalyst 9, performing primary differentiation of the detected electric potential difference, and determining an end point of the treatment based on obtained primary differential value.
    Type: Application
    Filed: August 22, 2006
    Publication date: October 22, 2009
    Applicants: Tokyo Ohka Kogyo Co., Ltd, Japan Advanced Institute Of Science And Technology
    Inventors: Kazuhisa Takao, Hiroshi Ikeda, Hideki Matsumura, Atsushi Masuda, Hironobu Umemoto
  • Publication number: 20090004100
    Abstract: In a hydrogen atom generation source in a vacuum treatment apparatus which can effectively inhibit hydrogen atoms from being recombined due to contact with an internal wall surface of a treatment chamber of the vacuum treatment apparatus and an internal wall surface of a transport passage, and being returned into hydrogen molecules, at least a part of a surface facing a space with the hydrogen atom generation means formed therein of a member surrounding the hydrogen atom generation means is coated with SiO2. In a hydrogen atom transportation method for transporting hydrogen atoms generated by the hydrogen atom generation means in the vacuum treatment apparatus to a desired place, the hydrogen atoms are transported via a transport passage whose internal wall surface is coated with SiO2.
    Type: Application
    Filed: July 15, 2005
    Publication date: January 1, 2009
    Applicant: Canon Anelva Corporation
    Inventors: Hironobu Umemoto, Atsushi Masuda, Koji Yoneyama, Keiji Ishibashi, Manabu Ikemoto
  • Publication number: 20070048200
    Abstract: A gas phase reaction processing device 25 comprising a processing chamber 14 into which reactive gas is introduced, substrate material 3 to be processed which is disposed within the processing chamber 14, a catalytic body 9 for decomposing the reactive gas introduced into the processing chamber 14, an electric power unit 10 for supplying power to the catalytic body 9, and an electrode structure 15 containing the catalytic body 9, the gas phase reaction processing device being characterized in that the electrode structure 15 is provided with a plurality of catalytic bodies 9 which are arranged substantially parallel with one another, a first group of terminals 7 and a second group of terminals 8 which are disposed opposite to sandwich this catalytic body 9 therebetween, wherein the first group of terminals 7 supports one end of the catalytic body 9 and the second group of terminals 8 supports the other end of the catalytic body 9 respectively, and a terminal block 6 adapted to support and electrically insulate
    Type: Application
    Filed: August 29, 2006
    Publication date: March 1, 2007
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kazuhisa Takao, Hiroshi Ikeda, Hideki Matsumura, Atsushi Masuda, Hironobu Umemoto