Patents by Inventor Hironori Ibusuki

Hironori Ibusuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure pattern or mask and inspection method and manufacture method for the same
    Patent number: 7407730
    Abstract: An exposure pattern or mask inspection and manufacture method and an exposure pattern or mask are provided which can perform comparison inspection of the exposure pattern or mask with ease and at a high precision. A mask pattern portion for exposing a predetermined pattern by an exposure beam is inspected by disposing a plurality of dummy inspection patterns having the same pattern as at least a part of the mask pattern portion, inside and/or outside an area of the mask pattern portion and comparing at least the portion of the mask pattern portion with the dummy inspection pattern portion or portions.
    Type: Grant
    Filed: January 12, 2007
    Date of Patent: August 5, 2008
    Assignee: Sony Corporation
    Inventor: Hironori Ibusuki
  • Exposure pattern or mask and inspection method and manufacture method for the same
    Patent number: 7261984
    Abstract: An exposure pattern or mask inspection and manufacturing method and an exposure pattern or mask are provided which can perform comparison inspection of the exposure pattern or mask with ease and at a high precision. A mask pattern portion for exposing a predetermined pattern by an exposure beam is inspected by disposing a plurality of dummy inspection patterns having the same pattern as at least a part of the mask pattern portion inside and/or outside an area of the mask pattern portion and comparing at least the portion of the mask pattern portion with the dummy inspection pattern portion or portions.
    Type: Grant
    Filed: February 19, 2004
    Date of Patent: August 28, 2007
    Assignee: Sony Corporation
    Inventor: Hironori Ibusuki
  • Exposure pattern or mask and inspection method and manufacture method for the same
    Publication number: 20070117029
    Abstract: An exposure pattern or mask inspection and manufacture method and an exposure pattern or mask are provided which can perform comparison inspection of the exposure pattern or mask with ease and at a high precision. A mask pattern portion for exposing a predetermined pattern by an exposure beam is inspected by disposing a plurality of dummy inspection patterns having the same pattern as at least a part of the mask pattern portion, inside and/or outside an area of the mask pattern portion and comparing at least the portion of the mask pattern portion with the dummy inspection pattern portion or portions.
    Type: Application
    Filed: January 12, 2007
    Publication date: May 24, 2007
    Applicant: Sony Corporation
    Inventor: Hironori Ibusuki
  • Exposure pattern or mask and inspection method and manufacture method for the same
    Publication number: 20040209171
    Abstract: An exposure pattern or mask inspection and manufacture method and an exposure pattern or mask are provided which can perform comparison inspection of the exposure pattern or mask with ease and at a high precision. A mask pattern portion for exposing a predetermined pattern by an exposure beam is inspected by disposing a plurality of dummy inspection patterns having the same pattern as at least a part of the mask pattern portion, inside and/or outside an area of the mask pattern portion and comparing at least the portion of the mask pattern portion with the dummy inspection pattern portion or portions.
    Type: Application
    Filed: February 19, 2004
    Publication date: October 21, 2004
    Inventor: Hironori Ibusuki