Abstract: A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, ? is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25<D/Ym×tan ?<1.7 is satisfied.

Abstract: A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, ? is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25<D/Ym×tan ?<1.7 is satisfied.

Abstract: A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, ? is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25<D/Ym×tan ?<1.7 is satisfied.

Abstract: An immersion optical system includes a plurality of lenses disposed along a light beam path of the immersion optical system. The plurality of lenses include a liquid immerged lens which is contactable with a liquid layer. An optically conjugate point of an object surface is formed in the light beam path of the immersion optical system. The object surface is contactable with a liquid.

Abstract: An imaging optical system is a system of a liquid immersion type permitting a plane-parallel plate in liquid to be replaced with another, without substantial degradation of imaging performance, while ensuring sufficiently high laser resistance of a boundary lens. The imaging optical system is provided with a first optically transparent member located nearest to a second plane, and a second optically transparent member located adjacent to the first optically transparent member. An optical path between the first optically transparent member and the second plane is fillable with a first liquid and an optical path between the first optically transparent member and the second optically transparent member is fillable with a second liquid. The imaging optical system satisfies the condition of 1<D1/(M1+M2)<20, where D1 is a center thickness of the first optically transparent member, M1 a center thickness of a layer of the first liquid, and M2 a center thickness of a layer of the second liquid.

Abstract: An optical system for ultraviolet light includes a plurality of optical elements made of a material transparent to ultraviolet light. At least two of the optical elements are utilized for forming at least one liquid lens group that has a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light.

Abstract: A projection lens of a microlithographic projection exposure apparatus includes a final lens element and a terminating element having no overall refractive power that is positioned between, but spaced apart from, the final lens element and an image plane of the projection lens. The image plane is adjustably positioned such that a position of the image plane with respect to the final lens element is adjustable.

Abstract: A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate using a projection system and has a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid. An element of the projection system through which the pattern is projected has, on a surface configured to be in contact with the liquid, a protective coating which is SiO2.

Abstract: A liquid immersion optical system includes a first optically transparent member and a second optically transparent member, arranged in an optical path between the first optically transparent member and an object. A first space between the first optically transparent member and the second optically transparent member is fillable with a first liquid. A second space between the second optically transparent member and the object is fillable with a second liquid. The second optically transparent member is detachably arranged in the optical path between the first optically transparent member and the object.

Abstract: In a liquid immersion type projection optical system for forming an image of a first plane on a second plane, an optical path between the optical system and the second plane is filled with a liquid having the refractive index larger than 1.5, and the optical system has a boundary optical element whose surface on the first plane side is in contact with a gas and whose surface on the second plane side is in contact with the liquid. The optical system satisfies the condition of 3.2<Nb·Eb/|Rb|<4.0, where Rb is a radius of curvature of the surface on the first plane side of the boundary optical element, Eb an effective diameter of the surface on the first plane side of the boundary optical element, and Nb a refractive index for used light, of an optical material forming the boundary optical element.

Abstract: An immersion optical system includes a liquid immerged optical element having an optical surface which is contactable with a liquid, a convex surface, and an optical axis. A side surface of the liquid immerged optical element is inclined with respect to the optical axis.

Abstract: A projection optical system and exposure method for forming a reduced image of a first surface on a second surface, including forming a projection exposure of a reduced image of a pattern formed on a mask on a photosensitive substrate, the optical path between the projection optical system and the second surface being filled with a medium having a refractive index larger than 1.1 where a refractive index of an atmosphere in the optical path of the projection optical system is 1, and the magnification of the projection optical system being not more than ?. In variations, the projection optical system is substantially telecentric on both the first surface side and the second surface side; every optical member having a power in the projection optical system is a transmitting optical member; and a projection exposure in a one shot-area can include a plurality of partial exposures in partial exposure regions.

Abstract: An immersion optical system includes a liquid immerged optical element having an optical surface which is contactable with a liquid, a convex surface, and an optical axis. A side surface of the liquid immerged optical element is inclined with respect to the optical axis.

Abstract: Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path before light passes into the immersion liquid to impinge on the image plane.

Abstract: In a liquid immersion type projection optical system for forming an image of a first plane on a second plane, an optical path between the optical system and the second plane is filled with a liquid having the refractive index larger than 1.5, and the optical system has a boundary optical element whose surface on the first plane side is in contact with a gas and whose surface on the second plane side is in contact with the liquid. The optical system satisfies the condition of 3.2<Nb·Eb/|Rb|<4.0, where Rb is a radius of curvature of the surface on the first plane side of the boundary optical element, Eb an effective diameter of the surface on the first plane side of the boundary optical element, and Nb a refractive index for used light, of an optical material forming the boundary optical element.

Abstract: A liquid immersion optical system includes a first optically transparent member and a second optically transparent member, arranged in an optical path between the first optically transparent member and an object. A first space between the first optically transparent member and the second optically transparent member is fillable with a first liquid. A second space between the second optically transparent member and the object is fillable with a second liquid. The second optically transparent member is detachably arranged in the optical path between the first optically transparent member and the object.

Abstract: A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate using a projection system and has a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid. An element of the projection system through which the pattern is projected has, on a surface configured to be in contact with the liquid, a protective coating which is SiO2.

Abstract: A projection lens of a microlithographic projection exposure apparatus includes a final lens element and a terminating element having no overall refractive power that is positioned between, but spaced apart from, the final lens element and an image plane of the projection lens. The image plane is adjustably positioned such that a position of the image plane with respect to the final lens element is adjustable.

Abstract: An optical system for ultraviolet light includes a plurality of optical elements made of a material transparent to ultraviolet light. At least two of the optical elements are utilized for forming at least one liquid lens group that has a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light.

Abstract: An immersion optical system includes a plurality of lenses disposed along a light beam path of the immersion optical system. The plurality of lenses include a liquid immerged lens which is contactable with a liquid layer. An optically conjugate point of an object surface is formed in the light beam path of the immersion optical system. The object surface is contactable with a liquid.