Patents by Inventor Hironori ITABASHI

Hironori ITABASHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230260739
    Abstract: It is aimed to properly correct the various types of distortion without a reduction in observation throughput.
    Type: Application
    Filed: July 13, 2020
    Publication date: August 17, 2023
    Inventors: Keisuke TANUMA, Masato KAMIO, Hironori ITABASHI, Hiroki KANNAMI, Yusuke SEKI, Takumi UEZONO, Mitsuhiro NAKAMURA
  • Publication number: 20220415609
    Abstract: A scanning electron microscope includes a management computer that generates an irradiation control command of an electron beam, a control block that generates a control signal on the basis of the irradiation control command, and a beam irradiation control device that controls an irradiation direction of the electron beam on the basis of the control signal.
    Type: Application
    Filed: November 21, 2019
    Publication date: December 29, 2022
    Inventors: Takumi UEZONO, Tadanobu TOBA, Hironori ITABASHI, Masato KAMIO
  • Patent number: 11424099
    Abstract: In order to control a charge amount on a sample surface to a desired value before calculating a frame integration image, the invention provides a charged particle beam device including: a charged particle beam source configured to irradiate a sample with a charged particle beam; a deflector configured to scan an observation region of the sample with the charged particle beam; a detector configured to detect a charged particle emitted from the sample due to scanning with the charged particle beam; an image generation unit configured to generate a frame image of the observation region based on an observation signal output from the detector; and a scanning suspension time setting unit configured to set a scanning suspension time, which is a time during which scanning of the observation region with the charged particle beam is suspended after a frame image is generated, in which the image generation unit calculates a frame integration image by integrating frame images generated with the scanning suspension time i
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: August 23, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Hiroki Kannami, Hironori Itabashi, Ichiro Fujimura
  • Publication number: 20210175047
    Abstract: In order to control a charge amount on a sample surface to a desired value before calculating a frame integration image, the invention provides a charged particle beam device including: a charged particle beam source configured to irradiate a sample with a charged particle beam; a deflector configured to scan an observation region of the sample with the charged particle beam; a detector configured to detect a charged particle emitted from the sample due to scanning with the charged particle beam; an image generation unit configured to generate a frame image of the observation region based on an observation signal output from the detector; and a scanning suspension time setting unit configured to set a scanning suspension time, which is a time during which scanning of the observation region with the charged particle beam is suspended after a frame image is generated, in which the image generation unit calculates a frame integration image by integrating frame images generated with the scanning suspension time i
    Type: Application
    Filed: December 21, 2017
    Publication date: June 10, 2021
    Inventors: Hiroki KANNAMI, Hironori ITABASHI, Ichiro FUJIMURA
  • Patent number: 10971347
    Abstract: In order to provide a charged particle beam apparatus capable of stably detecting secondary particles and electromagnetic waves even for a non-conductive sample under high vacuum environment and enabling excellent observation and analysis, the charged particle beam apparatus includes a charged particle gun (12), scanning deflectors (17 and 18) configured to scan a charged particle beam (20) emitted from the charged particle gun (12) onto a sample (21), detectors (40 and 41) configured to detect a scanning control voltage input from an outside into the scanning deflectors, an arithmetic unit (42) configured to calculate, based on the detected scanning control voltage, irradiation pixel coordinates for the charged particle beam; and an irradiation controller (45) configured to control irradiation of the sample with the charged particle beam according to the irradiation pixel coordinates.
    Type: Grant
    Filed: June 23, 2016
    Date of Patent: April 6, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Mitsuhiro Nakamura, Hironori Itabashi, Hirofumi Satou, Tsutomu Saito, Masahiro Sasajima, Natsuki Tsuno, Yohei Nakamura
  • Publication number: 20210020422
    Abstract: In order to provide a charged particle beam apparatus capable of stably detecting secondary particles and electromagnetic waves even for a non-conductive sample under high vacuum environment and enabling excellent observation and analysis, the charged particle beam apparatus includes a charged particle gun (12), scanning deflectors (17 and 18) configured to scan a charged particle beam (20) emitted from the charged particle gun (12) onto a sample (21), detectors (40 and 41) configured to detect a scanning control voltage input from an outside into the scanning deflectors, an arithmetic unit (42) configured to calculate, based on the detected scanning control voltage, irradiation pixel coordinates for the charged particle beam; and an irradiation controller (45) configured to control irradiation of the sample with the charged particle beam according to the irradiation pixel coordinates.
    Type: Application
    Filed: June 23, 2016
    Publication date: January 21, 2021
    Inventors: Mitsuhiro NAKAMURA, Hironori ITABASHI, Hirofumi SATOU, Tsutomu SAITO, Masahiro SASAJIMA, Natsuki TSUNO, Yohei NAKAMURA