Patents by Inventor Hironori OKA

Hironori OKA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220082938
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including one or more specific compounds selected from the group consisting of a compound represented by General Formula (1), a compound represented by General Formula (2), and a compound represented by General Formula (3), and an acid-decomposable resin.
    Type: Application
    Filed: November 28, 2021
    Publication date: March 17, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Aina USHIYAMA, Masafumi KOJIMA, Akiyoshi GOTO, Michihiro SHIRAKAWA, Keita KATO, Hironori OKA
  • Publication number: 20210011377
    Abstract: A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Requirements 1 to 3, Requirement 1: The A value determined by Formula (1) is 0.14 or more, A=([H]×0.04+[C]×1.0+[N]×2.1+[0]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[0]×16+[F]×19+[S]×32+[I]×127)??Formula (1): Requirement 2: The concentration of solid contents in the photosensitive composition for EUV light is 5.0% by mass or less, Requirement 3: The content of the photoacid generator is 5% to 50% by mass with respect to the total solid content in the photosensitive composition for EUV light.
    Type: Application
    Filed: September 29, 2020
    Publication date: January 14, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Michihiro SHIRAKAWA, Hajime FURUTANI, Hironori OKA
  • Publication number: 20200401045
    Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having an excellent pattern line width roughness (LWR). In addition, another object of the present invention is to provide: a resist film, a pattern forming method, and a method for manufacturing an electronic device, each of which uses the actinic ray-sensitive or radiation-sensitive resin composition.
    Type: Application
    Filed: August 25, 2020
    Publication date: December 24, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Daisuke ASAKAWA, Hironori OKA, Kyohei SAKITA, Michihiro SHIRAKAWA, Akiyoshi GOTO
  • Publication number: 20200050106
    Abstract: A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Conditions 1 and 2, Condition 1: The A value determined by Formula (1) is 0.14 or more, A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127)??Formula (1): Condition 2: The concentration of the solid content in the photosensitive composition for EUV light is 2.5% by mass or less.
    Type: Application
    Filed: October 17, 2019
    Publication date: February 13, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Michihiro SHIRAKAWA, Hajime FURUTANI, Mitsuhiro FUJITA, Tomotaka TSUCHIMURA, Takashi KAWASHIMA, Michihiro OGAWA, Akihiro KANEKO, Hironori OKA, Yasuharu SHIRAISHI