Patents by Inventor Hiroshi Adachi
Hiroshi Adachi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5470491Abstract: A thin-film magnetic head is provided which includes a substrate having formed thereon an upper and a lower thin-film magnetic core, a thin-film conductor coil, and a thin-film gap. An insulation layer is provided that electrically insulates the coil and the magnetic cores. The insulation layer is formed of an organic silicone resin with a ladder structure that is composed of silicon, oxygen and carbon.Type: GrantFiled: March 8, 1995Date of Patent: November 28, 1995Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Satoshi Kodama, Hiroshi Adachi
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Patent number: 5459275Abstract: An electrophotographic photoconductor comprises an electroconductive substrate and a photoconductive layer formed thereon comprising as an effective component at least one pyrenylamine derivative of formula (I): ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, W, j, k, l, m and n are specifically defined in the specification. Furthermore, a novel pyrenylamine derivative for use in the above electrophotographic photoconductor, an aldehyde compound, which is an intermediate for producing the pyrenylamine derivative, and methods of preparing the pyrenylamine derivative and the aldehyde compound are disclosed.Type: GrantFiled: June 15, 1994Date of Patent: October 17, 1995Assignee: Ricoh Company, Ltd.Inventors: Chiaki Tanaka, Masaomi Sasaki, Tamotsu Aruga, Tomoyuki Shimida, Hiroshi Adachi
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Patent number: 5457232Abstract: A pyrenylamine derivative having an unsaturated bond of formula (I), which can be employed as an organic photoconductive material for use in electrophotography: ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, W, l, m, n, j and k are specifically defined in the specification, an aldehyde compound of formula (II), which is an intermediate for preparing the pyrenylamine derivative: ##STR2## and methods of producing the pyrenylamine derivative and the aldehyde compound are disclosed.Type: GrantFiled: September 9, 1994Date of Patent: October 10, 1995Assignee: Ricoh Company, Ltd.Inventors: Chiaki Tanaka, Masaomi Sasaki, Tamotsu Aruga, Tomoyuki Shimada, Hiroshi Adachi
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Patent number: 5442621Abstract: An ISDN switching system having facilities for testing an ISDN signal composed of B-channels and D-channels at least. The testing facilities can achieve a B-channel test and D-channel test selectively with simple construction by employing a converting unit in the system. The converting unit enables creation of a connection path between a test equipment and an object to be tested through an ISDN exchange and thus the ISDN signals for the test can be treated as usual ISDN signals. Thereby, the test equipment and the object can freely be connected to each other.Type: GrantFiled: November 25, 1992Date of Patent: August 15, 1995Assignee: Fujitsu LimitedInventors: Noboru Ise, Kenji Tsutsumi, Ryoji Shimozono, Aya Takagi, Hiroyuki Kudoh, Hiroshi Adachi, Yoshihiro Shimizu, Kunio Yamamoto
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Patent number: 5436100Abstract: An electrophotographic photoconductor is composed of an electroconductive substrate and a photoconductive layer formed thereon including a m-phenylenediamine derivative of formula (I): ##STR1## wherein Ar represents a non-condensed polycyclic hydrocarbon group other than a phenyl group, or a condensed polycyclic hydrocarbon group having not more than 18 carbon atoms; and R.sup.1, R.sup.2, R.sup.3 and R.sup.4 each represent hydrogen a halogen atom a cyano group, a nitro group, an alkyl group, an alkoxyl group, an aryl group, an aryloxy group, an alkylmercapto group, a group represented by ##STR2## in which R.sup.6 and R.sup.7 each represent hydrogen, an alkyl group, or an aryl group, an alkylenedioxy group or an alkylenedithio group. Novel m-phenylenediamine derivatives for use in the electrophotoconductor and intermediates for producing the m-phenylenediamine derivatives, and methods of those derivatives are disclosed.Type: GrantFiled: April 7, 1994Date of Patent: July 25, 1995Assignee: Ricoh Company, Ltd.Inventors: Tomoyuki Shimada, Masaomi Sasaki, Tamotsu Aruga, Hiroshi Adachi
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Patent number: 5415968Abstract: A solution containing a low-temperature curing type organosilicon ladder resin composition comprising: (A) a polylphenysylsesquioxane which has a hydroxyl group at the end, in which 3% of the side chain consists of vinyl groups, and which has a weight-average molecular weight of 150,000; (B) 1.8 wt % of 3,3'-diazidophenylsulfone based on the polylphenysylsesquioxane (A); and (C) methoxybenzene which is added to the polylphenysylsesquioxane (A) so that the polylphenysylsesquioxane content is about 15 wt % is used as the material for a surface protective film of a color filter for a light-receiving element or a display element.Type: GrantFiled: November 19, 1991Date of Patent: May 16, 1995Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Hiroshi Adachi, Yamamoto Shigeyuki
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Patent number: 5403950Abstract: An electrophotographic photoconductor is composed of an electroconductive substrate and a photoconductive layer formed thereon, the photoconductive layer includes a dipyrenylamine derivative of formula (I): ##STR1## wherein R represents an alkyl group with 1 to 12 carbon atoms, which may have a substituent, or an aryl group which may have a substituent. Novel dipyrenylamine derivatives of formula (I), in which R is -ph-(R.sup.4)n, wherein, ph is a phenyl group, R.sup.4 is hydrogen, an unsubstituted or substituted alkyl group having 1 to 12 carbon atoms, an unsubstituted or substituted alkoxyl group having 1 to 12 carbon atoms, n is an integer of 1 to 5, and when n is 2 to 5, R.sup.4 may be the same or different, which are for use in the photoconductive layer of the electrophotographic photoconductor, are synthesized.Type: GrantFiled: May 13, 1994Date of Patent: April 4, 1995Assignee: Ricoh Company, Ltd.Inventors: Tomoyuki Shimada, Masaomi Sasaki, Tamotsu Aruga, Hiroshi Adachi
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Patent number: 5399648Abstract: High-purity silicone ladder polymer a weight average molecular weight of 600-1,000,000 and a molecular weight distribution of no more than 10 and it contains no more than 1 ppm each of sodium, potassium, iron, copper, lead and chlorine and no more than 1 ppb each of uranium and thorium. This silicone ladder polymer is very pure, has high molecular weight and yet can be produced easily. Hence, it can advantageously be used as a material for making surface protective or inter-level insulation films in semiconductor devices.Type: GrantFiled: August 23, 1993Date of Patent: March 21, 1995Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Shigeyuki Yamamoto, Hiroshi Adachi
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Patent number: 5356742Abstract: An electrophotographic photoconductor is composed of an electroconductive substrate and a photoconductive layer formed thereon, the photoconductive layer includes a dipyrenylamine derivative of formula (I): ##STR1## wherein R represents an alkyl group with 1 to 12 carbon atoms, which may have a substituent, or an aryl group which may have a substituent. Novel dipyrenylamine derivatives of formula (I), in which R is --ph--(R.sup.4)n, wherein, ph is a phenyl group, R.sup.4 is hydrogen, an unsubstituted or substituted alkyl group having 1 to 12 carbon atoms, an unsubstituted or substituted alkoxyl group having 1 to 12 carbon atoms, n is an integer of 1 to 5, and when n is 2 to 5, R.sup.4 may be the same or different, which are for use in the photoconductive layer of the electrophotographic photoconductor, are synthesized.Type: GrantFiled: February 28, 1992Date of Patent: October 18, 1994Assignee: Ricoh Company, Ltd.Inventors: Tomoyuki Shimada, Masaomi Sasaki, Tamotsu Aruga, Hiroshi Adachi
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Patent number: 5356954Abstract: The electrical conductivity of room temperature curable compositions containing at one polyorganosiloxane, a curing agent and certain light colored electrically conductive fillers is increased while maintaining the viscosity at desirably low levels and not adversely affecting the physical properties of the cured composition when the curable polyorganosiloxane is blended with the curing agent prior to addition of the filler.Type: GrantFiled: February 25, 1993Date of Patent: October 18, 1994Assignee: Dow Corning Toray Silicone Co., Ltd.Inventors: Hiroshi Adachi, Noriyuki Suganuma
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Patent number: 5344985Abstract: A pyrenylamine derivative having an unsaturated bond of formula (I), which can be employed as an organic photoconductive material for use in electrophotography: ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, W, l, m, n j and k are specifically defined the specification, an aldehyde compound of formula (II), which is an intermediate for preparing the pyrenylamine derivative: ##STR2## and methods of producing the pyrenylamine derivative and the aldehyde compound are disclosed.Type: GrantFiled: December 23, 1992Date of Patent: September 6, 1994Assignee: Ricoh Company, Ltd.Inventors: Chiaki Tanaka, Masaomi Sasaki, Tamotsu Aruga, Tomoyuki Shimada, Hiroshi Adachi
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Patent number: 5334470Abstract: An electrophotographic photoconductor is composed of an electroconductive substrate and a photoconductive layer formed thereon including a m-phenylenediamine derivative of formula (I): ##STR1## wherein Ar represents a non-condensed polycyclic hydrocarbon group other than a phenyl group, or a condensed polycyclic hydrocarbon group having not more than 18 carbon atoms; and R.sup.1, R.sup.2, R.sup.3 and R.sup.4 each represent hydrogen a halogen atom a cyano group, a nitro group, an alkyl group, an alkoxyl group, an aryl group, an aryloxy group, an alkylmercapto group, a group represented by ##STR2## in which R.sup.6 and R.sup.7 each represent hydrogen, an alkyl group, or an aryl group, an alkylenedioxy group or an alkylenedithio group. Novel m-phenylenediamine derivatives for use in the electrophotoconductor and intermediates for producing the m-phenylenediamine derivatives, and methods of those derivatives are disclosed.Type: GrantFiled: September 2, 1992Date of Patent: August 2, 1994Assignee: Ricoh Company, Ltd.Inventors: Tomoyuki Shimada, Masaomi Sasaki, Tamotsu Aruga, Hiroshi Adachi
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Patent number: 5306947Abstract: The present invention is mainly characterized by providing an even surface of an interlayer insulating film for insulating and isolating an upper interconnection and a lower interconnection from each other. A lower interconnection layer is provided on a semiconductor substrate, having a pattern of stepped portions. A silicon type insulating film is provided on the semiconductor substrate so as to cover the lower interconnection layer. A silicon ladder resin film is filled in recessed portions of the surface of the silicon type insulating film for making even the surface of the silicon type insulating film. An upper interconnection layer electrically connected to the lower interconnection layer through a via hole is provided on the silicon type insulating film. The silicon ladder resin film has the structural formula: ##STR1## where R.sub.1 is at least one of a phenyl group and a lower alkyl group, R.sub.2 is at least one of a hydrogen atom and a lower alkyl group, and n is an integer of 20 to 1000.Type: GrantFiled: January 13, 1993Date of Patent: April 26, 1994Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Hiroshi Adachi, Hirozoh Kanegae, Hiroshi Mochizuki, Masanori Obata, Takemi Endoh, Kimio Hagi, Shigeru Harada, Kazuhito Matsukawa, Akira Ohhisa, Etsushi Adachi
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Patent number: 5278451Abstract: A semiconductor device sealed with mold resin is disclosed. The device includes a semiconductor substrate having a main surface and an element formed on the main surface of the semiconductor substrate. A stress buffering film for protecting at least the element from stress of the mold resin is provided on the semiconductor substrate so as to cover at least the element. The entire semiconductor device is covered and sealed with mold resin. The stress buffering film is formed of organo-silicone ladder polymer having a hydroxyl group at its end. In the semiconductor device, water does not get into an interface of the stress buffering film and the underlying substrate, resulting in an enhancement of the moisture resistance of the semiconductor device.Type: GrantFiled: September 30, 1991Date of Patent: January 11, 1994Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Etsushi Adachi, Hiroshi Adachi, Hiroshi Mochizuki
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Patent number: 5269844Abstract: A colored paste composed of a silicone ladder polymer, a solvent, and an organic pigment insoluble in said solvent, said silicone ladder polymer being a polymer having an average molecular weight of 1.0.times.10.sup.3 to 3.5.times.10.sup.5. The colored paste has good storage stability and readily forms a uniform film by spin coating.Type: GrantFiled: December 10, 1992Date of Patent: December 14, 1993Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Shigeyuki Yamamoto, Hiroshi Adachi
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Patent number: 5268246Abstract: An electrophotographic photoconductor is composed of an electroconductive support and a photoconductive layer formed thereon comprising a novel pyrene-ring-containing olefin compound having formula [I]: ##STR1## wherein R.sup.1 and R.sup.2 each represent hydrogen or an alkyl group which may have a substituent; Y is an aliphatic hydrocarbon group which may have a substituent, a cyclic hydrocarbon group which may have a substituent, or an aromatic group which may have a substituent; n is an integer of 0 or 1, and m is an integer of 1 to 3, provided that when n is 0, m is 1, R.sup.1 is hydrogen, and Y is an aromatic group with a substituent ##STR2## R.sup.5 and R.sup.3 each represent hydrogen, and Y and R.sup.1 may be bonded to form a ring, a method of synthesizing the pyrene-ring-containing olefin compound and an intermediate therefor are disclosed.Type: GrantFiled: April 9, 1991Date of Patent: December 7, 1993Assignee: Ricoh Company, Ltd.Inventors: Tamotsu Aruga, Masaomi Sasaki, Tomoyuki Shimada, Hiroshi Adachi
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Patent number: 5262246Abstract: A material for spacecrafts pertaining to this invention is made of a compound containing the group IV b elements, as a material of which proof for oxygen atom is absolutely necessary. The application of this material, in the form of a shield part (a resin layer) for covering at least a portion of material used in a structural part of the spacecraft enables a long use (from several months to several decades or more) in the oxygen atom environment in the space, which was impossible in the part.Type: GrantFiled: December 21, 1990Date of Patent: November 16, 1993Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Takao Nishikawa, Katsumi Sonoda, Yoshiko Aiba, Hiroshi Adachi
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Patent number: 5236984Abstract: Provided is a silicone resin composition, which is curable at a temperature of not more than 270.degree. C., consisting essentially of a silicone ladder polymer expressed in the following general formula (I): ##STR1## where R.sup.1 to R.sup.4 represent hydrogen atoms or lower alkyl groups respectively, R.sup.5 and R.sup.6 represent aryl groups, alkyl groups or alkenyl groups with alkenyl groups occupying at least 2% of 2n groups R.sup.5 and R.sup.6, and n represents an integer of 5 to 1600, an organic solvent, and/or 0.2 to 20.0 percent by weight of a catalyst with respect to the silicone ladder polymer. This composition is cured at a temperature of not more than 270.degree. C., to form a thin film having excellent solvent resistance and heat resistance.Type: GrantFiled: November 18, 1991Date of Patent: August 17, 1993Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Shigeyuki Yamamoto, Hiroshi Adachi, Hirofumi Fujioka, Hirozon Kanegae
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Patent number: 5183846Abstract: Disclosed herein is a silicone ladder polymer coating composition containing silicone ladder polymer which is expressed in the following general formula: ##STR1## where R.sub.1 represents the same or different types of phenyl groups or lower alkyl groups, R.sub.2 represents the same or different types of hydrogen atoms or lower alkyl groups, and n represents an integer of 20 to 1000, an aromatic organic solvent which is so added that solid matter occupies 5 to 30 percent by weight, and a silane coupling agent of 150 to 3000 p.p.m. with respect to the polymer.Type: GrantFiled: July 2, 1991Date of Patent: February 2, 1993Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Yoshiko Aiba, Hiroshi Adachi, Etsushi Adachi
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Patent number: 5180691Abstract: The disclosed is a method of manufacturing a semiconductor device sealed with molding resin. An aluminum interconnection including an aluminum electrode pad is formed on a semiconductor substrate having an element. A silicone ladder polymer expressed by the following general formula is formed on the semiconductor substrate to cover the element. The silicone ladder polymer film is selectively etched by an aromatic organic solvent to expose the surface of the aluminum electrode pad. The temperature of the silicone ladder polymer film is elevated at a temperature elevating rate of 20.degree. C./min or more, and then, the silicone ladder polymer film is cooled at a cooling rate of 20.degree. C./min or more to form a cured stress buffering protective film for buffering a stress applied to the element. ##STR1## (in the formula, n is an integer which makes the weight-average molecular weight be in the range of 100,000 to 200,000.Type: GrantFiled: January 30, 1992Date of Patent: January 19, 1993Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Etsushi Adachi, Hiroshi Adachi, Hiroshi Mochizuki, Hirozoh Kanegae