Patents by Inventor Hiroshi Arima

Hiroshi Arima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230256054
    Abstract: A method for suppression of progress of, suppression of recurrence of and/or treatment of cancer includes administering an Allergin-1 antagonist in a therapy of a cancer patient with insufficient therapeutic efficacy by a tumor immunotherapeutic agent, or a cancer therapy in combination with an anti-cancer drug.
    Type: Application
    Filed: March 14, 2023
    Publication date: August 17, 2023
    Applicant: ONO PHRMACEUTICAL CO., LTD.
    Inventors: Shiro SHIBAYAMA, Hiroshi ARIMA, Takuya SIMBO
  • Patent number: 11638744
    Abstract: A method for suppression of progress of, suppression of recurrence of and/or treatment of cancer, by administering an Allergin-1 antagonist in a therapy of a cancer patient with insufficient therapeutic efficacy by a tumor immunotherapeutic agent, or a cancer therapy in combination with an anti-cancer drug.
    Type: Grant
    Filed: September 2, 2016
    Date of Patent: May 2, 2023
    Assignee: ONO PHARMACEUTICAL CO., LTD.
    Inventors: Shiro Shibayama, Hiroshi Arima, Takuya Simbo
  • Patent number: 10870378
    Abstract: A finisher-connecting structure for connecting a front finisher, which is disposed on one part of a vehicle seat, and a side finisher, which is disposed on another part of a vehicle seat, comprising a connection protrusion provided to the front finisher, and a connection recess that is provided to the side finisher and that fits with the connection protrusion; wherein the connection protrusion and the connection recess extend in a direction that intersects a direction in which the front finisher and the side finisher are continuous; wherein the fitted-together connection protrusion and connection recess regulate the front-rear-direction positions of the front finisher and the side finisher. In this connecting structure, which connects a pair of finishers using a connection protrusion and a connection recess, an unnecessary gap, such as a V-shaped gap, is prevented from being formed in the connected portion of the finishers.
    Type: Grant
    Filed: January 10, 2018
    Date of Patent: December 22, 2020
    Assignee: TACHI-S CO., LTD.
    Inventors: Hiroshi Arima, Takayuki Yoshika, Masaru Kaneko, Nozomi Yokoyama
  • Publication number: 20200039404
    Abstract: A finisher-connecting structure for connecting a front finisher, which is disposed on one part of a vehicle seat, and a side finisher, which is disposed on another part of a vehicle seat, comprising a connection protrusion provided to the front finisher, and a connection recess that is provided to the side finisher and that fits with the connection protrusion; wherein the connection protrusion and the connection recess extend in a direction that intersects a direction in which the front finisher and the side finisher are continuous; wherein the fitted-together connection protrusion and connection recess regulate the front-rear-direction positions of the front finisher and the side finisher. In this connecting structure, which connects a pair of finishers using a connection protrusion and a connection recess, an unnecessary gap, such as a V-shaped gap, is prevented from being formed in the connected portion of the finishers.
    Type: Application
    Filed: January 10, 2018
    Publication date: February 6, 2020
    Inventors: Hiroshi ARIMA, Takayuki YOSHIKA, Masaru KANEKO, Nozomi YOKOYAMA
  • Publication number: 20190010452
    Abstract: There is provided a method for efficient differentiation induction from human pluripotent stem cells into hypothalamic neurons. Also, provided is a method for constructing, from human pluripotent stem cells, a cellular structure in which hypothalamic tissue and pituitary tissue are integrated. A cellular structure including hypothalamic tissue is obtained by a method including the steps of: culturing an aggregate of human pluripotent stem cells in suspension in a medium containing a low concentration of a bone morphogenetic protein signal transduction pathway activating substance and a low concentration of a substance acting on the Shh signaling pathway; and further culturing the cell aggregate obtained in the step in suspension in a medium containing a low concentration of a substance acting on the Shh signaling pathway.
    Type: Application
    Filed: January 18, 2017
    Publication date: January 10, 2019
    Inventors: Hidetaka Suga, Koichiro Ogawa, Takatoshi Kasai, Hiroshi Arima
  • Publication number: 20180244771
    Abstract: A method for suppression of progress of, suppression of recurrence of and/or treatment of cancer, by administering an Allergin-1 antagonist in a therapy of a cancer patient with insufficient therapeutic efficacy by a tumor immunotherapeutic agent, or a cancer therapy in combination with an anti-cancer drug.
    Type: Application
    Filed: September 2, 2016
    Publication date: August 30, 2018
    Applicant: ONO PHARMACEUTICAL CO., LTD.
    Inventors: Shiro SHIBAYAMA, Hiroshi ARIMA, Takuya SIMBO
  • Patent number: 8398319
    Abstract: A developing apparatus including a substrate holder that holds a substrate horizontally; means for atomizing a surface treatment liquid used to improve wettability of the substrate with a developer; a first spray nozzle that sprays the atomized surface treatment liquid onto the substrate; and a developer supply nozzle that supplies a developer onto the substrate to which the substrate treatment liquid has been sprayed. The surface tension of the atomized surface treatment liquid with respect to the substrate is lower than the surface tension of the surface treatment liquid with respect to the substrate. The atomization suppresses the fact that the surface treatment liquid gathers on a certain portion of the surface of the substrate. The surface treatment liquid can be easily supplied onto the entire surface of the substrate, and improve wettability of the substrate with the developer.
    Type: Grant
    Filed: March 5, 2010
    Date of Patent: March 19, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Hiroshi Arima, Yuichi Yoshida, Taro Yamamoto, Kousuke Yoshihara
  • Patent number: 8337104
    Abstract: There is provided a developing apparatus and a developing method capable of rapidly forming a liquid film of a developing solution on an entire surface of a substrate while reducing a usage amount of the developing solution. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; a temperature control plate that is provided within the processing vessel and mounts the substrate thereon; an atmosphere gas supply unit that supplies an atmosphere gas including mist and vapor of a developing solution onto a surface of the substrate within the processing vessel; and a first temperature control unit that controls the temperature control plate to a temperature allowing the atmosphere gas to be condensed on the substrate. Here, an inner wall of the processing vessel is maintained at a temperature at which the atmosphere gas is hardly condensed on the inner wall.
    Type: Grant
    Filed: February 10, 2011
    Date of Patent: December 25, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Yasushi Takiguchi, Taro Yamamoto, Hiroshi Arima, Kousuke Yoshihara, Yuichi Yoshida
  • Patent number: 8333522
    Abstract: There is provided a developing apparatus capable of achieving high throughput. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; an atmosphere gas supply unit that supplies an atmosphere gas containing mist of a developing solution into the processing vessel in order to form a liquid film of the developing solution on a surface of a substrate loaded into the processing vessel; and a drying unit that dries the substrate in order to stop a developing process by the liquid film. A reaction between a resist and the developing solution can be stopped. Therefore, a developing process can be performed in parallel with a cleaning process performed by a cleaning module and high throughput is achieved.
    Type: Grant
    Filed: February 11, 2011
    Date of Patent: December 18, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Hiroshi Arima, Kousuke Yoshihara, Yuichi Yoshida, Yasushi Takiguchi, Taro Yamamoto
  • Patent number: 8262300
    Abstract: A coating and developing apparatus develops a substrate of which surface is coated with resist and exposed to lights. The coating and developing apparatus includes a developing module; a cleaning module; and a transfer mechanism configured to transfer a substrate developed by the developing module to the cleaning module. The developing module includes an airtightly sealed processing vessel configured to form a processing atmosphere; a temperature control plate provided in the processing vessel and mounts thereon the substrate and cools the substrate; and an atmosphere gas supply unit configured to supply an atmosphere gas including mist of a developing solution to a surface of the substrate within the processing vessel. The cleaning module includes a mounting table configured to mount thereon the substrate; and a cleaning solution supply unit configured to supply a cleaning solution to the substrate mounted on the mounting table.
    Type: Grant
    Filed: February 11, 2011
    Date of Patent: September 11, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Yasushi Takiguchi, Taro Yamamoto, Hiroshi Arima, Kousuke Yoshihara, Yuichi Yoshida
  • Publication number: 20120111373
    Abstract: A method for cleaning a surface of a substrate having a circuit pattern formed thereon, includes: forming a liquid film on the surface by feeding a cleaning solution onto the center of the surface while rotating the substrate with the substrate kept horizontal; forming a dry region by discharging gas to the center while moving a position of feed of the cleaning solution on the surface by a distance from the center toward the periphery of the substrate with the substrate being rotated; moving the position of feed of the cleaning solution on the surface toward the periphery at a speed equal to a speed at which the dry region is expanded toward the periphery while rotating the substrate; and controlling temperature of the cleaning solution to form the liquid film such that the temperature becomes higher than process atmosphere temperature on the surface during feed of the cleaning solution.
    Type: Application
    Filed: November 3, 2011
    Publication date: May 10, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hiroshi ARIMA, Yuichi YOSHIDA, Kousuke YOSHIHARA
  • Publication number: 20110200952
    Abstract: There is provided a developing apparatus and a developing method capable of rapidly forming a liquid film of a developing solution on an entire surface of a substrate while reducing a usage amount of the developing solution. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; a temperature control plate that is provided within the processing vessel and mounts the substrate thereon; an atmosphere gas supply unit that supplies an atmosphere gas including mist and vapor of a developing solution onto a surface of the substrate within the processing vessel; and a first temperature control unit that controls the temperature control plate to a temperature allowing the atmosphere gas to be condensed on the substrate. Here, an inner wall of the processing vessel is maintained at a temperature at which the atmosphere gas is hardly condensed on the inner wall.
    Type: Application
    Filed: February 10, 2011
    Publication date: August 18, 2011
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yasushi Takiguchi, Taro Yamamoto, Hiroshi Arima, Kousuke Yoshihara, Yuichi Yoshida
  • Publication number: 20110200321
    Abstract: There is provided a coating and developing apparatus that develops a substrate of which surface is coated with resist and exposed to lights. The coating and developing apparatus includes a developing module; a cleaning module; and a transfer mechanism configured to transfer a substrate developed by the developing module to the cleaning module. The developing module includes an airtightly sealed processing vessel configured to form a processing atmosphere; a temperature control plate provided in the processing vessel and mounts thereon the substrate and cools the substrate; and an atmosphere gas supply unit configured to supply an atmosphere gas including mist of a developing solution to a surface of the substrate within the processing vessel. The cleaning module includes a mounting table configured to mount thereon the substrate; and a cleaning solution supply unit configured to supply a cleaning solution to the substrate mounted on the mounting table.
    Type: Application
    Filed: February 11, 2011
    Publication date: August 18, 2011
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yasushi Takiguchi, Taro Yamamoto, Hiroshi Arima, Kousuke Yoshihara, Yuichi Yoshida
  • Publication number: 20110200953
    Abstract: There is provided a developing apparatus capable of achieving high throughput. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; an atmosphere gas supply unit that supplies an atmosphere gas containing mist of a developing solution into the processing vessel in order to form a liquid film of the developing solution on a surface of a substrate loaded into the processing vessel; and a drying unit that dries the substrate in order to stop a developing process by the liquid film. A reaction between a resist and the developing solution can be stopped. Therefore, a developing process can be performed in parallel with a cleaning process performed by a cleaning module and high throughput is achieved.
    Type: Application
    Filed: February 11, 2011
    Publication date: August 18, 2011
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hiroshi ARIMA, Kousuke YOSHIHARA, Yuichi YOSHIDA, Yasushi TAKIGUCHI, Taro YAMAMOTO
  • Patent number: 7909405
    Abstract: An arrangement of operation unit in one upper corner portion of seat back of automotive seat is disclosed, in which an operating lever of the operation unit is accommodated in a housing fixed to a connecting bracket disposed in such one upper corner portion, and a shape retaining bracket is fixed to the connecting bracket to retain the peripheral edge region of opening of a trim cover assembly through which an operating lever of the operation unit projects outwardly. The peripheral edge region is inserted between the shape regaining bracket and a bezel, and further, the connecting bracket, housing and trim cover assembly are connected with one another at a connecting point, thereby effectively retaining the peripheral edge region of opening of the trim cover assembly in a predetermined shape conforming to outer contour of the one upper corner portion of seat back.
    Type: Grant
    Filed: March 25, 2009
    Date of Patent: March 22, 2011
    Assignee: Tachi-S Co., Ltd.
    Inventor: Hiroshi Arima
  • Publication number: 20100244514
    Abstract: An arrangement of operation unit in one upper corner portion of seat back of automotive seat is disclosed, in which an operating lever of the operation unit is accommodated in a housing fixed to a connecting bracket disposed in such one upper corner portion, and a shape retaining bracket is fixed to the connecting bracket to retain the peripheral edge region of opening of a trim cover assembly through which an operating lever of the operation unit projects outwardly. The peripheral edge region is inserted between the shape regaining bracket and a bezel, and further, the connecting bracket, housing and trim cover assembly are connected with one another at a connecting point, thereby effectively retaining the peripheral edge region of opening of the trim cover assembly in a predetermined shape conforming to outer contour of the one upper corner portion of seat back.
    Type: Application
    Filed: March 25, 2009
    Publication date: September 30, 2010
    Applicant: TACHI-S CO., LTD.
    Inventor: Hiroshi ARIMA
  • Publication number: 20100233638
    Abstract: The substrate treatment apparatus includes a heating plate that heats the substrate prepared by coating a surface of the substrate with a resist and exposing the resist-coated substrate to light; a surface treatment liquid atomizing unit that atomizes a surface treatment liquid used to improve wettability of the substrate with a developer that is supplied onto the resist; a cooling unit that cools the substrate heated by the heating plate; and a surface treatment liquid supply unit that supplies the atomized surface treatment liquid onto the substrate for a portion of the period from the time when the substrate is heated until the cooling means terminates the cooling of the substrate.
    Type: Application
    Filed: March 9, 2010
    Publication date: September 16, 2010
    Applicant: Tokyo Electron Limited
    Inventors: Yuichi YOSHIDA, Hiroshi ARIMA, Taro YAMAMOTO, Kousuke YOSHIHARA
  • Publication number: 20100233637
    Abstract: A developing apparatus including a substrate holder that holds a substrate horizontally; means for atomizing a surface treatment liquid used to improve wettability of the substrate with a developer; a first spray nozzle that sprays the atomized surface treatment liquid onto the substrate; and a developer supply nozzle that supplies a developer onto the substrate to which the substrate treatment liquid has been sprayed. The surface tension of the atomized surface treatment liquid with respect to the substrate is lower than the surface tension of the surface treatment liquid with respect to the substrate. The atomization suppresses the fact that the surface treatment liquid gathers on a certain portion of the surface of the substrate. The surface treatment liquid can be easily supplied onto the entire surface of the substrate, and improve wettability of the substrate with the developer.
    Type: Application
    Filed: March 5, 2010
    Publication date: September 16, 2010
    Applicant: Tokyo Electron Limited
    Inventors: Hiroshi ARIMA, Yuichi Yoshida, Taro Yamamoto, Kousuke Yoshihara
  • Publication number: 20100197789
    Abstract: Disclosed is a novel anti-obesity agent. Also disclosed is a therapeutic method using the anti-obesity agent. The anti-obesity agent comprises a GABAB receptor agonist or a pharmacologically acceptable salt thereof as an active ingredient.
    Type: Application
    Filed: July 19, 2007
    Publication date: August 5, 2010
    Applicant: National University Corporation Nagoya University
    Inventors: Hiroshi Arima, Ikuko Sato, Yutaka Oiso
  • Patent number: 7237846
    Abstract: A resin side cover for covering a side frame member of seat cushion frame of automotive seat, which includes outer and inner cover elements. First and second female engagement elements are respectively provided to forward and backward regions of the outer cover element, whereas first and second male engagement elements of resin material are respectively provided to a forward region of the side frame member and the inner cover element. The first female engagement element has an engagement portion defined therein at a predetermined position. The first male engagement element has a latch element defined therein at a point corresponding to such predetermined position, thus allowing the latch portion to be latchingly engageable with the engagement portion of the first female engagement element, while allowing the latch portion to be disengageable from that engagement portion by displacing the first female engagement element from the foregoing predetermined position.
    Type: Grant
    Filed: February 10, 2006
    Date of Patent: July 3, 2007
    Assignee: Tachi-S Co. Ltd.
    Inventor: Hiroshi Arima