Patents by Inventor Hiroshi Ban

Hiroshi Ban has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6951355
    Abstract: A door lock system for a vehicle includes a latch mechanism, a link mechanism and a housing. The latch mechanism is adapted to a vehicle door and latches the vehicle door to a vehicle body. The link mechanism includes an electric driving source and a plurality of lever members for selectively locking and unlocking the latch mechanism. The housing accommodates the latch mechanism and the link mechanism.
    Type: Grant
    Filed: March 16, 2001
    Date of Patent: October 4, 2005
    Assignee: Aisin Seiki Kabushiki Kaisha
    Inventors: Shigeru Hayakawa, Hiroshi Ban, Norio Konomoto, Katsutoshi Fukunaga, Makoto Suzumura, Akira Muramatsu, Yasuhiko Sono
  • Patent number: 6945574
    Abstract: A door lock system for a vehicle includes a) a latch mechanism which is adapted to a vehicle door and which holds the vehicle door to a vehicle body, b) an open link which is engagable and disengagable with the latch mechanism, c) a swing lever which is connected to the open link, d) an electric driving source having a gear member, and e) a rotary gear member which is arranged between the swing lever and the electric driving source so as to be meshed with the gear member of the electric driving source. The rotary gear member is directly and engagably connected to the swing lever.
    Type: Grant
    Filed: March 16, 2001
    Date of Patent: September 20, 2005
    Assignee: Aisin Seiki Kabushiki Kaisha
    Inventors: Shigeru Hayakawa, Hiroshi Ban, Norio Konomoto, Katsutoshi Fukunaga, Makoto Suzumura, Akira Muramatsu, Yasuhiko Sono
  • Patent number: 6759722
    Abstract: In the present semiconductor device, a chip with an LSI circuit is secured to a board 3 (with the chip flipped) so as to be level. The LSI circuit on the chip is specified to operate normally only when the chip is level. Further, the back of the chip is processed so as to give stress to the chip. The chip has a reduced thickness of 50 &mgr;m or less (alternatively 30 &mgr;m to 50 &mgr;m). Therefore, when the chip is detached from the board, it deforms and is no longer level due to the stress, which prohibits the LSI circuit from operating normally. This way, the present semiconductor device ensures that no analysis can be conducted on the LSI circuit once the chip is detached.
    Type: Grant
    Filed: March 30, 2001
    Date of Patent: July 6, 2004
    Assignees: Sharp Kabushiki Kaisha, Nippon Telegraph and Telephone Corporation
    Inventors: Eiji Yanagawa, Akihiko Nakano, Toshinori Ohmi, Hironori Matsumoto, Tadao Takeda, Hideyuki Unno, Hiroshi Ban
  • Patent number: 6575506
    Abstract: A door lock system for a vehicle includes a latch mechanism, an open link, an inside lever and a cancel lever. The latch mechanism is adapted to a vehicle door and latches the vehicle door to a vehicle body. The open link is engagable and disengagable with the latch mechanism. The inside lever is adapted to an inside handle of the vehicle door and is engagable with the open link. The cancel lever is connected to the open link and is arranged between the inside lever and the open link so as to be engagable with the inside lever when the open link is disengaged from the latch mechanism.
    Type: Grant
    Filed: March 16, 2001
    Date of Patent: June 10, 2003
    Assignee: Aisin Seiki Kabushiki Kaisha
    Inventors: Shigeru Hayakawa, Hiroshi Ban, Norio Konomoto, Katsutoshi Fukunaga, Makoto Suzumura, Akira Muramatsu, Yasuhiko Sono
  • Patent number: 6545371
    Abstract: A semiconductor device includes, on a protective film laminated on a circuit principal part, (i) a light blocking film provided so as to cover the circuit principal part, (ii) an aluminum oxide film provided so as to completely cover the light blocking film, and (iii) a light-blocking upper wiring provided on the aluminum oxide film. An attempt to exfoliate the light blocking film or the light blocking upper wiring causes the resistance-detection-use upper wiring to break or thin, thereby resulting in an increase in the resistance of the resistance-detection-use wiring. The increase in the resistance is detected by the resistance detecting circuit part, and malfunction or inoperativeness of the circuit principal part is caused in response of detection. By so doing, the circuit principal part can be protected from analysis.
    Type: Grant
    Filed: April 16, 2001
    Date of Patent: April 8, 2003
    Assignees: Sharp Kabushiki Kaisha, Nippon Telegraph and Telephone Corporation
    Inventors: Hironori Matsumoto, Akihiko Nakano, Toshinori Ohmi, Eiji Yanagawa, Hideyuki Unno, Hiroshi Ban, Tadao Takeda
  • Patent number: 6492446
    Abstract: A latex compound for dip molding, which can be used for production of a high-quality dip-molded product that is excellent in oil resistance and mechanical strength, has uniform film thickness and soft feeling to the skin and is free of pinholes, as is required for gloves etc. especially in the medical fields, and assumes no stickiness on the surface of the molded product after molding. This object is attained by a latex compound for dip molding which comprises a copolymer latex (L) obtained by emulsion polymerization of a monomer mixture and 0.05 to 5.0 parts by weight of a bubble breaker (A) consisting of a C8-22 fatty acid or a salt thereof, and if necessary, 0.1 to 5.0 parts by weight of a di C5-12 alkyl sulfosuccinate salt (B) and/or 0.5 to 10.0 parts by weight of a C13-20 alkyl benzene sulfonate (C) per 100 parts by weight of the monomer mixture.
    Type: Grant
    Filed: June 16, 2000
    Date of Patent: December 10, 2002
    Assignee: Takeda Chemical Industries, Ltd.
    Inventors: Yuichiro Kajiwara, Masaaki Tsuji, Shigeo Suzuki, Takashi Suetsugu, Hiroshi Ban
  • Patent number: 6472730
    Abstract: A semiconductor device in accordance with the present invention includes a semiconductor element chip pressed and secured on a distortion die-pad so that the semiconductor element chip, sealed inside a package, is held in a predetermined distorted state. The predetermined distorted state is preferably downward or upward warping. The semiconductor element chip operates normally in the distorted state, and does not operate normally when the semiconductor element chip is separated from the semiconductor device, and thereby released from the distortion and laid alone. This ensures that the semiconductor element chip is protected from circuit analysis.
    Type: Grant
    Filed: April 18, 2000
    Date of Patent: October 29, 2002
    Assignees: Sharp Kabushiki Kaisha, Nippon Telegraph and Telephone Corporation
    Inventors: Eiji Yanagawa, Akihiko Nakano, Toshinori Ohmi, Tadao Takeda, Hideyuki Unno, Hiroshi Ban
  • Publication number: 20010038211
    Abstract: A door lock system for a vehicle includes a latch mechanism, a link mechanism and a housing. The latch mechanism is adapted to a vehicle door and latches the vehicle door to a vehicle body. The link mechanism includes an electric driving source and a plurality of lever members for selectively locking and unlocking the latch mechanism. The housing accommodates the latch mechanism and the link mechanism.
    Type: Application
    Filed: March 16, 2001
    Publication date: November 8, 2001
    Inventors: Shigeru Hayakawa, Hiroshi Ban, Norio Konomoto, Katsutoshi Fukunaga, Makoto Suzumura, Akira Muramatsu, Yasuhiko Sono
  • Publication number: 20010035653
    Abstract: A door lock system for a vehicle includes a) a latch mechanism which is adapted to a vehicle door and which holds the vehicle door to a vehicle body, b) an open link which is engagable and disengagable with the latch mechanism, c) a swing lever which is connected to the open link, d) an electric driving source having a gear member, and e) a rotary gear member which is arranged between the swing lever and the electric driving source so as to be meshed with the gear member of the electric driving source. The rotary gear member is directly and engagably connected to the swing lever.
    Type: Application
    Filed: March 16, 2001
    Publication date: November 1, 2001
    Inventors: Shigeru Hayakawa, Hiroshi Ban, Norio Konomoto, Katsutoshi Fukunaga, Makoto Suzumura, Akira Muramatsu, Yasuhiko Sono
  • Publication number: 20010033082
    Abstract: A door lock system for a vehicle includes a latch mechanism, an open link, an inside lever and a cancel lever. The latch mechanism is adapted to a vehicle door and latches the vehicle door to a vehicle body. The open link is engagable and disengagable with the latch mechanism. The inside lever is adapted to an inside handle of the vehicle door and is engagable with the open link. The cancel lever is connected to the open link and is arranged between the inside lever and the open link so as to be engagable with the inside lever when the open link is disengaged from the latch mechanism.
    Type: Application
    Filed: March 16, 2001
    Publication date: October 25, 2001
    Inventors: Shigeru Hayakawa, Hiroshi Ban, Norio Konomoto, Katsutoshi Fukunaga, Makoto Suzumura, Akira Muramatsu, Yasuhiko Sono
  • Publication number: 20010028115
    Abstract: In the present semiconductor device, a chip with an LSI circuit is secured to a board 3 (with the chip flipped) so as to be level. The LSI circuit on the chip is specified to operate normally only when the chip is level. Further, the back of the chip is processed so as to give stress to the chip. The chip has a reduced thickness of 50 &mgr;m or less (alternatively 30 &mgr;m to 50 &mgr;m). Therefore, when the chip is detached from the board, it deforms and is no longer level due to the stress, which prohibits the LSI circuit from operating normally. This way, the present semiconductor device ensures that no analysis can be conducted on the LSI circuit once the chip is detached.
    Type: Application
    Filed: March 30, 2001
    Publication date: October 11, 2001
    Inventors: Eiji Yanagawa, Akihiko Nakano, Toshinori Ohmi, Hironori Matsumoto, Tadao Takeda, Hideyuki Unno, Hiroshi Ban
  • Patent number: 6060773
    Abstract: A semiconductor chip has a nonvolatile memory formed on the upper surface side of a semiconductor substrate. The chip includes at least one recess portion formed in the lower surface of the semiconductor substrate. The recess portion is located in a region corresponding to the nonvolatile memory. A method of manufacturing the semiconductor chip is also disclosed.
    Type: Grant
    Filed: May 7, 1998
    Date of Patent: May 9, 2000
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Hiroshi Ban, Masaaki Tanno, Tadao Takeda
  • Patent number: 5512417
    Abstract: A positive resist composition comprising a poly(p-hydroxystyrene) as matrix resin which is synthesized by an anionic polymerization method and has a weight average molecular weight of from 8,000 to 20,000, bis(p-t-butoxycarbonylmethyl)thymolphthalein as dissolution inhibitor, bis(p-t-butylphenyl)iodonium triflate as acid generator; a compound which contains one amino group and one carboxyl group to function as acid deactivator and propylene glycol monomethyl ether acetate as organic solvent.
    Type: Grant
    Filed: February 14, 1995
    Date of Patent: April 30, 1996
    Assignees: Shin-Etsu Chemical Co., Ltd., Nippon Telegraph and Telephone Corp.
    Inventors: Hiroshi Ban, Akinobu Tanaka, Fujio Yagihasi, Jun Watanabe, Minoru Takamizawa
  • Patent number: 5457003
    Abstract: A resist material comprises a polysiloxane obtained by hydrolysis and condensation with dehydration of one or more alkoxysilanes having an oxirane ring, or of a mixture of the alkoxysilane(s) having an oxirane ring and one or more alkoxysilanes having no oxirane ring, and an acid generator. The resist material may contain one or more of a spectral sensitizer, an organic polymer having a hydroxyl group or an epoxy compound. Resist patterns are formed by coating an organic polymer on a substrate and then the resist material on the film of the organic polymer to form a two layer resist having a bottom layer of the organic polymer and top layer of the resist material, prebaking, imagewise exposing high radiation, postbaking, and developing the resist with alkaline solutions to remove an unexposed portion of the top layer, and dry etching the bottom layer using the relic of the resist material as a mask. the temperature of the post baking is preferably lower than that of the prebaking.
    Type: Grant
    Filed: July 30, 1993
    Date of Patent: October 10, 1995
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Akinobu Tanaka, Hiroshi Ban, Jiro Nakamura, Takao Kimura, Yoshio Kawai
  • Patent number: 5393664
    Abstract: (S)-1phenyl-1,3-propanediol or a derivative thereof having high optical purity can be produced simply in high yield, by contacting 1-phenylpropan-3-ol-1-one with a culture of microorganisms, microorganism cells isolated from the culture, or a product obtained by processing the microorganism cells.
    Type: Grant
    Filed: November 16, 1992
    Date of Patent: February 28, 1995
    Assignee: Ajinomoto Co. Inc.
    Inventors: Ikuo Kira, Kazuhiro Watanabe, Eiji Nakanishi, Hiroshi Ban, Norimasa Onishi, Takayuki Suzuki
  • Patent number: 5389492
    Abstract: A resist composition comprising a compound having an active hydrogen and an alkali-soluble siloxane polymer containing in the molecules thereof at least one unit selected from a unit represented by formula (I) and a unit represented by formula (II) ##STR1## wherein the X's are the same or different and each represents one member selected from the group consisting of hydrogen, ##STR2## (where R represents hydrogen, a hydrocarbon group, or a substituted hydrocarbon group); and a carboxyl group;R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, and R.sub.6 are the same or different and each represents one member selected from the group consisting of hydrogen, a hydroxyl group, a substituted or unsubstituted aliphatic hydrocarbon group, and a substituted or unsubstituted aromatic hydrocarbon group, provided that at least one of R.sub.1 to R.sub.6 is a hydroxyl group; andl, m, n, and p each is 0 or a positive integer, provided that l and m are not 0 at the same time.
    Type: Grant
    Filed: April 8, 1994
    Date of Patent: February 14, 1995
    Assignees: Fuji Photo Film Co., Ltd., Nippon Telegraph and Telephone Corporation
    Inventors: Tadayoshi Kokubo, Atsushi Sakamoto, Akinobu Tanaka, Hiroshi Ban
  • Patent number: 5356753
    Abstract: A positive resists material for high energy-sensitive positive resists which can be developed in aqueous alkali solution, said material comprising (A) a polyhydroxystyrene resin wherein some hydroxyl groups are substituted by t-butoxycarbonyloxy groups, (B) a solution blocking agent, and (C) an onium salt, and being characterized in that said solution blocking agent contains at least one t-butoxycarbonyloxy group per molecule, said onium salt is bis(p-t-butylphenyl) iodinium trifluormethylsulfonate represented by the following formula (1): ##STR1## and the weight proportions of (A), (B), (C) are given by the relations: 0.07.ltoreq.B-.ltoreq.0.40, 0.005.ltoreq.C.ltoreq.0.15, 0.55.ltoreq.A, A+B+C=1. As the resist has low absorption at the exposure wavelength of a KrF exima laser, a fine pattern having vertical walls is easily formed.
    Type: Grant
    Filed: November 12, 1992
    Date of Patent: October 18, 1994
    Assignees: Shin-Etsu Chemical Co., Ltd., Nippon Telegraph and Telephone Corp.
    Inventors: Motoyuki Yamada, Osamu Watanabe, Akinobu Tanaka, Hiroshi Ban, Yoshio Kawai
  • Patent number: 4416361
    Abstract: Friction facings comprising a non-woven fibrous lamina reinforced with stitching, and impregnated with a curable binder have improved resistance to delamination.
    Type: Grant
    Filed: December 23, 1981
    Date of Patent: November 22, 1983
    Assignee: Aisin Seiki Co., Ltd.
    Inventors: Kiyohisa Suzuki, Yasunobu Yamamoto, Ryoichi Tomikawa, Toshiaki Sakabe, Hiroshi Ban, Nobuyasu Ishida
  • Patent number: 4262788
    Abstract: A friction member is a clutch facing, a brake pad, or a brake lining which comprises a phenolic fiber, a plated organic fiber, and/or mixed fiber thereof, which may or may not comprise the other fibers such as nonorganic fibers, as based material of the aforementioned friction member, wherein various difficulties of asbestos are improved.
    Type: Grant
    Filed: September 29, 1978
    Date of Patent: April 21, 1981
    Inventors: Yasunobu Yamamoto, Hiroshi Ban, Katumi Nakavishi, Ryoichi Tomikawa, Katumi Nakanishi, Ryoichi Tomikawa, Toshitake Kato
  • Patent number: 4241820
    Abstract: A clutch assembly has a clutch cover secured to a flywheel, a diaphragm spring positioned outside the clutch cover, and an annular pressure plate positioned inside the clutch cover. The diaphragm spring is pivotally mounted on the clutch cover by rivets disposed in several openings formed in the diaphragm spring. The pressure plate is connected with the clutch cover by a suitable number of flexible drive straps which are disposed between the clutch cover and the pressure plate and extend chordally across the pressure plate. One end of each drive strap is secured to the pressure plate by a rivet. The other end of each drive strap is secured to the clutch cover by a rivet which is positioned radially inwardly of the inner periphery of the pressure plate and is aligned with an opening formed in the diaphragm spring.
    Type: Grant
    Filed: September 28, 1978
    Date of Patent: December 30, 1980
    Assignee: Aisin Seiki Kabushiki Kaisha
    Inventors: Hiroshi Ban, Tadamasa Kobayashi, Syozo Kuno