Abstract: A substrate processing apparatus includes a holding unit which holds a substrate horizontally, a facing member which faces an upper surface of the substrate from above and can be engaged with the holding unit, a supporting member which supports the facing member, a raising/lowering unit in which the supporting member is raised and lowered between an upper position at which the supporting member supports the facing member in a state where the facing member is separated above from the holding unit and an engaging position which is a position below from the upper position and at which the holding unit is engaged with the facing member, and a detecting unit which is disposed at the supporting member. The detecting unit detects a position of a portion to be detected which is disposed at the facing member in relation to the detecting unit.

Abstract: A substrate processing apparatus includes a connection portion connected to the common piping and having a flow space in its interior, a chemical liquid supplying piping connected to the connection portion, a drain piping connected to the connection portion, and a cleaning liquid supplying piping connected to the connection portion, the connection portion has a plurality of ports aligned along a flow direction of the flow space, and a common port, which, among these ports, is connected to one end of the common piping, is disposed, in regard to the flow direction, between a drain port, which, among these ports, is connected to the drain piping, and a cleaning liquid supplying port, which, among these ports, is connected to the cleaning liquid supplying piping.

Abstract: A substrate processing method includes the steps of: rotating a substrate horizontally around a vertical rotational axis, placing a facing member facing the substrate from above such that an inner peripheral surface of an extension portion of the facing member faces the substrate radially from the outside, rotating the facing member around the rotational axis, supplying a processing liquid to an upper surface of the substrate being in a rotated state, and placing a guard that surrounds the substrate further radially outside from the extension portion in plan view at a height position, at which processing liquid scattered from the upper surface of the substrate toward the outside in the radial direction is received by the guard, in accordance with affinity of the processing liquid for the inner peripheral surface of the extension portion.

Abstract: A substrate processing apparatus includes a substrate holder that holds a substrate, a processing liquid piping that is communicatively connected with a discharge port for discharging a processing liquid, a processing liquid supplier that supplies the processing liquid to the processing liquid piping, a suction unit for suctioning the processing liquid present inside the processing liquid piping, and a controller which controls the processing liquid supplying unit and the suction unit. The controller executes a processing liquid supplying step that supplies the processing liquid to the processing liquid piping and a suctioning step that suctions the processing liquid inside the processing liquid piping by the suction unit. The controller selectively executes a first suctioning step and a second suctioning step of the processing liquid.

Abstract: A substrate processing method includes the steps of: rotating a substrate horizontally around a vertical rotational axis, placing a facing member facing the substrate from above such that an inner peripheral surface of an extension portion of the facing member faces the substrate radially from the outside, rotating the facing member around the rotational axis, supplying a processing liquid to an upper surface of the substrate being in a rotated state, and placing a guard that surrounds the substrate further radially outside from the extension portion in plan view at a height position, at which processing liquid scattered from the upper surface of the substrate toward the outside in the radial direction is received by the guard, in accordance with affinity of the processing liquid for the inner peripheral surface of the extension portion.

Abstract: A substrate processing apparatus includes a substrate holding unit which holds a substrate, a processing liquid piping which is communicatively connected with a discharge port for discharging a processing liquid to a major surface of the substrate, a processing liquid supplying unit for supplying the processing liquid to the processing liquid piping, a suction unit for suctioning the processing liquid present inside the processing liquid piping, and a controller which controls the processing liquid supplying unit and the suction unit, wherein the controller executes a processing liquid supplying step which supplies the processing liquid to the processing liquid piping in order to discharge it from the discharge port by the processing liquid supplying unit and a suctioning step which suctions the processing liquid inside the processing liquid piping by the suction unit, and the controller selectively executes a first suctioning step in which, in the suctioning step, the processing liquid is suctioned and a lea

Abstract: A substrate processing apparatus includes a holding unit which holds a substrate horizontally, a facing member which faces an upper surface of the substrate from above and can be engaged with the holding unit, a supporting member which supports the facing member, a raising/lowering unit in which the supporting member is raised and lowered between an upper position at which the supporting member supports the facing member in a state where the facing member is separated above from the holding unit and an engaging position which is a position below from the upper position and at which the holding unit is engaged with the facing member, and a detecting unit which is disposed at the supporting member. The detecting unit detects a position of a portion to be detected which is disposed at the facing member in relation to the detecting unit.

Abstract: A substrate processing apparatus includes a connection portion connected to the common piping and having a flow space in its interior, a chemical liquid supplying piping connected to the connection portion, a drain piping connected to the connection portion, and a cleaning liquid supplying piping connected to the connection portion, the connection portion has a plurality of ports aligned along a flow direction of the flow space, and a common port, which, among these ports, is connected to one end of the common piping, is disposed, in regard to the flow direction, between a drain port, which, among these ports, is connected to the drain piping, and a cleaning liquid supplying port, which, among these ports, is connected to the cleaning liquid supplying piping.