Patents by Inventor Hiroshi Fudoji

Hiroshi Fudoji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9970749
    Abstract: Provided are: a sheet of colloidal crystals immobilized in resin exhibiting intense structural color, enabled to be observed easily from a squarely facing direction against a surface; and use thereof. The sheet of the present invention, assuming a direction perpendicular to part of a surface of a target area including partially the sheet surface is set as a specified axis, satisfies: (1) The target area includes plural inclined back-reflecting crystal-domains crystal domains having colloid particles immobilized in resin and including crystal lattice planes capable of Bragg-back reflecting at least some of components in a visible wavelength range of incident light having greater than 0 incident angle with the specified axis; and (2) By defining an azimuth angle around the specified axis, the inclined back-reflecting crystal-domains are so oriented that intensity of reflected light caused by Bragg back reflection varies depending on the azimuth angle of the incident light.
    Type: Grant
    Filed: August 5, 2014
    Date of Patent: May 15, 2018
    Assignees: FUJI KAGAKU CORPORATION, NATIONAL INSTITUTE FOR MATERIALS SCIENCE
    Inventors: Satoshi Kawanaka, Fumio Uchida, Tsutomu Sawada, Seiichi Furumi, Hiroshi Fudoji
  • Patent number: 9970850
    Abstract: A sheet of colloidal crystals immobilized in resin exhibiting intense structural color and allowing easy observation thereof from squarely facing direction against the surface; and application thereof are provided. The sheet includes crystal domains comprising colloidal crystals immobilized in resin. The Bragg reflection intensity resulting from crystal domains according to back reflection spectrum measurement to the sheet surface satisfies the following conditions (1) and (2). (1) When elevation angle from the sheet surface is in a range of at least 60° and less than 90° and measurement is performed at a predetermined azimuth angle on the sheet surface, intensity is not 0 and (2) when elevation angle from the sheet surface is in the range of at least 60° and less than 90° and azimuth dependency on the sheet surface is measured, the intensity exhibits a maximum value at the predetermined azimuth angle.
    Type: Grant
    Filed: August 5, 2014
    Date of Patent: May 15, 2018
    Assignees: NATIONAL INSTITUTE FOR MATERIALS SCIENCE, FUJI KAGAKU CORPORATION
    Inventors: Satoshi Kawanaka, Fumio Uchida, Tsutomu Sawada, Seiichi Furumi, Hiroshi Fudoji
  • Publication number: 20110014380
    Abstract: The invention has for its object to provide an apparatus and process for fabricating an artificial opal film having a uniform thickness yet a large area, and provides an artificial opal film fabrication apparatus, in which a substrate (S1) coated with a suspension film (S2) having fine particles dispersed in it is located in a stage (10), and a dispersive medium of the suspension is evaporated off thereby crystallizing the fine particles to fabricate an artificial opal film, characterized by comprising a scraper (20) for adjusting the thickness of the suspension film, and a stage (10) that is movable relative thereto in a constant horizontal direction, wherein the substrate attached to that stage is positioned such that when the stage (10) moves horizontally, the thickness of the suspension film (S2) coated on that substrate (S1) and in an uncrystalliation state is controlled by the scraper (20), and crystallization by evaporation of the dispersive medium of the suspension is set off after the suspension film
    Type: Application
    Filed: March 25, 2009
    Publication date: January 20, 2011
    Applicant: National Institute for Materials Science
    Inventors: Hiroshi Fudoji, Tsutomu Sawada, Kenji Kitamura
  • Patent number: 7323227
    Abstract: A process for arranging a number of micro-bodies efficiently and precisely as one on one spot on a substrate. Charged spots are formed by a converging ion beam or the like on a substrate having an insulating property or the like, and micro-bodies having a size of 200 microns or less are attracted and stuck to the charged spots.
    Type: Grant
    Filed: February 9, 2006
    Date of Patent: January 29, 2008
    Assignee: Japan as Represented By Director General of National Research Institute of Metals
    Inventors: Hiroshi Fudoji, Takeshi Konno, Mitsuru Egashira, Mikihiko Kobayashi, Norio Shinya
  • Publication number: 20060231755
    Abstract: A process for arranging a number of micro-bodies efficiently and precisely as one on one spot on a substrate. Charged spots are formed by a converging ion beam or the like on a substrate having an insulating property or the like, and micro-bodies having a size of 200 microns or less are attracted and stuck to the charged spots.
    Type: Application
    Filed: February 9, 2006
    Publication date: October 19, 2006
    Inventors: Hiroshi Fudoji, Takeshi Konno, Mitsuru Egashira, Mikihiko Kobayashi, Norio Shinya
  • Publication number: 20050056793
    Abstract: A process for arranging a number of micro-bodies efficiently and precisely as one on one spot on a substrate. Charged spots are formed by a converging ion beam or the like on a substrate having an insulating property or the like, and micro-bodies having a size of 200 microns or less are attracted and stuck to the charged spots.
    Type: Application
    Filed: March 8, 2004
    Publication date: March 17, 2005
    Inventors: Hiroshi Fudoji, Takeshi Konno, Mitsuru Egashira, Mikihiko Kobayashi, Norio Shinya
  • Publication number: 20030168612
    Abstract: A process for arranging a number of micro-bodies efficiently and precisely as one on one spot on a substrate.
    Type: Application
    Filed: March 12, 2003
    Publication date: September 11, 2003
    Inventors: Hiroshi Fudoji, Takeshi Konno, Mitsuru Egashira, Mikihiko Kobayashi, Norio Shinya
  • Patent number: 6548412
    Abstract: A novel patterned thin film forming method is capable of realizing formation of nanometer-scale patterned thin films with high controllability by an easy and low-cost process. To form a patterned thin film on an insulating substrate in a precursor solution containing a film-forming substance, an electric charge pattern is formed on the insulating substrate, and then the insulating substrate is dipped in the precursor solution to deposit the film-forming substance on the electric charge pattern formed on the insulating substrate.
    Type: Grant
    Filed: March 18, 2002
    Date of Patent: April 15, 2003
    Assignee: National Institute for Materials Science
    Inventors: Hiroshi Fudoji, Mikihiko Kobayashi, Norio Shinya
  • Publication number: 20020132498
    Abstract: A novel patterned thin film forming method is capable of realizing formation of nanometer-scale patterned thin films with high controllability by an easy and low-cost process. To form a patterned thin film on an insulating substrate in a precursor solution containing a film-forming substance, an electric charge pattern is formed on the insulating substrate, and then the insulating substrate is dipped in the precursor solution to deposit the film-forming substance on the electric charge pattern formed on the insulating substrate.
    Type: Application
    Filed: March 18, 2002
    Publication date: September 19, 2002
    Applicant: national institute for materials science
    Inventors: Hiroshi Fudoji, Mikihiko Kobayashi, Norio Shinya
  • Publication number: 20020113208
    Abstract: A process for arranging a number of micro-bodies efficiently and precisely as one on one spot on a substrate.
    Type: Application
    Filed: April 24, 2002
    Publication date: August 22, 2002
    Inventors: Hiroshi Fudoji, Takeshi Konno, Mitsuru Egashira, Mikihiko Kobayashi, Norio Shinya
  • Publication number: 20010045524
    Abstract: A process for arranging a number of micro-bodies efficiently and precisely as one on one spot on a substrate.
    Type: Application
    Filed: December 1, 1999
    Publication date: November 29, 2001
    Inventors: HIROSHI FUDOJI, TAKESHI KONNO, MITSURU EGASHIRA, MIKIHIKO KOBAYASHI, NORIO SHINYA