Patents by Inventor Hiroshi Ichihara

Hiroshi Ichihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190217250
    Abstract: An ultrapure water production apparatus (1) includes an ultrafiltration membrane device (10). The ultrafiltration membrane device (10) includes a plurality of ultrafiltration membranes (11, 12) that are connected in series. The plurality of ultrafiltration membranes (11, 12) include a first ultrafiltration membrane (11) and a second ultrafiltration membrane (12) located farthest downstream among the plurality of ultrafiltration membranes (11, 12), the second ultrafiltration membrane (12) having filtration properties that are different from filtration properties of the first ultrafiltration membrane (11).
    Type: Application
    Filed: June 20, 2017
    Publication date: July 18, 2019
    Applicant: ORGANO CORPORATION
    Inventors: Fumitaka ICHIHARA, Hiroshi SUGAWARA
  • Publication number: 20190199895
    Abstract: A stereo image pickup unit includes: first and second image pickup apparatuses including first and second image pickup devices and first and second mount boards, the image pickup apparatuses being formed in a same shape each other; and a holding frame for holding the first and second image pickup devices, the first and second mount boards including non-mounting surfaces perpendicular to rear surfaces of the first and second image pickup devices and projecting toward an outer side of projection surfaces of the first and second image pickup devices, the holding frame holding the first and second image pickup apparatuses such that the non-mounting surfaces are opposed to each other on a parallax direction inner side.
    Type: Application
    Filed: March 1, 2019
    Publication date: June 27, 2019
    Applicant: OLYMPUS CORPORATION
    Inventors: Hirokazu ICHIHARA, Hiroshi UNSAI, Toshiyuki FUJII, Mayumi IMAI, Teruyuki NISHIHARA, Jumpei ARAI, Masahiro SATO
  • Patent number: 9431796
    Abstract: A method for manufacturing a spark plug includes a transfer step of transferring a first tip to a joining position where the first tip is joined to a tip-mating member. The transfer step includes a step of performing positional correction for the first tip before the first tip reaches the joining position.
    Type: Grant
    Filed: March 13, 2012
    Date of Patent: August 30, 2016
    Assignee: NGK SPARK PLUG CO., LTD.
    Inventor: Hiroshi Ichihara
  • Patent number: 9065257
    Abstract: A method of manufacturing an electrode composite for forming an electrode of a spark plug, the electrode composite being formed by laser-welding a first electrode member and a second electrode member together.
    Type: Grant
    Filed: September 20, 2011
    Date of Patent: June 23, 2015
    Assignee: NGK SPARK PLUG CO., LTD.
    Inventors: Hiroshi Ichihara, Ryuji Emoto
  • Publication number: 20140011417
    Abstract: A method for manufacturing a spark plug includes a transfer step of transferring a first tip to a joining position where the first tip is joined to a tip-mating member. The transfer step includes a step of performing positional correction for the first tip before the first tip reaches the joining position.
    Type: Application
    Filed: March 13, 2012
    Publication date: January 9, 2014
    Applicant: NGK SPARK PLUG CO., LTD.
    Inventor: Hiroshi Ichihara
  • Publication number: 20130157538
    Abstract: A method of manufacturing an electrode composite for forming an electrode of a spark plug, the electrode composite being formed by laser-welding a first electrode member and a second electrode member together.
    Type: Application
    Filed: September 20, 2011
    Publication date: June 20, 2013
    Inventors: Hiroshi Ichihara, Ryuji Emoto
  • Patent number: 6765683
    Abstract: A method of manufacturing a projection optical system (37) for projecting a pattern from a reticle to a photosensitive substrate, comprising a surface-shape-measuring step wherein the shape of an optical test surface (38) of an optical element (36) which is a component in the projection optical system is measured by causing interference between light from the optical surface (38) and light from an aspheric reference surface (70) while the optical test surface (38) and said reference surface (70) are held in integral fashion in close mutual proximity. A wavefront-aberration-measuring step is included, wherein the optical element is assembled in the projection optical system and the wavefront aberration of the projection optical system is measured.
    Type: Grant
    Filed: August 13, 2002
    Date of Patent: July 20, 2004
    Assignee: Nikon Corporation
    Inventor: Hiroshi Ichihara
  • Publication number: 20020191195
    Abstract: A method of manufacturing a projection optical system (37) for projecting a pattern from a reticle to a photosensitive substrate, comprising a surface-shape-measuring step wherein the shape of an optical test surface (38) of an optical element (36) which is a component in the projection optical system is measured by causing interference between light from the optical surface (38) and light from an aspheric reference surface (70) while the optical test surface (38) and said reference surface (70) are held in integral fashion in close mutual proximity. A wavefront-aberration-measuring step is included, wherein the optical element is assembled in the projection optical system and the wavefront aberration of the projection optical system is measured.
    Type: Application
    Filed: August 13, 2002
    Publication date: December 19, 2002
    Applicant: Nikon Corporation
    Inventors: Hiroshi Ichihara, Takashi Gemma, Shigerur Nakayama, Hajime Ichikawa
  • Patent number: 6456382
    Abstract: A method of manufacturing a projection optical system (37) for projecting a pattern from a reticle to a photosensitive substrate, comprising a surface-shape-measuring step wherein the shape of an optical test surface (38) of an optical element (36) which is a component in the projection optical system is measured by causing interference between light from the optical surface (38) and light from an aspheric reference surface (70) while the optical test surface (38) and said reference surface (70) are held in integral fashion in close mutual proximity. A wavefront-aberration-measuring step is included, wherein the optical element is assembled in the projection optical system and the wavefront aberration of the projection optical system is measured.
    Type: Grant
    Filed: June 1, 2001
    Date of Patent: September 24, 2002
    Assignee: Nikon Corporation
    Inventors: Hiroshi Ichihara, Takashi Gemma, Shigeru Nakayama, Hajime Ichikawa
  • Patent number: 6344898
    Abstract: Apparatus and methods are disclosed for measuring the surface topography of a test surface, such as a spherical or aspherical surface of a refractive or reflective optical element. The test surface is measured by detecting the state of interference fringes generated by interference of a reference light beam and a measurement light beam that interacts (e.g., reflects from) the test surface. The reference and measurement beams are produced by a point light source having a reflective surface. The point light source is disposed between a source of input light and the test surface. The measurement beam (after interacting with the test surface) and the reference beam are caused to interfere with each other to produce a first interference-fringe state. The distance between the point light source and the test surface can be changed between production of the first interference-fringe state and production of a second interference-fringe state.
    Type: Grant
    Filed: September 14, 1999
    Date of Patent: February 5, 2002
    Assignee: Nikon Corporation
    Inventors: Takashi Gemma, Hiroshi Ichihara, Hajime Ichikawa, Shigeru Nakayama, Bruce Jacobsen
  • Patent number: 6312373
    Abstract: A method of manufacturing a projection optical system (37) for projecting a pattern from a reticle to a photosensitive substrate, comprising a surface-shape-measuring step wherein the shape of an optical test surface (38) of an optical element (36) which is a component in the projection optical system is measured by causing interference between light from the optical surface (38) and light from an aspheric reference surface (70) while the optical test surface (38) and said reference surface (70) are held in integral fashion in close mutual proximity. A wavefront-aberration-measuring step is included, wherein the optical element is assembled in the projection optical system and the wavefront aberration of the projection optical system is measured.
    Type: Grant
    Filed: September 22, 1999
    Date of Patent: November 6, 2001
    Assignee: Nikon Corporation
    Inventor: Hiroshi Ichihara
  • Publication number: 20010028462
    Abstract: A method of manufacturing a projection optical system (37) for projecting a pattern from a reticle to a photosensitive substrate, comprising a surface-shape-measuring step wherein the shape of an optical test surface (38) of an optical element (36) which is a component in the projection optical system is measured by causing interference between light from the optical surface (38) and light from an aspheric reference surface (70) while the optical test surface (38) and said reference surface (70) are held in integral fashion in close mutual proximity. A wavefront-aberration-measuring step is included, wherein the optical element is assembled in the projection optical system and the wavefront aberration of the projection optical system is measured.
    Type: Application
    Filed: June 1, 2001
    Publication date: October 11, 2001
    Applicant: NIKON CORPORATION
    Inventors: Hiroshi Ichihara, Takashi Gemma, Shigerur Nakayama, Hajime Ichikawa